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Home > News > ALD NanoSolutions EarnsFrost & Sullivan Technology Award

April 3rd, 2006

ALD NanoSolutions EarnsFrost & Sullivan Technology Award

Abstract:
Frost & Sullivan’s recent analysis of the advanced coatings & surface technology market has recognized ALD NanoSolutions, Inc. with the 2006 Excellence in Technology Award for developing and commercializing path breaking atomic layer deposition (ALD) techniques. The two primary techniques that have been developed are Particle ALD™ and Polymer ALD™ for nanocoating conformal inorganic films on individual particles and polymer substrates, respectively.

Source:
ALD NanoSolutions

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