Home > News > ALD NanoSolutions EarnsFrost & Sullivan Technology Award
April 3rd, 2006
ALD NanoSolutions EarnsFrost & Sullivan Technology Award
Abstract:
Frost & Sullivan’s recent analysis of the advanced coatings & surface technology market has recognized ALD NanoSolutions, Inc. with the 2006 Excellence in Technology Award for developing and commercializing path breaking atomic layer deposition (ALD) techniques. The two primary techniques that have been developed are Particle ALD™ and Polymer ALD™ for nanocoating conformal inorganic films on individual particles and polymer substrates, respectively.
Source:
ALD NanoSolutions
Related News Press |
Materials/Metamaterials/Magnetoresistance
Nanoscale CL thermometry with lanthanide-doped heavy-metal oxide in TEM March 8th, 2024
Focused ion beam technology: A single tool for a wide range of applications January 12th, 2024
Announcements
NRL charters Navy’s quantum inertial navigation path to reduce drift April 5th, 2024
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Tools
Ferroelectrically modulate the Fermi level of graphene oxide to enhance SERS response November 3rd, 2023
The USTC realizes In situ electron paramagnetic resonance spectroscopy using single nanodiamond sensors November 3rd, 2023
The latest news from around the world, FREE | ||
Premium Products | ||
Only the news you want to read!
Learn More |
||
Full-service, expert consulting
Learn More |
||