- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
March 14th, 2005
This conference will bring together scientists and engineers interested in all aspects of the technology and characterization techniques for silicon device research, development, manufacturing, and diagnostics: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring. The conference is dedicated to summarizing major issues and giving critical reviews of important semiconductor techniques that are needed by the semiconductor industry as we move to silicon nanotechnology and beyond.
The conference provides a forum to present and discuss critical issues; problems and limits; evolving requirements and analysis needs; future directions; and key measurement principles, capabilities, applications, and limitations. The conference will consist of formal invited presentation sessions and poster sessions for contributed papers. The poster papers will cover new developments in characterization/metrology technology especially at the nano scale.
The 2005 International Conference on Characterization and Metrology for ULSI Technology is the fifth in a series. Richardson, Texas. March 15 - 18, 2005.
|Related News Press|
FEI Launches Helios G4 DualBeam Series for Materials Science: The Helios G4 DualBeam Series features new capabilities to enable scientists and engineers to answer the most demanding and challenging scientific questions June 27th, 2016