Nanotechnology Now - News Story: JMAR Granted X-Ray Lithography Patent

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March 2nd, 2005

JMAR Granted X-Ray Lithography Patent

Abstract:
JMAR Technologies, Inc. has been issued a patent for advanced X-ray lithography stepper technology that will enable a faster, more cost-effective means of producing state-of-the-art zone plate optics for its Compact X-ray Microscope and X-ray Nano Probe product lines.

Source:
businesswire

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