Nanotechnology Now

• About Us
  
  • Advertising
  • Our Mission
  • Our Team
  • Comments
  • Friends
  • Contact
• Nanotechnology
• News
  
  • Current News
  • Press Releases
  • Submit Press
  • Press kit
  • Interviews
• Columns
• Products
  
  • Our Products
  • Books
  • Featured Books
• Directories
  
  • Companies/Academic
  • Events
  • Glossary
  • Best Of
• Career Center
• Nano-Social Network
• Nano Consulting
• My Account

Home > News > IMEC claims silicide gate could enable 45-nm process

October 16th, 2004

IMEC claims silicide gate could enable 45-nm process

Abstract:
IMEC has demonstrated the integration of fully-silicided NiSi gates on top of high-k gate stacks, claiming a potential breakthrough that would enable development of a 45-nm manufacturing process.

Source:
eetimes

Bookmark:

Related Links

IMEC

Related News Press

Chip Technology

Which qubit my dear? New method to distinguish between neighbouring quantum bits June 18th, 2013

SEMATECH to Address Critical Supply Chain Challenges and Present Latest Technology Advances at SEMICON West 2013 June 17th, 2013

Imec shows multiple enhancement options for next-generation FinFETs: Leading nano-electronics R&D center addresses key challenges of Germanium finFET technology at VLSI 2013 June 14th, 2013

Imec showcases innovation in RRAM R&D at VLSI Technology Symposium June 14th, 2013

Announcements

Pioneering breakthrough of chemical nanoengineering to design drugs controlled by light June 18th, 2013

Study Shows How the Nanog Protein Promotes Growth of Head and Neck Cancer June 18th, 2013

New Method to Synthesize Zinc Oxide Nanoparticles with High Catalytic Activity June 18th, 2013

Production of Polyaniline Biosensors Modified with Conductive Polymer Composites June 18th, 2013