Nanotechnology Now

• About Us
  
  • Advertising
  • Our Mission
  • Our Team
  • Comments
  • Friends
  • Contact
• Nanotechnology
• News
  
  • Current News
  • Press Releases
  • Submit Press
  • Press kit
  • Interviews
• Columns
• Products
  
  • Our Products
  • Books
  • Featured Books
• Directories
  
  • Companies/Academic
  • Events
  • Glossary
  • Best Of
• Career Center
• Nano-Social Network
• Nano Consulting
• My Account

Home > News > Tegal Awarded Two Key Patents for Nano Layer Deposition

July 22nd, 2004

Tegal Awarded Two Key Patents for Nano Layer Deposition

Abstract:
Tegal Corporation today announced that it has been granted United States Patents, No. 6,689,220 and 6,756,318, which enable nano layer deposition (NLD) of conformal thin films for barrier, copper seed and high-K dielectric applications in advanced microprocessor and memory device production.

Source:
Businesswire

Bookmark:

Related News Press

Patents/IP/Tech Transfer/Licensing

New Paper-like Material Could Boost Electric Vehicle Batteries: Researchers create silicon nanofibers 100 times thinner than human hair for potential applications in batteries for electric cars and personal electronics February 20th, 2015

Nanotech Discoveries Move from Lab to Marketplace with Lintec Deal: Licensing Partnership Brings Together University Technology, New Richardson-Based Facility Directed by Alumni February 9th, 2015

Graphenea granted patent on graphene transfer February 9th, 2015

Toronto-based Environmental Technology Pioneer Green Earth Nano Science Expands in EU February 6th, 2015