Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Tegal Awarded Two Key Patents for Nano Layer Deposition

July 22nd, 2004

Tegal Awarded Two Key Patents for Nano Layer Deposition

Abstract:
Tegal Corporation today announced that it has been granted United States Patents, No. 6,689,220 and 6,756,318, which enable nano layer deposition (NLD) of conformal thin films for barrier, copper seed and high-K dielectric applications in advanced microprocessor and memory device production.

Source:
Businesswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Patents/IP/Tech Transfer/Licensing

NREL’s Advanced Atomic Layer Deposition Enables Lithium-Ion Battery Technology: May 10th, 2017

Forge Nano 2017: 1st Quarter Media Update April 20th, 2017

Making Batteries From Waste Glass Bottles: UCR researchers are turning glass bottles into high performance lithium-ion batteries for electric vehicles and personal electronics April 19th, 2017

'Neuron-reading' nanowires could accelerate development of drugs for neurological diseases April 12th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project