Home > News > Tegal Awarded Two Key Patents for Nano Layer Deposition
July 22nd, 2004
Tegal Awarded Two Key Patents for Nano Layer Deposition
Abstract:
Tegal Corporation today announced that it has been granted United States Patents, No. 6,689,220 and 6,756,318, which enable nano layer deposition (NLD) of conformal thin films for barrier, copper seed and high-K dielectric applications in advanced microprocessor and memory device production.
Source:
Businesswire
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