Home > News > Tegal Awarded Two Key Patents for Nano Layer Deposition
July 22nd, 2004
Tegal Awarded Two Key Patents for Nano Layer Deposition
Tegal Corporation today announced that it has been granted United States Patents, No. 6,689,220 and 6,756,318, which enable nano layer deposition (NLD) of conformal thin films for barrier, copper seed and high-K dielectric applications in advanced microprocessor and memory device production.
Silicon Valley-Based Foresight Valuation Launches STR-IP™, a New Initiative for Startups to Discover the Value of Their Intellectual Property December 18th, 2014
Chemists Fabricate Novel Rewritable Paper: An attractive alternate to regular paper, UC Riverside-developed technology helps address increasing problems in environment and resource sustainability December 2nd, 2014
Dicerna Announces License Agreement with Tekmira to Advance Dicerna’s PH1 Development Program November 17th, 2014
First genetic-based tool to detect circulating cancer cells in blood: NanoFlares light up individual cells if breast cancer biomarker is present November 17th, 2014