Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > New System Introduced by FEI

July 14th, 2004

New System Introduced by FEI

Abstract:
FEI Company has introduced its fifth-generation system for advanced front and back-side circuit editing on devices with line widths down to 65 nm. With the highest performance etch and deposition capabilities available, the Vectra(TM) Gen5 focused ion-beam (FIB) system enables semiconductor developers to modify circuit operation, optimize device performance and freeze revised designs without having to fabricate new prototypes.

Source:
PRNewswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

Scientists take key step toward custom-made nanoscale chemical factories: Berkeley Lab researchers part of team that creates new function in tiny protein shell structures February 6th, 2016

Discovery of the specific properties of graphite-based carbon materials February 6th, 2016

Study reveals how herpes virus tricks the immune system February 5th, 2016

Hepatitis virus-like particles as potential cancer treatment February 5th, 2016

Tools

Researchers discover new phase of boron nitride and a new way to create pure c-BN February 5th, 2016

Cornell researchers create first self-assembled superconductor February 1st, 2016

New record in nanoelectronics at ultralow temperatures January 28th, 2016

LC.300 Series Nanopositioning Controller from nPoint January 28th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic