Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > New System Introduced by FEI

July 14th, 2004

New System Introduced by FEI

Abstract:
FEI Company has introduced its fifth-generation system for advanced front and back-side circuit editing on devices with line widths down to 65 nm. With the highest performance etch and deposition capabilities available, the Vectra(TM) Gen5 focused ion-beam (FIB) system enables semiconductor developers to modify circuit operation, optimize device performance and freeze revised designs without having to fabricate new prototypes.

Source:
PRNewswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

ICN2 researchers compute unprecedented values for spin lifetime anisotropy in graphene November 17th, 2017

Math gets real in strong, lightweight structures: Rice University researchers use 3-D printers to turn century-old theory into complex schwarzites November 16th, 2017

The stacked color sensor: True colors meet minimization November 16th, 2017

Nanometrics to Participate in the 6th Annual NYC Investor Summit 2017 November 16th, 2017

Tools

Nanometrics to Participate in the 6th Annual NYC Investor Summit 2017 November 16th, 2017

Nanometrics Announces $50 Million Share Repurchase Program November 15th, 2017

Nanometrics Board of Directors Names Pierre-Yves Lesaicherre President and CEO November 14th, 2017

Oxford Instruments announces winner of the 2017 Sir Martin Wood Prize for Japan November 14th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project