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July 14th, 2004

New System Introduced by FEI

FEI Company has introduced its fifth-generation system for advanced front and back-side circuit editing on devices with line widths down to 65 nm. With the highest performance etch and deposition capabilities available, the Vectra(TM) Gen5 focused ion-beam (FIB) system enables semiconductor developers to modify circuit operation, optimize device performance and freeze revised designs without having to fabricate new prototypes.


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