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Home > News > Lithography gear switches for 65 nm

July 12th, 2004

Lithography gear switches for 65 nm

Abstract:
With 157-nanometer optical lithography having "missed the window" for the upcoming 65-nm process node, International Sematech has all but slammed the door on the decade-long 157-nm development effort. The consortium said last week that it is opening an Immersion Technology Center (iTC) here to focus on 193-nm immersion lithography, with an eye toward possibly extending the technology to the 32-nm process node.

Source:
EETimes

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