Home > News > Nanoscale patterning using photochemistry
July 10th, 2004
Nanoscale patterning using photochemistry
Abstract:
Shuqing Sun and Graham Leggett at the University of Sheffield1 have developed a photochemical technique that allows the fabrication of structures with dimensions as small as 20 nm. The researchers use a near-field scanning optical microscope coupled to an ultraviolet laser to selectively oxidize a strongly bound monolayer adsorbed on a gold surface.
Source:
* Nature
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