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Home > News > Nanoscale patterning using photochemistry

July 10th, 2004

Nanoscale patterning using photochemistry

Abstract:
Shuqing Sun and Graham Leggett at the University of Sheffield1 have developed a photochemical technique that allows the fabrication of structures with dimensions as small as 20 nm. The researchers use a near-field scanning optical microscope coupled to an ultraviolet laser to selectively oxidize a strongly bound monolayer adsorbed on a gold surface.

Source:
* Nature

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