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Home > News > EV Group Unveils NanoAlign Technology

July 8th, 2004

EV Group Unveils NanoAlign Technology

Abstract:
EV Group, a leading supplier of wafer-bonding and lithography equipment, today announced that it has developed an advanced aligner technology that improves competitiveness of full-field lithography by providing the industry's highest alignment accuracy and resolution at lowest cost of ownership. The new NanoAlign Technology features active run-out control and sub-100nm dynamic alignment resolution, complemented by UV-Nanoimprint (UV-NIL) capability.

Source:
TMCnet

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