Home > News > Applied NanoWorks Announces Pinnacle Nano-Oxides
June 24th, 2004
Applied NanoWorks Announces Pinnacle Nano-Oxides
Abstract:
Applied NanoWorks, Inc. today announced the immediate availability of PinnacleAF Nano-Oxides, a family of four oxide abrasives that deliver tight size distributions below 10nm in a water suspension. Nano-abrasives are used in Chemical Mechanical Polishing (CMP) processes for semiconductor integrated circuit manufacture. Smaller abrasive particle sizes enable the semiconductor industry to maintain quality control while shrinking the size of their chip designs in the drive to lower cost per computer chip.
Source:
Businesswire
Related News Press |
Products
NEI Corporation introduces UV-Protect Technology to NANOMYTE® Coating Line April 9th, 2018
STMicroelectronics Peps Up Booming Social-Fitness Scene with Smart Motion Sensors for Better Accuracy, Longer Battery Life, and Faster Time to Market January 2nd, 2017
Cutting-edge nanotechnologies are breaking into industries November 18th, 2016
![]() |
||
![]() |
||
The latest news from around the world, FREE | ||
![]() |
![]() |
||
Premium Products | ||
![]() |
||
Only the news you want to read!
Learn More |
||
![]() |
||
Full-service, expert consulting
Learn More |
||
![]() |