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June 24th, 2004
Applied NanoWorks Announces Pinnacle Nano-Oxides
Applied NanoWorks, Inc. today announced the immediate availability of PinnacleAF Nano-Oxides, a family of four oxide abrasives that deliver tight size distributions below 10nm in a water suspension. Nano-abrasives are used in Chemical Mechanical Polishing (CMP) processes for semiconductor integrated circuit manufacture. Smaller abrasive particle sizes enable the semiconductor industry to maintain quality control while shrinking the size of their chip designs in the drive to lower cost per computer chip.
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