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Home > News > Samsung develops CVD wiring process for 70-nm DRAM

May 28th, 2004

Samsung develops CVD wiring process for 70-nm DRAM

Abstract:
Samsung Electronics Co. Ltd. has developed a chemical vapor deposition (CVD) method for depositing aluminum interconnect in DRAMs using a 70-nm manufacturing process, the company said Thursday (May 27). The company also said it expects to unveil "70-nm class" DRAMs before the end of 2004.

Source:
EETimes

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