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Home > News > Inorganic spin coat process readied for TFTs

March 17th, 2004

Inorganic spin coat process readied for TFTs

A new spin-on process for inorganic semiconductor films developed at IBM Corp.'s Thomas J. Watson Research Center could usher in a new phase for electronics based on thin-film transistor (TFT) technology. The novel aspect of the process is the use of a catalyst to facilitate the formation of very thin 50-nm films consisting of chalcogenide compounds that act as the channel for TFTs.


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