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Home > News > Fluid scheme yields high-dielectric films

February 4th, 2004

Fluid scheme yields high-dielectric films

Abstract:
A fundamentally new approach to creating nanostructures by forming them with supercritical fluids could be used to make dielectric films used in semiconductor processes. The approach is being forged in a joint project between the University of Massachusetts Amherst and Novellus Systems Inc.

Source:
EETimes

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