Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Immersion could extend to 22-nm node

January 28th, 2004

Immersion could extend to 22-nm node

Abstract:
Taiwan Semiconductor Manufacturing Corp. plans to introduce immersion lithography for critical layers of the 65-nm node, starting in the middle of 2005, said Burn Lin, senior director of the micropatterning technology division at TSMC.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Mexican scientist in the Netherlands seeks to achieve data transmission ... speed of light September 20th, 2016

Towards Stable Propagation of Light in Nano-Photonic Fibers September 20th, 2016

PHENOMEN is a FET-Open Research Project aiming to lay the foundations a new information technology September 19th, 2016

NIST Patents Single-Photon Detector for Potential Encryption and Sensing Apps September 16th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic