Nanotechnology Now

• About Us
  
  • Advertising
  • Our Mission
  • Our Team
  • Comments
  • Friends
  • Contact
• Nanotechnology
• News
  
  • Current News
  • Press Releases
  • Submit Press
  • Press kit
  • Interviews
• Columns
• Products
  
  • Our Products
  • Books
  • Featured Books
• Directories
  
  • Companies/Academic
  • Events
  • Glossary
  • Best Of
• Career Center
• Nano-Social Network
• Nano Consulting
• My Account

Home > News > Nikon launches EUV lithography development

January 15th, 2004

Nikon launches EUV lithography development

Abstract:
Nikon Corp. said Wednesday it will begin full-scale development of extreme ultraviolet lithography systems in 2004 and will begin offering working tools by 2006. Nikon had already announced an aggressive development plan for 193-nm ArF immersion lithography, with shipments planned as early as 2005. Nikon intends to offer an ArF dry tool with high NA of 0.9, then an ArF immersion tool for the 45-nm node and, finally, EUV for 45-nm manufacturing and beyond.

Source:
EETimes

Bookmark:

Related News Press

Chip Technology

Which qubit my dear? New method to distinguish between neighbouring quantum bits June 18th, 2013

SEMATECH to Address Critical Supply Chain Challenges and Present Latest Technology Advances at SEMICON West 2013 June 17th, 2013

Imec shows multiple enhancement options for next-generation FinFETs: Leading nano-electronics R&D center addresses key challenges of Germanium finFET technology at VLSI 2013 June 14th, 2013

Imec showcases innovation in RRAM R&D at VLSI Technology Symposium June 14th, 2013

Tools

Beneq’s comprehensive industrial Thin Film Coating Services shorten time to market June 18th, 2013

Which qubit my dear? New method to distinguish between neighbouring quantum bits June 18th, 2013

Pioneering breakthrough of chemical nanoengineering to design drugs controlled by light June 18th, 2013

Hitachi announces the SU8200 – a new type of cold field emitter SEM June 17th, 2013