Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Nikon launches EUV lithography development

January 15th, 2004

Nikon launches EUV lithography development

Nikon Corp. said Wednesday it will begin full-scale development of extreme ultraviolet lithography systems in 2004 and will begin offering working tools by 2006. Nikon had already announced an aggressive development plan for 193-nm ArF immersion lithography, with shipments planned as early as 2005. Nikon intends to offer an ArF dry tool with high NA of 0.9, then an ArF immersion tool for the 45-nm node and, finally, EUV for 45-nm manufacturing and beyond.


Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

RIT researchers improve fabrication process of nano-structures for electronic devices: Use of indium gallium phosphide with I-MacEtch processing shows promise for more cost effective fabrication and increased performance in devices from photonics to telecommunications March 20th, 2018

Leti and Inac Show Path to Creating Building Blocks of Quantum Processors With 28Si isotope in a CMOS Line: Fabrication of Isotopically Enriched, Industry-Compatible Wafers Points Way To Realizing Silicon Spin Quantum Bits with Enhanced Fidelity March 20th, 2018

GLOBALFOUNDRIES Launches RF Ecosystem Program to Accelerate Time-to-Market for Wireless Connectivity, Radar and 5G Applications: RFWave Partner Program expands the ecosystem and enables faster product deployment on GFs RF technology platforms March 20th, 2018

Unexpected effect could lead to lower-power memory, computing devices March 17th, 2018


Imaging technique pulls plasmon data together: Rice University scientists' hyperspectral method analyzes many plasmonic nanoparticles in an instant March 16th, 2018

Movable silicon 'lenses' enable neutrons to see new range of details inside objects March 15th, 2018

Jim Barnhart Joins Nanometrics as Senior Vice President of Operations March 15th, 2018

Department of Materials Test Engineering (WPT) at TU Dortmund University uses Deben CT5000TEC stage to perform X-ray micro-tomography experiments for better understanding of damage progression in composite materials March 13th, 2018

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project