Home > News > Japanese firm makes 45 nano litho breakthrough
August 18th, 2003
Japanese firm makes 45 nano litho breakthrough
Abstract:
According to a report in the Nihon Keizai Shimbun, a Japanese manufacturer, Mitsui Mining and Smelting, has created a material that can be used for F2 lithography. This, it explains, is a next gen stepper system using a fluorine laser as the light source and that will be able to create 45 nanometer circuit lines on semiconductors.
Source:
TheInquirer
Bookmark:
| Related News Press |
Chip Technology
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Utilizing palladium for addressing contact issues of buried oxide thin film transistors April 5th, 2024
HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||