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August 18th, 2003
Japanese firm makes 45 nano litho breakthrough
According to a report in the Nihon Keizai Shimbun, a Japanese manufacturer, Mitsui Mining and Smelting, has created a material that can be used for F2 lithography. This, it explains, is a next gen stepper system using a fluorine laser as the light source and that will be able to create 45 nanometer circuit lines on semiconductors.
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