Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Intel keeping options open at 32-nm node

July 13th, 2003

Intel keeping options open at 32-nm node

Abstract:
Despite its decision to pass on 157-nm lithography at the 45-nm node, Intel Corp. is "keeping all of its options open" for the 32-nm node, including 193-immersion lithography and 157-nm tools, said Peter Silverman, director of lithography capital equipment at Intel Corp.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Leti Integrates Hybrid III-V Silicon Lasers on 200mm Wafers with Standard CMOS Process December 6th, 2017

Leti Breakthroughs Point Way to Significant Improvements in SoC Memories December 6th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project