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Home > News > Photronics, MII devise first 'nano-imprint templates'

February 26th, 2003

Photronics, MII devise first 'nano-imprint templates'

Abstract:
During the SPIE Microlithography conference here, Photronics Inc. and Molecular Imprints Inc. (MII) claimed to have demonstrated and built one of the world's first masks--or templates--for nano-imprint lithography applications.

Source:
EETimes

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