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January 29th, 2003
ISMT and UAlbany Close Deal on EUV Lithography Program
The University at Albany and International SEMATECH, announced today that they have completed negotiations on a joint five-year program to accelerate the development of next generation lithography. Under the terms of the contract, ISMT will conduct a program in EUV lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist, and EUV extensions -- at UAlbany's new state-of-the-art 300 mm wafer cleanroom complex.
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