Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > News > ISMT and UAlbany Close Deal on EUV Lithography Program

January 29th, 2003

ISMT and UAlbany Close Deal on EUV Lithography Program

Abstract:
The University at Albany and International SEMATECH, announced today that they have completed negotiations on a joint five-year program to accelerate the development of next generation lithography. Under the terms of the contract, ISMT will conduct a program in EUV lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist, and EUV extensions -- at UAlbany's new state-of-the-art 300 mm wafer cleanroom complex.

Source:
iWire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

Industrial Nanotech, Inc. to Publish PCAOB Audited Financials July 31st, 2014

Nanostructured metal-oxide catalyst efficiently converts CO2 to methanol: Highly reactive sites at interface of 2 nanoscale components could help overcome hurdle of using CO2 as a starting point in producing useful products July 31st, 2014

Carnegie Mellon Chemists Create Nanofibers Using Unprecedented New Method July 31st, 2014

Pressure probing potential photoelectronic manufacturing compound July 31st, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE