Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > News > ISMT and UAlbany Close Deal on EUV Lithography Program

January 29th, 2003

ISMT and UAlbany Close Deal on EUV Lithography Program

Abstract:
The University at Albany and International SEMATECH, announced today that they have completed negotiations on a joint five-year program to accelerate the development of next generation lithography. Under the terms of the contract, ISMT will conduct a program in EUV lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist, and EUV extensions -- at UAlbany's new state-of-the-art 300 mm wafer cleanroom complex.

Source:
iWire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

University of Minnesota engineers make sound loud enough to bend light on a computer chip: Device could improve wireless communications systems November 28th, 2014

Study details laser pulse effects on behavior of electrons November 28th, 2014

Single-atom gold catalysts may offer path to low-cost production of fuel and chemicals November 28th, 2014

Production of Anticancer Drug from Nanofibers in Iran November 28th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE