Home > News > ISMT and UAlbany Close Deal on EUV Lithography Program
January 29th, 2003
ISMT and UAlbany Close Deal on EUV Lithography Program
The University at Albany and International SEMATECH, announced today that they have completed negotiations on a joint five-year program to accelerate the development of next generation lithography. Under the terms of the contract, ISMT will conduct a program in EUV lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist, and EUV extensions -- at UAlbany's new state-of-the-art 300 mm wafer cleanroom complex.
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