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Home > Nanotechnology Columns > Park Systems

Park Systems

July 3rd, 2013
Park Systems Introduces Park NX-HDM: Fully Automated Automatic Defect Review and Sub-Angstrom Surface Roughness for Hard Disk Media and Semiconductor Substrates
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

(Santa Clara, California, April 9, 2013) - Park Systems, world leader in atomic force microscopy (AFM) for the semiconductor and hard disk markets introduces Park NX-HDM, a fully automated automatic defect review and sub-angstrom surface roughness atomic force microscopy (AFM) system for device substrates and disk media, the first metrology tool capable of providing this level of accuracy and automation. The NX-HDM system sets a new standard for the industry in automatic defect review AFM technology by increasing throughput up to 1000 percent and an offering of 30% higher success rate than prior system, analyzing, identifying and scanning media for all wafer sizes up to 150mm.
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March 25th, 2013
Park Systems Introduces Park XE7: Affordable and Innovative Research-Grade Atomic Force Microscope with Flexible Sample Handling
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Santa Clara, California, February 22, 2013 - Park Systems announces the debut of the Park XE7, an affordable, research-grade Atomic Force Microscope (AFM). This new product, which includes flexible sample handling, enables scientists to enjoy innovative and more powerful AFM technology than competing products. Read the Whole Article


February 18th, 2013
Park Dual Servo System Provides the Most Accurate and Orthogonal AFM Scan
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Closed-loop XY scan with dual servo achieves the unprecedented accuracy and orthogonality in AFM scans

Santa Clara, California, USA, December 3, 2012 - Park Systems announces today the release of a closed-loop XY scanner with a Dual Servo system. This innovation loosely decouples the X and Y scanners to eliminate crosstalk and adds a symmetrical, low-noise position sensor on each axis to produce the most accurate and orthogonal (independent) atomic force microscopy in the industry.
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January 27th, 2013
Park True Sample TopographyTM Provides the Most Accurate AFM Topography Without Piezo Creep Error
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Industry leading low-noise Z detector is used for the default AFM topography signal.

Santa Clara, Calfornia, October 26, 2012 - Park Systems announces True Sample TopographyTM describing Park technology that eliminates piezoelectric creep errors, resulting in the extremely accurate profile of a sample surface. True Sample TopographyTM features an industry-leading Z-detector with a noise level low enough to use it for the AFM topography signal.
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December 10th, 2012
Park True Non-Contact ModeTM Uncovers the Secrets of Inside Cell Membrane.
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Santa Clara, California, December 10, 2012 - Park Systems XE-Bio, the leading atomic force microscopy (AFM) system for cell biology imaging, was featured in the Journal of Electron Microscopy [October, 2012] in an article entitled "Use of the unroofing technique for atomic force microscopic imaging of the intra-cellular cytoskeleton under aqueous conditions." The article was the Editor's Choice for the bimonthly journal and an image from the article taken by the Park XE-Bio (the cytoplasmic surface of the ventral cell membrane) was the journal's cover image. Read the Whole Article


November 26th, 2012
Park Systems Unveils the NX20: World's Most Accurate AFM for Failure Analysis and Quality Assurance
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

The NX20 is the newest model of the NX product line with the world's most accurate AFM. Designed for the needs of FA and QA in the hard disk drive and semiconductor industries, the NX20 stands out for its unmatched non-contact mode that guarantees long-running probe tip sharpness. That's the key to the highest accuracy and repeatability for roughness measurement and defect review. It's also key to high productivity and the lowest AFM lifecycle costs. Read the Whole Article


May 7th, 2012
Targeted Patch Clamping by Ion Conductance Microscopy
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Targeted patch clamping (TPC) combines patch clamping with ion conductance microscopy (ICM) to guide the pipette to a specific patch clamping position. Read the Whole Article


April 6th, 2012
Surface Roughness Measurement of Media and Substrate
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Atomic force microscopy (AFM) is useful for investigating the surfaces and characteristics of different materials down to nanometer detail1-6. Accurate surface roughness measurement is not only a highly powerful technique for understanding the basic physics of materials, but also very useful in examining device structures and their failure mechanisms. In addition, roughness repeatability is one of the very important factors in industrial applications as it relates to the customer's product reliability. Park AFM's True Non-Contact Mode is especially essential for accurate and repeatable surface roughness measurement. In order to measure accurate and repeatable roughness, two key requirements need to be satisfied. First is maintaining the tip sharpness and the other is lowering the system noise. In this paper, we examine these two requirements for measuring surface roughness. Also, we demonstrate why True Non-Contact mode is powerful for accurate roughness measurement by testing a tip-check sample and ultra flat media samples using Park AFM. Read the Whole Article


March 28th, 2012
True Sample Topography Acquired by Low-Noise Z Position Sensor
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

It has been used not only in the academic instrumentation, but in the commercial AFM products because of its simplicity in structure, and its possibility to move continuously in the nanometer scale. However, it has also been associated with hysteresis and creep errors that prevented conventional AFMs from providing an accurate topography of a sample. Park has developed Park NX10 featuring a very low noise Z sensor that enables a true topography AFM scanning of a sample. Read the Whole Article


March 20th, 2012
Cell Volume Measurement of Ion Conductance Microscopy
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Ion conductance microscopy (ICM) is a useful tool for obtaining non-invasive images of cell surface topography. Recently, it is being used for imaging live cells in culture medium. Cell volume is one of the important factors for cell research because the regulation of cell volume is fundamental to cellular homeostatic mechanism. ICM can provide accurate volume measurement of cells due to its ability to acquire quantitative dimension information. Furthermore, it can calculate cell volume changes over time caused by physiological environment or its cell status changes. In this paper, live HEK293T cell was successfully imaged and its volume changes monitored using Park ICM . Read the Whole Article


March 19th, 2012
ICM Image of Suspended Collagen Fibrils
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Ion conductance microscopy (ICM)1 is useful for obtaining contact-free images of the surface topography and has been used for imaging cultured cells under liquid conditions2. The approach-retract scanning (ARS) mode is a new mode of ICM, which is especially powerful for imaging samples with steep slopes3. To examine the applicability of the ARS mode for imaging biological samples with greater height gaps, dense collagen fibril networks were examined by ICM4. Read the Whole Article


March 18th, 2012
High Throughput and Non-Destructive Sidewall Roughness Measurement Using 3-Dimensional Atomic Force Microscopy
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

As the feature size of the semiconductor device is becoming increasingly smaller and the transistor has become three-dimensional (e.g. Fin-FET structure), a simple Line Edge Roughness (LER) is no longer sufficient for characterizing these devices. Sidewall Roughness (SWR) is now the more proper metric for these metrology applications. However, current metrology technologies, such as SEM and OCD, provide limited information on the sidewall of such small structures. The subject of this study is the sidewall roughness measurement with a three-dimensional Atomic Force Microscopy (AFM) using tilted Z scanner. This 3D AFM is based on a decoupled XY and Z scanning configuration, in which the Z scanner can be intentionally tilted to the side. A sharp conical tip is typically used for imaging, which provides high resolution capability on both the flat surfaces (top and bottom) and the steep sidewalls. Read the Whole Article


March 1st, 2012
Free AFM Webinar - Park NX10: The World's Most Accurate AFM
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Webinar - Overview of technology behind Park NX10 Read the Whole Article


December 9th, 2011
Park Systems Japan to Sponsor AFM Bio-Imaging Forum
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Japanese Society of Microscopy has announced that Park Systems Japan will be the sponsor for its upcoming AFM Bio-Imaging Forum. Set to take place at WINC AICHI (room 1303) in Nagoya on Tuesday, December 27th, 2011, the forum will invite leading Japanese scientists and researchers who apply state of the art AFM techniques to study biophysics, biochemistry, and cell biology. Read the Whole Article


December 8th, 2011
Park Systems Unveils NX10: World's Most Accurate AFM
Sue. J. Kim
Global Marketing Manager, Park Systems Corp.

Suwon, Korea, November 11, 2011 - Park Systems has introduced the NX10, the world's most accurate AFM, as the flagship AFM of its new product line. Now available worldwide, the NX10 brings unparalleled imaging accuracy, scan speeds, and tip life to the next generation of researchers, all at an affordable price. The NX platform builds on Park Systems' 28 years of technology leadership in AFM data accuracy, and its reputation as the leading nanotechnology solutions partner to research and industry. Read the Whole Article

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