Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International

Wikipedia Affiliate Button

Home > Press > CEA-Leti Moves 3D Sequential Integration Closer to Commercialization: Paper Presented at IEDM 2018 Describes Breakthroughs in Six Process Steps

Abstract:
Leti, a research institute at CEA Tech, has reported breakthroughs in six 3D-sequential-integration process steps that previously were considered showstoppers in terms of manufacturability, reliability, performance or cost.

CEA-Leti Moves 3D Sequential Integration Closer to Commercialization: Paper Presented at IEDM 2018 Describes Breakthroughs in Six Process Steps

San Francisco, CA | Posted on December 3rd, 2018

CoolCubeTM, CEA-Leti’s 3D monolithic or 3D sequential CMOS technology allows vertically stacking several layers of devices with a unique connecting-via density above tens of million/mm2. This More Moore technology decreases dice area by a factor of two, while providing a 26 percent gain in power. The wire-length reduction enabled by CoolCubeTM also improves yield and lowers costs. In addition to power savings, this true 3D integration opens diversification perspectives thanks to more integration of functions. From a performance optimization and manufacturing-enablement perspective, processing the top layer in a front end of line (FEOL) environment with a restricted thermal budget requires process modules optimization.

CEA-Leti’s recent 3D sequential integration results were presented Dec. 3 at IEDM 2018 in the paper, “Breakthroughs in 3D Sequential Integration”. The breakthroughs are:

§ Low-resistance poly-Si gate for the top field-effect transistors (FETs)

§ Full LT RSD (low temperature raised source and drain) epitaxy, including surface preparation

§ Stable bonding above ultra low-k (ULK)

§ Stability of intermediate back end of line (iBEOL) between tiers with standard ULK/Cu technology

§ Efficient contamination containment for wafers with Cu/ULK iBEOL, enabling their re-introduction in front end of line (FEOL) for top FET processing, and

§ Smart CutTM process above a CMOS wafer.



To obtain high-performance top FETs, low gate access resistance was achieved using UV nano-second laser recrystallization of in-situ doped amorphous silicon. Full 500°C selective silicon-epitaxy process was demonstrated with an advanced LT surface preparation and a combination of dry-and-wet etch preparation. Epitaxial growth was demonstrated with the cyclic use of a new silicon precursor and dichlorine Cl2 etching. At the same time, the project paved the way to manufacturability of 3D sequential integration including iBEOL with standard ULK and Cu-metal lines.

A bevel-edge contamination containment strategy comprised of three steps (bevel etch, decontamination, encapsulation) enabled reintroducing wafers in an FEOL environment following the BEOL process. In addition, the project also demonstrated for the first time the stability of line-to-line breakdown voltage for interconnections submitted to 500°C. The work also demonstrated a Smart CutTM transfer of a crystalline silicon layer on a processed bottom level of FD-SOI CMOS devices, as an alternative to the SOI bonding-and-etch back process scheme for top channel fabrication.

####

About Leti
Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro-& nanotechnologies, tailoring differentiating applicative solutions for global companies, SMEs and startups. Leti tackles critical challenges in healthcare, energy and digital migration. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities. With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network. This year, the institute celebrates its 50th anniversary. Follow us on www.leti-cea.com and @CEA_Leti.

Follow us on www.leti.fr/en and @CEA_Leti.

CEA Tech is the technology research branch of the French Alternative Energies and Atomic Energy Commission (CEA), a key player in innovative R&D, defence & security, nuclear energy, technological research for industry and fundamental science, identified by Thomson Reuters as the second most innovative research organization in the world. CEA Tech leverages a unique innovation-driven culture and unrivalled expertise to develop and disseminate new technologies for industry, helping to create high-end products and provide a competitive edge.

For more information, please click here

Contacts:
Press Contact

Agency

+33 6 74 93 23 47

Copyright © Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanometrics to Announce Second Quarter Financial Results on July 30, 2019 July 17th, 2019

Breakthrough material could lead to cheaper, more widespread solar panels and electronics July 16th, 2019

Caught in the act: Images capture molecular motions in real time July 15th, 2019

NUS ‘smart’ textiles boost connectivity between wearable sensors by 1,000 times: Metamaterials are incorporated into conventional clothing to dramatically improve signal strength between electronic devices, allowing for new applications July 15th, 2019

Chip Technology

Nanometrics to Announce Second Quarter Financial Results on July 30, 2019 July 17th, 2019

Breakthrough material could lead to cheaper, more widespread solar panels and electronics July 16th, 2019

Engineers revolutionize molecular microscopy: Single molecules measure electrical potentials July 12th, 2019

'Tsunami' on a silicon chip: a world first for light waves: Sydney-Singapore team manipulates soliton photonic waves on a silicon chip July 5th, 2019

Announcements

Nanometrics to Announce Second Quarter Financial Results on July 30, 2019 July 17th, 2019

Breakthrough material could lead to cheaper, more widespread solar panels and electronics July 16th, 2019

Caught in the act: Images capture molecular motions in real time July 15th, 2019

NUS ‘smart’ textiles boost connectivity between wearable sensors by 1,000 times: Metamaterials are incorporated into conventional clothing to dramatically improve signal strength between electronic devices, allowing for new applications July 15th, 2019

Industrial

CEA’s Precise Localization Technology Boosts Quality Control & Efficiency in Desoutter Tools: Algorithm and Embedded Receptors in Desoutter’s Electric & Power Tools Deliver Real-Time Monitoring & Help Meet Industry 4.0 Goals June 26th, 2019

Researchers unveil how soft materials react to deformation at molecular level June 24th, 2019

Building next gen smart materials with the power of sound May 28th, 2019

New surface treatment could improve refrigeration efficiency: A slippery surface for liquids with very low surface tension promotes droplet formation, facilitating heat transfer May 17th, 2019

Events/Classes

Nanometrics to Announce Second Quarter Financial Results on July 30, 2019 July 17th, 2019

Arrowhead Pharmaceuticals to Present at Upcoming June 2019 Conferences June 2nd, 2019

ACS selects Naomi Halas to represent Americas at ChinaNano: Rice U. pioneer wins 2019 ACS Nano Lectureship Award for the Americas May 29th, 2019

CEA-Leti Develops CMOS Process for High-Performance MicroLEDs That Could Overcome Display-Size Obstacles: New Concept Creates All-in-One RGB MicroLEDs, Eliminates Several Transfer Steps to Receiving Substrate & Boosts Performance May 16th, 2019

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project