Nanotechnology Now - Press Release: Leti to Collaborate with Keysight Technologies To Enable Expansion of FD-SOI Technology: Agreement with Industry-leading, Device-modeling Software Supplier Will Improve Access to Leti-UTSOI Extraction Methodology

Home > Press > Leti to Collaborate with Keysight Technologies To Enable Expansion of FD-SOI Technology: Agreement with Industry-leading, Device-modeling Software Supplier Will Improve Access to Leti-UTSOI Extraction Methodology

Abstract:
CEA-Leti today announced it has signed an agreement with Keysight Technologies, the industry-leading device-modeling software supplier, to adapt Leti’s UTSOI extraction flow methodology within Keysight’s device modeling solutions for high-volume SPICE model generation.

Leti to Collaborate with Keysight Technologies To Enable Expansion of FD-SOI Technology: Agreement with Industry-leading, Device-modeling Software Supplier Will Improve Access to Leti-UTSOI Extraction Methodology

Grenoble, France | Posted on December 7th, 2015

The simulation of the Leti-UTSOI compact model, which is the first complete compact model dedicated to Ultra-Thin Body and Box and Independent Double Gate MOSFETs, is currently available in Keysight’s modeling and simulation tools. This agreement expands the collaboration to include the extraction flow and will enable device-modeling engineers to efficiently create Leti-UTSOI model cards for use in Process Design Kits (PDKs).

“This collaboration between Leti and Keysight will strengthen the global FD-SOI ecosystem by providing an automatic extraction flow for building model cards associated with the Leti-UTSOI models, which are already available in all the major SPICE simulators,” said Marie Semeria, Leti’s CEO. “This professional, automatic extraction-flow solution will address designers’ needs as they weigh FD-SOI’s benefits over competing solutions for the 28nm technology node and below.”
“Keysight’s modeling solutions provide both automation and flexibility for device modeling,” said Todd Cutler, general manager of Keysight EEsof EDA. “The addition of a Leti-UTSOI modeling technology will further expand our offering in CMOS modeling. We have been collaborating with Leti on many projects, and we are pleased to extend our relationship to improve access to the Leti-UTSOI.”

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About CEA Leti
As one of three advanced-research institutes within the CEA Technological Research Division, CEA Tech-Leti serves as a bridge between basic research and production of micro- and nanotechnologies that improve the lives of people around the world. It is committed to creating innovation and transferring it to industry. Backed by its portfolio of 2,800 patents, Leti partners with large industrials, SMEs and startups to tailor advanced solutions that strengthen their competitive positions. It has launched 54 startups. Its 8,500m² of new-generation cleanroom space feature 200mm and 300mm wafer processing of micro and nano solutions for applications ranging from space to smart devices. With a staff of more than 1,800, Leti is based in Grenoble, France, and has offices in Silicon Valley, Calif., and Tokyo. Follow us at www.leti.fr and @CEA_Leti.

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