Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Achieves Breakthrough Defect Reductions in EUV Mask Blanks: Technologists at SEMATECH Successfully Reduce Defects from Multi-layer Deposition of Mask Blanks, Meeting the Defect Requirements for Early Introduction of EUV

Abstract:
SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from the multi-layer deposition of mask blanks used for extreme ultraviolet (EUV) lithography, pushing the technology another significant step toward readiness for high-volume manufacturing (HVM).

SEMATECH Achieves Breakthrough Defect Reductions in EUV Mask Blanks: Technologists at SEMATECH Successfully Reduce Defects from Multi-layer Deposition of Mask Blanks, Meeting the Defect Requirements for Early Introduction of EUV

Albany, NY | Posted on May 6th, 2014

Following a four-year effort to improve deposition tool hardware, process parameters and substrate cleaning techniques, technologists at SEMATECH have, for the first time, deposited EUV multilayers with zero defects per mask at 100 nm sensitivity (SiO2 equivalent). Eliminating these large "killer" defects is essential for the use of EUV in early product development. These results were achieved on a 40 bi-layer Si/Mo film stack and measured over the entire mask blank quality area of 132x132 mm2.

In addition, by subtracting out incoming substrate defects, SEMATECH has demonstrated that the multilayer deposition process itself can achieve zero defects down to 50 nm sensitivity. Coupled with novel improvements to the mask substrate cleaning process to remove incoming defects, this represents the capability to both extend EUV to future nodes by eliminating smaller "killer" defects, and as a step to reducing smaller defects (which can be mitigated) to a level where improved yield and mask cost make EUV a more cost-effective HVM technology.

"SEMATECH's comprehensive programs continue to produce the results that our members and the industry need to show that EUV lithography is manufacturable," said Kevin Cummings, SEMATECH's Lithography manager. "Our Advanced Mask Development program continues to demonstrate practical results for mask blank defect reduction, more efficient deposition and cleaning, effective reticle handling, and other areas that the industry will need for successful EUV lithography manufacturing."
Defects are generally created by the deposition process or formed by decoration of substrate defects during the multilayer deposition process. These types of defects have prevented the quality of mask blanks from keeping pace with roadmap requirements for the production of pilot line and high-volume manufacturing EUV reticles. Reducing defects in the EUV mask blank multilayer deposition system is one of the most critical technology gaps the industry needs to address to enable cost-effective insertion of this technology at the 16 nm half-pitch.

"A low defect density reflective mask blank is considered to be one of the top two critical technology gaps for the commercialization of EUV," said Frank Goodwin, manager of SEMATECH's Advanced Mask Development program. "Through sophisticated defect analysis capabilities and processes, the goal of our work is to enable model-based prediction and data-driven analysis of defect performance for process improvement and component learning. We then use these models to feed into the new deposition tool design."

SEMATECH's Advanced Mask Blank Development program is located at the SUNY College of Nanoscale Science and Engineering (CNSE) in Albany, New York to develop defect-free EUV blanks.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

For more information, please click here

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Solid state physics: Quantum matter stuck in unrest August 1st, 2015

Self-assembling, biomimetic membranes may aid water filtration August 1st, 2015

Transparent, electrically conductive network of encapsulated silver nanowires: A novel electrode for optoelectronics August 1st, 2015

Kalam: versatility personified August 1st, 2015

Chip Technology

This could replace your silicon computer chips: A new semiconductor material made from black phosphorus may be a candidate to replace silicon in future tech July 30th, 2015

March 2016; 6th Int'l Conference on Nanostructures in Iran July 29th, 2015

Meet the high-performance single-molecule diode: Major milestone in molecular electronics scored by Berkeley Lab and Columbia University team July 29th, 2015

Short wavelength plasmons observed in nanotubes: Berkeley Lab researchers create Ludinger liquid plasmons in metallic SWNTs July 28th, 2015

Announcements

Self-assembling, biomimetic membranes may aid water filtration August 1st, 2015

Transparent, electrically conductive network of encapsulated silver nanowires: A novel electrode for optoelectronics August 1st, 2015

Harris & Harris Group Portfolio Company, HZO, Announces Partnerships with Dell and Motorola August 1st, 2015

Advances and Applications in Biosensing, Sensor Power, and Sensor R&D to be Covered at Sensors Global Summit August 1st, 2015

Tools

Heating and cooling with light leads to ultrafast DNA diagnostics July 31st, 2015

Take a trip through the brain July 30th, 2015

Publication on Atomic Force Microscopy based nanoscale IR Spectroscopy (AFM-IR) persists as a 2015 top downloaded paper July 29th, 2015

Nanometrics Announces Upcoming Investor Events July 28th, 2015

Alliances/Trade associations/Partnerships/Distributorships

Harris & Harris Group Portfolio Company, HZO, Announces Partnerships with Dell and Motorola August 1st, 2015

The National Space Society Pays Tribute to Dr. Kalam -- One Of Our Leading Lights Has Joined The Stars August 1st, 2015

Liquipel Debuts Eyesight-Saving ION-Glass Blue Light Protection for iPhones and Androids at RadioShack Stores Nationwide: Liquipel's Unique Protective Screen, Available at RadioShack, Cuts Harmful Blue Light Implicated in Macular Degeneration by 10x July 28th, 2015

Dais Analytic's Business Affiliate in China Announces Ten-Year Strategic Energy Efficiency Business Arrangement With COFCO: Dais Beijing to Perform Feasibility Study on Over 80 Buildings to Improve Efficiencies as Part of Overall Hotel Energy-Savings Project July 23rd, 2015

Printing/Lithography/Inkjet/Inks

Spintronics: Molecules stabilizing magnetism: Organic molecules fixing the magnetic orientation of a cobalt surface/ building block for a compact and low-cost storage technology/ publication in Nature Materials July 25th, 2015

2015 Bulk Graphene Pricing Webinar:The Graphene Council to Host Webinar in Collaboration with Fullerex July 15th, 2015

Leti and EVG Launch INSPIRE, a Lithography Program Aimed At Demonstrating Benefits of Nano-imprint Technology July 15th, 2015

New technology using silver may hold key to electronics advances July 2nd, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project