Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Achieves Breakthrough Defect Reductions in EUV Mask Blanks: Technologists at SEMATECH Successfully Reduce Defects from Multi-layer Deposition of Mask Blanks, Meeting the Defect Requirements for Early Introduction of EUV

Abstract:
SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from the multi-layer deposition of mask blanks used for extreme ultraviolet (EUV) lithography, pushing the technology another significant step toward readiness for high-volume manufacturing (HVM).

SEMATECH Achieves Breakthrough Defect Reductions in EUV Mask Blanks: Technologists at SEMATECH Successfully Reduce Defects from Multi-layer Deposition of Mask Blanks, Meeting the Defect Requirements for Early Introduction of EUV

Albany, NY | Posted on May 6th, 2014

Following a four-year effort to improve deposition tool hardware, process parameters and substrate cleaning techniques, technologists at SEMATECH have, for the first time, deposited EUV multilayers with zero defects per mask at 100 nm sensitivity (SiO2 equivalent). Eliminating these large "killer" defects is essential for the use of EUV in early product development. These results were achieved on a 40 bi-layer Si/Mo film stack and measured over the entire mask blank quality area of 132x132 mm2.

In addition, by subtracting out incoming substrate defects, SEMATECH has demonstrated that the multilayer deposition process itself can achieve zero defects down to 50 nm sensitivity. Coupled with novel improvements to the mask substrate cleaning process to remove incoming defects, this represents the capability to both extend EUV to future nodes by eliminating smaller "killer" defects, and as a step to reducing smaller defects (which can be mitigated) to a level where improved yield and mask cost make EUV a more cost-effective HVM technology.

"SEMATECH's comprehensive programs continue to produce the results that our members and the industry need to show that EUV lithography is manufacturable," said Kevin Cummings, SEMATECH's Lithography manager. "Our Advanced Mask Development program continues to demonstrate practical results for mask blank defect reduction, more efficient deposition and cleaning, effective reticle handling, and other areas that the industry will need for successful EUV lithography manufacturing."
Defects are generally created by the deposition process or formed by decoration of substrate defects during the multilayer deposition process. These types of defects have prevented the quality of mask blanks from keeping pace with roadmap requirements for the production of pilot line and high-volume manufacturing EUV reticles. Reducing defects in the EUV mask blank multilayer deposition system is one of the most critical technology gaps the industry needs to address to enable cost-effective insertion of this technology at the 16 nm half-pitch.

"A low defect density reflective mask blank is considered to be one of the top two critical technology gaps for the commercialization of EUV," said Frank Goodwin, manager of SEMATECH's Advanced Mask Development program. "Through sophisticated defect analysis capabilities and processes, the goal of our work is to enable model-based prediction and data-driven analysis of defect performance for process improvement and component learning. We then use these models to feed into the new deposition tool design."

SEMATECH's Advanced Mask Blank Development program is located at the SUNY College of Nanoscale Science and Engineering (CNSE) in Albany, New York to develop defect-free EUV blanks.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

For more information, please click here

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Non-animal approach to predict impact of nanomaterials on human lung published Archives of Toxicology publishes workshop recommendations May 2nd, 2016

Making invisible physics visible: The Jayich Lab has created a new sensor technology that captures nanoscale images with high spatial resolution and sensitivity May 2nd, 2016

New drug-delivery approach holds potential for treating obesity May 2nd, 2016

Spintronics for future information technologies: Spin currents in topological insulators controlled May 2nd, 2016

Chip Technology

Spintronics for future information technologies: Spin currents in topological insulators controlled May 2nd, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016

Announcements

Non-animal approach to predict impact of nanomaterials on human lung published Archives of Toxicology publishes workshop recommendations May 2nd, 2016

Making invisible physics visible: The Jayich Lab has created a new sensor technology that captures nanoscale images with high spatial resolution and sensitivity May 2nd, 2016

New drug-delivery approach holds potential for treating obesity May 2nd, 2016

Spintronics for future information technologies: Spin currents in topological insulators controlled May 2nd, 2016

Tools

Making invisible physics visible: The Jayich Lab has created a new sensor technology that captures nanoscale images with high spatial resolution and sensitivity May 2nd, 2016

Exploring phosphorene, a promising new material April 29th, 2016

JPK reports on the use of a NanoWizard AFM system at the University of Kaiserslautern to study the interaction of bacteria with microstructured surfaces April 28th, 2016

Chemists use DNA to build the world's tiniest thermometer April 27th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Electrically Conductive Graphene Ink Enables Printing of Biosensors April 23rd, 2016

Leti Extends Collaboration with Qualcomm on CoolCubeTM 3D Integration Technology for High-Density, High-Performance ICs: Collaboration Goals Include Building an Ecosystem To Take the Chip-stacking Technology from Design to Fabrication April 13th, 2016

FEI Partners with Five Pharmaceutical Companies, the Medical Research Council and the University of Cambridge to form Cryo-EM Research Consortium April 5th, 2016

Strem Chemicals and SONA Nanotech Sign Distribution Agreement for the World’s First Gold Nanorods Synthesized without CTAB February 24th, 2016

Printing/Lithography/Inkjet/Inks

Electrically Conductive Graphene Ink Enables Printing of Biosensors April 23rd, 2016

Highlights from the Graphene Flagship April 22nd, 2016

Penn engineers develop first transistors made entirely of nanocrystal 'inks April 11th, 2016

Researchers use 3-D printing to create structure with active chemistry April 4th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic