Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Abstract:
SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, and related areas of metrology at the SPIE Advanced Lithography 2014 conferences taking place February 23-27 in San Jose, CA.

SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Albany, NY | Posted on February 20th, 2014

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

"Although serious challenges remain to further enable EUV pilot line readiness and advance EUV extendibility, steady progress has been realized and we are looking forward to sharing our results on some of the most critical aspects of the development of EUV infrastructure," said Michael Lercel, director of Lithography, Metrology, and Nanodefectivity at SEMATECH. "SEMATECH lithographers will recount achievements in multiple areas of EUV infrastructure, including resist and mask blank development, and the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to production."

Next to meeting EUV productivity targets, defect-free EUV mask blanks are the most important element needed to enable EUV HVM introduction. SEMATECH's mask blank technologists will share the progress made at SEMATECH's Mask Blank Development Center in eliminating so-called "killer-type" mask blanks defects. Achieving this goal is critical to enable early adopters of EUV lithography.

The development of resist materials depends on the availability of high resolution micro-exposure tools. SEMATECH researchers will report on current performance and progress in upgrading these tools with the higher numerical aperture lenses needed to meet requirements for sub 10 nm resist materials development. In addition, recent results from SEMATECH's new imaging materials platform research will be reported.

In an invited paper addressing key infrastructure gaps for EUV in the area of mask metrology, Carl Zeiss and SEMATECH will share the results from the integration of the industry's first-ever commercial actinic aerial image metrology (AIMS™) EUV system.

"In partnership with Carl Zeiss, SEMATECH's EUV Mask Infrastructure initiative has made impressive advances through collaborative research with chip manufacturers. The AIMS™ tool is already producing mask-scale aerial images for 16 nm half-pitch node," said Michael Goldstein, EMI program manager and senior principal physicist at SEMATECH. "These results demonstrate that significant progress is being made in the development of critical metrology tools required to fabricate defect-free masks."

Other SEMATECH papers will showcase advances in metrology techniques and applications, including critical dimension atomic force microscopy (CD-AFM), critical dimension X-ray scattering (CD-SAXS), 3D characterization of directed self-assembly (DSA) by scatterometry, and a through-focus scanning optical microscopy (TSOM) technique being explored for future defect inspection and high-volume manufacturing of high-aspect ratio features. Critical dimension scanning electron microscopy (CD-SEM) limits and extendibility will also be analyzed, as well as improvements to CD-SEM roughness measurement strategy.

For a complete list of these and other presentations at SPIE please visit bit.ly/1eKaYgO.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Chains of nanogold – forged with atomic precision September 23rd, 2016

Tattoo therapy could ease chronic disease: Rice-made nanoparticles tested at Baylor College of Medicine may help control autoimmune diseases September 23rd, 2016

Nanotech Grants Options September 22nd, 2016

Coffee-infused foam removes lead from contaminated water September 21st, 2016

Chip Technology

Mexican scientist in the Netherlands seeks to achieve data transmission ... speed of light September 20th, 2016

Towards Stable Propagation of Light in Nano-Photonic Fibers September 20th, 2016

PHENOMEN is a FET-Open Research Project aiming to lay the foundations a new information technology September 19th, 2016

NIST Patents Single-Photon Detector for Potential Encryption and Sensing Apps September 16th, 2016

Announcements

Chains of nanogold – forged with atomic precision September 23rd, 2016

Tattoo therapy could ease chronic disease: Rice-made nanoparticles tested at Baylor College of Medicine may help control autoimmune diseases September 23rd, 2016

Nanotech Grants Options September 22nd, 2016

Coffee-infused foam removes lead from contaminated water September 21st, 2016

Events/Classes

Oxford Instruments is ‘Bringing the Nanoworld Together’ in India once again - 22 - 23 November 2016 | IISc Bangalore September 21st, 2016

BBI Solutions launches innovative conjugate blocking technology that enhances signal intensity for lateral flow immunoassays September 20th, 2016

Iran to hold intl. school on application of nanomaterials in medicine September 20th, 2016

PHENOMEN is a FET-Open Research Project aiming to lay the foundations a new information technology September 19th, 2016

Alliances/Trade associations/Partnerships/Distributorships

PHENOMEN is a FET-Open Research Project aiming to lay the foundations a new information technology September 19th, 2016

SEMI and MSIG Join Together in Strategic Association Partnership: MEMS & Sensors Industry Group Brings New MEMS and Sensors Community to SEMI to Increase Combined Member Value September 15th, 2016

Leti and Oberthur Technologies Partner to Explore New Solutions in Fast-growing Digital Era September 12th, 2016

Synopsys Joins GLOBALFOUNDRIES’ FDXcelerator Partner Program to Enable Innovative Designs Using the FD-SOI Process: Program Gives Synopsys Access to GLOBALFOUNDRIES’ FDX Portfolio and Provides Customers with Tools that Support the Differentiated Features of FD-SOI September 8th, 2016

Printing/Lithography/Inkjet/Inks/Bio-printing

Iran to hold intl. school on application of nanomaterials in medicine September 20th, 2016

Tailored probes for atomic force microscopes: 3-D laser lithography enhances microscope for studying nanostructures in biology and engineering/ publication in Applied Physics Letters August 11th, 2016

Smarter self-assembly opens new pathways for nanotechnology: Brookhaven Lab scientists discover a way to create billionth-of-a-meter structures that snap together in complex patterns with unprecedented efficiency August 9th, 2016

Nanoscientists develop the 'ultimate discovery tool': Rapid discovery power is similar to what gene chips offer biology June 25th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic