Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Abstract:
SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, and related areas of metrology at the SPIE Advanced Lithography 2014 conferences taking place February 23-27 in San Jose, CA.

SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Albany, NY | Posted on February 20th, 2014

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

"Although serious challenges remain to further enable EUV pilot line readiness and advance EUV extendibility, steady progress has been realized and we are looking forward to sharing our results on some of the most critical aspects of the development of EUV infrastructure," said Michael Lercel, director of Lithography, Metrology, and Nanodefectivity at SEMATECH. "SEMATECH lithographers will recount achievements in multiple areas of EUV infrastructure, including resist and mask blank development, and the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to production."

Next to meeting EUV productivity targets, defect-free EUV mask blanks are the most important element needed to enable EUV HVM introduction. SEMATECH's mask blank technologists will share the progress made at SEMATECH's Mask Blank Development Center in eliminating so-called "killer-type" mask blanks defects. Achieving this goal is critical to enable early adopters of EUV lithography.

The development of resist materials depends on the availability of high resolution micro-exposure tools. SEMATECH researchers will report on current performance and progress in upgrading these tools with the higher numerical aperture lenses needed to meet requirements for sub 10 nm resist materials development. In addition, recent results from SEMATECH's new imaging materials platform research will be reported.

In an invited paper addressing key infrastructure gaps for EUV in the area of mask metrology, Carl Zeiss and SEMATECH will share the results from the integration of the industry's first-ever commercial actinic aerial image metrology (AIMS™) EUV system.

"In partnership with Carl Zeiss, SEMATECH's EUV Mask Infrastructure initiative has made impressive advances through collaborative research with chip manufacturers. The AIMS™ tool is already producing mask-scale aerial images for 16 nm half-pitch node," said Michael Goldstein, EMI program manager and senior principal physicist at SEMATECH. "These results demonstrate that significant progress is being made in the development of critical metrology tools required to fabricate defect-free masks."

Other SEMATECH papers will showcase advances in metrology techniques and applications, including critical dimension atomic force microscopy (CD-AFM), critical dimension X-ray scattering (CD-SAXS), 3D characterization of directed self-assembly (DSA) by scatterometry, and a through-focus scanning optical microscopy (TSOM) technique being explored for future defect inspection and high-volume manufacturing of high-aspect ratio features. Critical dimension scanning electron microscopy (CD-SEM) limits and extendibility will also be analyzed, as well as improvements to CD-SEM roughness measurement strategy.

For a complete list of these and other presentations at SPIE please visit bit.ly/1eKaYgO.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

QD Vision Expands Product Line with Two-Millimeter Color LCD Display Optic: Color IQ™ Optic Enables Full-Color Gamut for Ultra-Thin Displays and All-in-One Computers April 16th, 2015

The National Science Foundation names engineering researcher Andrea Alú its Alan T. Waterman awardee for 2015: Alú is a pioneer in the field of metamaterials who has developed "cloaking" technology to make objects invisible to sensors April 16th, 2015

Chip Technology

Nanotubes with two walls have singular qualities: Rice University lab calculates unique electronic qualities of double-walled carbon nanotubes April 16th, 2015

Graphenea embarks on a new era April 16th, 2015

Quantization of 'surface Dirac states' could lead to exotic applications April 15th, 2015

Study shows novel pattern of electrical charge movement through DNA April 14th, 2015

Announcements

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Newly-Developed Nanocatalysts Increase Performance of Fuel Cells April 16th, 2015

Lanthanide-Organic Framework Nanothermometers Prepared by Spray-Drying April 16th, 2015

Events/Classes

Long Island Capital Alliance Announces Participants for Brookhaven National Laboratory Technology Transfer Capital Forum on May 8: Keynote Speaker Dr. Doon Gibbs, Director of Brookhaven National Laboratory April 16th, 2015

Promising future of quantum dots explored in conference: ‘20 Years of Quantum Dots at Los Alamos’ runs April 12-16 April 13th, 2015

To Conserve London's 300-Year-Old Masterpiece, Nanotech & Drones April 12th, 2015

Reducing energy usage with nano-coatings April 9th, 2015

Alliances/Partnerships/Distributorships

How can you see an atom? (video) April 10th, 2015

FibeRio and VF Corporation Form Strategic Partnership to Lead the Apparel and Footwear Markets in Nanofiber Technology April 8th, 2015

UK National Graphene Institute Selects Bruker as Official Partner: World-Leading Graphene Research Facility Purchases Multiple Bruker AFMs April 7th, 2015

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Printing/Lithography/Inkjet/Inks

The microscopic topography of ink on paper: Researchers have analyzed the varying thickness of printed toner in unprecedented 3-D detail, yielding insights that could lead to higher quality, less expensive and more environmentally-friendly glossy and non-glossy papers April 14th, 2015

Inkjet-printed liquid metal could bring wearable tech, soft robotics April 8th, 2015

Perpetuus Advanced Materials secures landmark commercial agreement with global technology group Heraeus: Perpetuus will supply innovative alternatives to existing silver and copper-based inks and pastes April 2nd, 2015

Haydale Announce Dedicated Graphene Inks Manufacturing Capability March 25th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE