Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Abstract:
SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, and related areas of metrology at the SPIE Advanced Lithography 2014 conferences taking place February 23-27 in San Jose, CA.

SEMATECH to Showcase Advances in EUV Extendibility and Metrology Techniques for Defect Inspection at SPIE 2014: Papers demonstrate leadership in the development of EUV lithography infrastructure and mask and resist technology

Albany, NY | Posted on February 20th, 2014

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

"Although serious challenges remain to further enable EUV pilot line readiness and advance EUV extendibility, steady progress has been realized and we are looking forward to sharing our results on some of the most critical aspects of the development of EUV infrastructure," said Michael Lercel, director of Lithography, Metrology, and Nanodefectivity at SEMATECH. "SEMATECH lithographers will recount achievements in multiple areas of EUV infrastructure, including resist and mask blank development, and the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to production."

Next to meeting EUV productivity targets, defect-free EUV mask blanks are the most important element needed to enable EUV HVM introduction. SEMATECH's mask blank technologists will share the progress made at SEMATECH's Mask Blank Development Center in eliminating so-called "killer-type" mask blanks defects. Achieving this goal is critical to enable early adopters of EUV lithography.

The development of resist materials depends on the availability of high resolution micro-exposure tools. SEMATECH researchers will report on current performance and progress in upgrading these tools with the higher numerical aperture lenses needed to meet requirements for sub 10 nm resist materials development. In addition, recent results from SEMATECH's new imaging materials platform research will be reported.

In an invited paper addressing key infrastructure gaps for EUV in the area of mask metrology, Carl Zeiss and SEMATECH will share the results from the integration of the industry's first-ever commercial actinic aerial image metrology (AIMS™) EUV system.

"In partnership with Carl Zeiss, SEMATECH's EUV Mask Infrastructure initiative has made impressive advances through collaborative research with chip manufacturers. The AIMS™ tool is already producing mask-scale aerial images for 16 nm half-pitch node," said Michael Goldstein, EMI program manager and senior principal physicist at SEMATECH. "These results demonstrate that significant progress is being made in the development of critical metrology tools required to fabricate defect-free masks."

Other SEMATECH papers will showcase advances in metrology techniques and applications, including critical dimension atomic force microscopy (CD-AFM), critical dimension X-ray scattering (CD-SAXS), 3D characterization of directed self-assembly (DSA) by scatterometry, and a through-focus scanning optical microscopy (TSOM) technique being explored for future defect inspection and high-volume manufacturing of high-aspect ratio features. Critical dimension scanning electron microscopy (CD-SEM) limits and extendibility will also be analyzed, as well as improvements to CD-SEM roughness measurement strategy.

For a complete list of these and other presentations at SPIE please visit bit.ly/1eKaYgO.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Sunblock poses potential hazard to sea life August 20th, 2014

Rice physicist emerges as leader in quantum materials research: Nevidomskyy wins both NSF CAREER Award and Cottrell Scholar Award August 20th, 2014

Graphene may be key to leap in supercapacitor performance August 20th, 2014

Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Chip Technology

Electrical engineers take major step toward photonic circuits: Team invents non-metallic metamaterial that enables them to 'compress' and contain light August 19th, 2014

Promising Ferroelectric Materials Suffer From Unexpected Electric Polarizations: Brookhaven Lab scientists find surprising locked charge polarizations that impede performance in next-gen materials that could otherwise revolutionize data-driven devices August 18th, 2014

AI Technology (AIT) Introduces Novel High Temperature Large Area Underfill with Proven Stress Absorption August 15th, 2014

Iranian Scientists Stabilize Protein on Highly Stable Electrode Surface August 14th, 2014

Announcements

Rice physicist emerges as leader in quantum materials research: Nevidomskyy wins both NSF CAREER Award and Cottrell Scholar Award August 20th, 2014

Graphene may be key to leap in supercapacitor performance August 20th, 2014

Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Ultrasonic Waves Applied in Production of Graphene Nanosheets August 20th, 2014

Events/Classes

The International Space Elevator Consortium (ISEC) is proud to announce the 2014 Space Elevator Conference! This annual event will be held at the Museum of Flight in Seattle, Washington from Friday, August 22nd through Sunday, August 24th August 19th, 2014

KaSAM-2014 International Conference (September 7-10, 2014, Kathmandu, Nepal) August 19th, 2014

Arrowhead Reports Fiscal 2014 Third Quarter Financial Results and Provides Update on ARC-520 August 12th, 2014

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 August 12th, 2014

Alliances/Partnerships/Distributorships

Sunblock poses potential hazard to sea life August 20th, 2014

SouthWest NanoTechnologies Appoints Matteson-Ridolfi for U.S. Distribution of its SMW™ Specialty Multiwall Carbon Nanotubes August 13th, 2014

Could hemp nanosheets topple graphene for making the ideal supercapacitor? August 12th, 2014

On the frontiers of cyborg science August 10th, 2014

Printing/Lithography/Inkjet/Inks

SouthWest NanoTechnologies Appoints Matteson-Ridolfi for U.S. Distribution of its SMW™ Specialty Multiwall Carbon Nanotubes August 13th, 2014

An Inkjet-Printed Field-Effect Transistor for Label-Free Biosensing August 11th, 2014

SEMATECH and Newly Merged SUNY CNSE/SUNYIT Launch New Patterning Center to Further Advance Materials Development: Center to Provide Access to Critical Tools that Support Semiconductor Technology Node Development August 7th, 2014

Iranian Scientists Produce Cobalt–Alumina Ceramic Nano Inks August 1st, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE