Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Leads Development of Time Waste Measurement Method Standard: Comprehensive and measureable metrics improve semiconductor equipment throughput and increase fab productivity

Abstract:
After several years of industry discussion, development, and proof-of-concept, the SEMI Wait Time Waste Metrics and Methods Task Force — led by SEMATECH and consisting of key industry stakeholders — has successfully developed a method that defines time elements to classify the state of each wafer and wafer batch throughout the manufacturing process. The method, validated by participating SEMATECH and SEMI member companies, is in procedural review for publication as a SEMI standard.

SEMATECH Leads Development of Time Waste Measurement Method Standard: Comprehensive and measureable metrics improve semiconductor equipment throughput and increase fab productivity

Albany, NY | Posted on November 21st, 2013

"The ability to parse cycle time into measurable pieces, or time elements, allows manufacturers to determine how long a particular event takes, and then focus in on opportunities to reduce cycle time," said Jackie Ferrell, Equipment and Factory Productivity project manager at SEMATECH. "This project along with SEMI's standards initiative collaboratively addresses the industry's waste and reduction needs and is one of SEMATECH's many projects that support the need for efficient and automated ways of converting the volumes of data in our fabs to actionable information."

In the semiconductor manufacturing process, there is a significant opportunity to increase equipment utilization and improve overall factory performance. By reducing unnecessary wait-time out of the manufacturing process, fabs will be able to add valuable hours of production time per day - a significant cost savings of potentially $100M for each day of cycle time.

The wait time waste method takes a user-specified time period, breaks it down into contiguous time segments and categorizes each time segment as a type of active or wait time. Factory events and context data are used to delineate the time segments.

The primary standard method provides a common approach to product time measurement that can be compared from one production line to another. The secondary standard method specifies a detailed approach to apply the product time measurement to 300 mm production equipment.

Device makers will be able to use this method to find hidden waste within their equipment and fab operations. Equipment and automated material handling system suppliers will also be able to use this method for equipment characterization and optimization, and work with device makers on analysis and potential solutions. In-house systems and commercial software products and services based on standardized metrics enable fab-wide solutions that will significantly reduce the time and cost to identify waste.

For more information on SEMATECH's Equipment and Factory Productivity Wait Time Waste project, contact Jackie Ferrell at .

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SEMI

SEMI is the global industry association serving the nano- and micro-electronic manufacturing supply chains. Our 2,000 member companies are the engine of the future, enabling smarter, faster and more economical products that improve our lives. Since 1970, SEMI has been committed to helping members grow more profitably, create new markets and meet common industry challenges. SEMI maintains offices in Bangalore, Beijing, Berlin, Brussels, Grenoble, Hsinchu, Moscow, San Jose, Seoul, Shanghai, Singapore, Tokyo, and Washington, D.C. For more information, visit www.semi.org.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Manager Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Novel Rocket Design Flight Tested: New Rocket Propellant and Motor Design Offers High Performance and Safety October 23rd, 2014

MEMS & Sensors Technology Showcase: Finalists Announced for MEMS Executive Congress US 2014 October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

Standards

CSA Group Continues Contributions to Advanced Emerging Technologies With Canada's First Standard on Cellulosic Nanomaterials June 20th, 2014

Test Filters the Light Way During Upcoming IEST Training Course March 14th, 2014

Izon Science achieves ISO 13485 certification: Internationally recognized standard demonstrates Izon’s commitment to quality assurance December 18th, 2013

ASTM International Nanotechnology Committee Approves Airborne Nanoparticle Measurement Standard December 10th, 2013

Chip Technology

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Nitrogen Doped Graphene Characterized by Iranian, Russian, German Scientists October 21st, 2014

Announcements

Nanoparticle technology triples the production of biogas October 23rd, 2014

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

Advancing thin film research with nanostructured AZO: Innovnano’s unique and cost-effective AZO sputtering targets for the production of transparent conducting oxides October 23rd, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Alliances/Partnerships/Distributorships

European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

VDMA photonics steering committee with new members stronger than ever October 14th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE