Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Abstract:
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Albany, NY and Garching, Germany | Posted on October 7th, 2013

Over the last years SUSS MicroTec, the market leader in photomask cleaning equipment, has succeeded to adapt and enhance tools and processes to the specific EUVL requirements.

As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes.

In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Frank P. Averdung, President and CEO of SUSS MicroTec adds "The EUV lithography has reached a critical junction where low defect masks and in-fab mask re-clean are essential in accelerating EUV lithography development and to substantially reduce EUV scanner down time. Learning from this collaboration is expected to once again benefit also EUVL and 193i pattern mask cleaning yields."

"This joint research initiative represents an innovative blend of SUSS MicroTec's experience as a market leader in the field of mask cleaning and SEMATECH's strengths in the development of EUVL and blank cleaning technologies that will benefit our members and the industry," said Stefan Wurm, SEMATECH's director of Lithography. "We look forward to working with SUSS on innovative ways to remove particles as small as 10 nm from EUVL substrates and blanks."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SUSS MicroTec

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit: www.suss.com

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


SUSS MicroTec Media Contact:
Franka Schielke
+49 (0) 89 32007 161

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

UT Dallas engineers twist nanofibers to create structures tougher than bulletproof vests March 27th, 2015

Novel nanoparticle therapy promotes wound healing March 27th, 2015

Designer's toolkit for dynamic DNA nanomachines: Arm-waving nanorobot signals new flexibility in DNA origami March 27th, 2015

Using magnetic fields to understand high-temperature superconductivity: Los Alamos explores experimental path to potential 'next theory of superconductivity' March 27th, 2015

Chip Technology

State-of-the-art online system unveiled to pinpoint metrology software accuracy March 27th, 2015

SUNY POLY CNSE to Host First Ever Northeast Semi Supply Conference (NESCO) Conference Will Connect New and Emerging Innovators in the Northeastern US and Canada with Industry Leaders and Strategic Investors to Discuss Future Growth Opportunities in NYS March 25th, 2015

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Building shape inspires new material discovery March 24th, 2015

Announcements

UT Dallas engineers twist nanofibers to create structures tougher than bulletproof vests March 27th, 2015

Novel nanoparticle therapy promotes wound healing March 27th, 2015

Designer's toolkit for dynamic DNA nanomachines: Arm-waving nanorobot signals new flexibility in DNA origami March 27th, 2015

Using magnetic fields to understand high-temperature superconductivity: Los Alamos explores experimental path to potential 'next theory of superconductivity' March 27th, 2015

Industrial

Industrial Nanotech, Inc. Announces Next Large Order from the Oil and Gas Industry March 26th, 2015

Young NTU Singapore spin-off clinches S$4.3 million joint venture with Chinese commercial giant March 23rd, 2015

Nanodevice Invented in Iran to Detect Hydrogen Sulfide in Oil, Gas Industry March 20th, 2015

Industrial Production of Nano-Based PVC Products in Iran March 20th, 2015

Alliances/Partnerships/Distributorships

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Young NTU Singapore spin-off clinches S$4.3 million joint venture with Chinese commercial giant March 23rd, 2015

Halas, Nordlander awarded Optical Society's R.W. Wood Prize: Rice University researchers recognized for pioneering nanophotonics March 21st, 2015

EU Funded PCATDES Project has completed its half-period with success March 19th, 2015

Research partnerships

SUNY Poly & M+W Make Major Announcement: Major Expansion To Include M+W Owned Gehrlicher Solar America Corporation That Will Create up to 400 Jobs to Develop Solar Power Plants at SUNY Poly Sites Across New York State March 26th, 2015

ORNL-led team demonstrates desalination with nanoporous graphene membrane March 25th, 2015

New kind of 'tandem' solar cell developed: Researchers combine 2 types of photovoltaic material to make a cell that harnesses more sunlight March 24th, 2015

UW scientists build a nanolaser using a single atomic sheet March 24th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE