Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Abstract:
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Albany, NY and Garching, Germany | Posted on October 7th, 2013

Over the last years SUSS MicroTec, the market leader in photomask cleaning equipment, has succeeded to adapt and enhance tools and processes to the specific EUVL requirements.

As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes.

In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Frank P. Averdung, President and CEO of SUSS MicroTec adds "The EUV lithography has reached a critical junction where low defect masks and in-fab mask re-clean are essential in accelerating EUV lithography development and to substantially reduce EUV scanner down time. Learning from this collaboration is expected to once again benefit also EUVL and 193i pattern mask cleaning yields."

"This joint research initiative represents an innovative blend of SUSS MicroTec's experience as a market leader in the field of mask cleaning and SEMATECH's strengths in the development of EUVL and blank cleaning technologies that will benefit our members and the industry," said Stefan Wurm, SEMATECH's director of Lithography. "We look forward to working with SUSS on innovative ways to remove particles as small as 10 nm from EUVL substrates and blanks."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SUSS MicroTec

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit: www.suss.com

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


SUSS MicroTec Media Contact:
Franka Schielke
+49 (0) 89 32007 161

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Recruiting bacteria to be technology innovation partners: September 17th, 2014

Nanoscience makes your wine better September 17th, 2014

Nanoribbon film keeps glass ice-free: Rice University lab refines deicing film that allows radio frequencies to pass September 16th, 2014

Effective Nanotechnology Innovations to Receive Mustafa Prize September 16th, 2014

Chip Technology

‘Small’ transformation yields big changes September 16th, 2014

UT Arlington research uses nanotechnology to help cool electrons with no external sources September 11th, 2014

Excitonic Dark States Shed Light on TMDC Atomic Layers: Berkeley Lab Discovery Holds Promise for Nanoelectronic and Photonic Applications September 11th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

Announcements

Nanoscience makes your wine better September 17th, 2014

Carbon Sciences Developing Breakthrough Technology to Mass-Produce Graphene -- the New Miracle Material: Company Enters Into an Agreement With the University of California, Santa Barbara (UCSB) to Fund the Further Development of a New Graphene Process September 16th, 2014

Nanoribbon film keeps glass ice-free: Rice University lab refines deicing film that allows radio frequencies to pass September 16th, 2014

Effective Nanotechnology Innovations to Receive Mustafa Prize September 16th, 2014

Industrial

Industrial waste converted in coating for aircraft turbines September 11th, 2014

Scientists Use Nanotechnology to Improve Mechanical Properties of Ceramics September 3rd, 2014

Nanoscale assembly line August 29th, 2014

Iranians Find Novel Method for Processing Highly Pure Ceramic Nanoparticles August 12th, 2014

Alliances/Partnerships/Distributorships

NEI Corporation and PneumatiCoat Technologies Sign Agreement to Jointly Develop and Market New Materials for Lithium-ion Batteries September 12th, 2014

Handheld scanner could make brain tumor removal more complete, reducing recurrence September 3rd, 2014

Leading European communications companies and research organizations have launched an EU project developing the future 5th Generation cellular mobile networks August 28th, 2014

JPK expands availability of instrumentation in the USA – appointing new distributors – launched a new web site to support the US market - AFM now available to US users August 26th, 2014

Research partnerships

Recruiting bacteria to be technology innovation partners: September 17th, 2014

Carbon Sciences Developing Breakthrough Technology to Mass-Produce Graphene -- the New Miracle Material: Company Enters Into an Agreement With the University of California, Santa Barbara (UCSB) to Fund the Further Development of a New Graphene Process September 16th, 2014

Elusive Quantum Transformations Found Near Absolute Zero: Brookhaven Lab and Stony Brook University researchers measured the quantum fluctuations behind a novel magnetic material's ultra-cold ferromagnetic phase transition September 15th, 2014

NEI Corporation and PneumatiCoat Technologies Sign Agreement to Jointly Develop and Market New Materials for Lithium-ion Batteries September 12th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE