Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Abstract:
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Albany, NY and Garching, Germany | Posted on October 7th, 2013

Over the last years SUSS MicroTec, the market leader in photomask cleaning equipment, has succeeded to adapt and enhance tools and processes to the specific EUVL requirements.

As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes.

In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Frank P. Averdung, President and CEO of SUSS MicroTec adds "The EUV lithography has reached a critical junction where low defect masks and in-fab mask re-clean are essential in accelerating EUV lithography development and to substantially reduce EUV scanner down time. Learning from this collaboration is expected to once again benefit also EUVL and 193i pattern mask cleaning yields."

"This joint research initiative represents an innovative blend of SUSS MicroTec's experience as a market leader in the field of mask cleaning and SEMATECH's strengths in the development of EUVL and blank cleaning technologies that will benefit our members and the industry," said Stefan Wurm, SEMATECH's director of Lithography. "We look forward to working with SUSS on innovative ways to remove particles as small as 10 nm from EUVL substrates and blanks."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SUSS MicroTec

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit: www.suss.com

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


SUSS MicroTec Media Contact:
Franka Schielke
+49 (0) 89 32007 161

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Announcements

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Industrial

Researchers patent a nanofluid that improves heat conductivity October 22nd, 2014

New Nanocomposites Help Elimination of Toxic Dyes October 15th, 2014

Perpetuus Carbon Group Receives Independent Verification of its Production Capacity for Graphenes at 140 Tonnes per Annum: Perpetuus Becomes the First Manufacturer in the Sector to Allow Third Party Audit October 7th, 2014

Bilbao (Spain) to welcome 1500 delegates at international event: ImagineNano 2015 and Graphene 2015 under the same roof October 2nd, 2014

Alliances/Partnerships/Distributorships

European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

VDMA photonics steering committee with new members stronger than ever October 14th, 2014

Research partnerships

NYU Researchers Break Nano Barrier to Engineer the First Protein Microfiber October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

RF Heating of Magnetic Nanoparticles Improves the Thawing of Cryopreserved Biomaterials October 23rd, 2014

Brookhaven Lab Launches Computational Science Initiative:Leveraging computational science expertise and investments across the Laboratory to tackle "big data" challenges October 22nd, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE