Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Abstract:
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Albany, NY and Garching, Germany | Posted on October 7th, 2013

Over the last years SUSS MicroTec, the market leader in photomask cleaning equipment, has succeeded to adapt and enhance tools and processes to the specific EUVL requirements.

As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes.

In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Frank P. Averdung, President and CEO of SUSS MicroTec adds "The EUV lithography has reached a critical junction where low defect masks and in-fab mask re-clean are essential in accelerating EUV lithography development and to substantially reduce EUV scanner down time. Learning from this collaboration is expected to once again benefit also EUVL and 193i pattern mask cleaning yields."

"This joint research initiative represents an innovative blend of SUSS MicroTec's experience as a market leader in the field of mask cleaning and SEMATECH's strengths in the development of EUVL and blank cleaning technologies that will benefit our members and the industry," said Stefan Wurm, SEMATECH's director of Lithography. "We look forward to working with SUSS on innovative ways to remove particles as small as 10 nm from EUVL substrates and blanks."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SUSS MicroTec

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit: www.suss.com

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


SUSS MicroTec Media Contact:
Franka Schielke
+49 (0) 89 32007 161

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Collaboration yields discovery of 12-sided silica cages June 20th, 2018

JPK talks with Dr Frank Lafont, Director of the BioImaging Center Lille (BICeL) about the use of the NanoWizard® AFM together with fluorescence microscopy in the study of living cells June 19th, 2018

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Executives Explore Key Megatrends and Innovations in MEMS, Sensors, Imaging Tech at SEMI-MSIG European Summits: Speakers to share developments in smart automotive, smart cities, smart industrial, biomedical, consumer and IoT, September 19-21, 2018 in Grenoble, France June 19th, 2018

Chip Technology

Carbon nanotube optics poised to provide pathway to optical-based quantum cryptography and quantum computing: Researchers are exploring enhanced potential of carbon nanotubes for unique applications June 18th, 2018

Making quantum puddles: Physicists discover how to create the thinnest liquid films ever June 13th, 2018

Leti Presenting Strategic Vision and Hosting a Workshop at SEMICON West: “From Electrons to Photons” Leti Workshop and CEO Media Briefing Set for Tuesday, July 10 in W Hotel, San Francisco June 12th, 2018

Nanometrics Updates Time of Webcast at Stifel 2018 Cross Sector Insight Conference June 12th, 2018

Announcements

Collaboration yields discovery of 12-sided silica cages June 20th, 2018

JPK talks with Dr Frank Lafont, Director of the BioImaging Center Lille (BICeL) about the use of the NanoWizard® AFM together with fluorescence microscopy in the study of living cells June 19th, 2018

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Executives Explore Key Megatrends and Innovations in MEMS, Sensors, Imaging Tech at SEMI-MSIG European Summits: Speakers to share developments in smart automotive, smart cities, smart industrial, biomedical, consumer and IoT, September 19-21, 2018 in Grenoble, France June 19th, 2018

Industrial

Magnesium magnificent for plasmonic applications: Rice University, University of Cambridge synthesize and test nanoparticles of abundant material May 22nd, 2018

Watching nanomaterials form in 4D: Novel technology allows researchers to see dynamic reactions as they happen at the nanoscale April 26th, 2018

Leti and Inac Show Path to Creating Building Blocks of Quantum Processors With 28Si isotope in a CMOS Line: Fabrication of Isotopically Enriched, Industry-Compatible Wafers Points Way To Realizing Silicon Spin Quantum Bits with Enhanced Fidelity March 20th, 2018

Glass matters: UCSB researchers find that the chemical topology of silica can influence the effectiveness of many chemical processes that use it March 14th, 2018

Alliances/Trade associations/Partnerships/Distributorships

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Leti and Cellmic Join Forces to Speed Market Adoption of Lens-Free Imaging and Sensing Techniques May 3rd, 2018

Nanobiotix and Weill Cornell Medicine Partner on Pre-Clinical Research Inbox x May 3rd, 2018

New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery January 9th, 2018

Research partnerships

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Evidence for a new property of quantum matter revealed: Electrical dipole activity detected in a quantum material unlike any other tested June 11th, 2018

Scientists use photonic chip to make virtual movies of molecular motion June 6th, 2018

Quantum Interference May Be Key to Smaller Insulators: Breakthrough could jumpstart further miniaturization of transistors June 6th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project