Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Abstract:
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing: Collaboration to enable EUVL mask defect reductions to support cost-effective insertion and high-volume manufacturing readiness

Albany, NY and Garching, Germany | Posted on October 7th, 2013

Over the last years SUSS MicroTec, the market leader in photomask cleaning equipment, has succeeded to adapt and enhance tools and processes to the specific EUVL requirements.

As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes.

In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Frank P. Averdung, President and CEO of SUSS MicroTec adds "The EUV lithography has reached a critical junction where low defect masks and in-fab mask re-clean are essential in accelerating EUV lithography development and to substantially reduce EUV scanner down time. Learning from this collaboration is expected to once again benefit also EUVL and 193i pattern mask cleaning yields."

"This joint research initiative represents an innovative blend of SUSS MicroTec's experience as a market leader in the field of mask cleaning and SEMATECH's strengths in the development of EUVL and blank cleaning technologies that will benefit our members and the industry," said Stefan Wurm, SEMATECH's director of Lithography. "We look forward to working with SUSS on innovative ways to remove particles as small as 10 nm from EUVL substrates and blanks."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About SUSS MicroTec

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit: www.suss.com

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


SUSS MicroTec Media Contact:
Franka Schielke
+49 (0) 89 32007 161

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Triboelectric Nanogenerators Boost Mass Spectrometry Performance March 1st, 2017

Biosensors: Distance makes the signal grow stronger March 1st, 2017

Smart multi-layered magnetic material acts as an electric switch: New study reveals characteristic of islands of magnetic metals between vacuum gaps, displaying tunnelling electric current March 1st, 2017

Bioinspired process makes materials light, robust, programmable at nano- to macro-scale: Ultralight web of silk nano fibers withstands load 4,000 times its weight February 28th, 2017

Chip Technology

Smart multi-layered magnetic material acts as an electric switch: New study reveals characteristic of islands of magnetic metals between vacuum gaps, displaying tunnelling electric current March 1st, 2017

Nano 'sandwich' offers unique properties: Rice University researchers simulate two-dimensional hybrids for optoelectronics February 27th, 2017

Dream Chip Technologies Presents First 22nm FD-SOI Silicon of New Automotive Driver Assistance SoC: Advanced driver assistance system (ADAS) computer vision SoC developed for European THINGS2DO project with working first silicon fabricated on GLOBALFOUNDRIES’ 22nm FD-SOI Platfor February 27th, 2017

GLOBALFOUNDRIES Announces Availability of 45nm RF SOI to Advance 5G Mobile Communications: Optimized RF features deliver high-performance solutions for mmWave beam forming applications in 5G smartphones and base stations February 22nd, 2017

Announcements

Triboelectric Nanogenerators Boost Mass Spectrometry Performance March 1st, 2017

Biosensors: Distance makes the signal grow stronger March 1st, 2017

Smart multi-layered magnetic material acts as an electric switch: New study reveals characteristic of islands of magnetic metals between vacuum gaps, displaying tunnelling electric current March 1st, 2017

Bioinspired process makes materials light, robust, programmable at nano- to macro-scale: Ultralight web of silk nano fibers withstands load 4,000 times its weight February 28th, 2017

Industrial

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

First ever blueprint unveiled to construct a large scale quantum computer February 3rd, 2017

Chemists Cook up New Nanomaterial and Imaging Method: Nanomaterials can store all kinds of things, including energy, drugs and other cargo January 19th, 2017

New laser based on unusual physics phenomenon could improve telecommunications, computing January 12th, 2017

Alliances/Trade associations/Partnerships/Distributorships

Strem Chemicals and Dotz Nano Ltd. Sign Distribution Agreement for Graphene Quantum Dots Collaboration February 21st, 2017

Leti Coordinating Project to Adapt Obstacle-Detection Technology Used in Autonomous Cars for Portable and Wearable Systems: INSPEX to Combine Knowhow of Nine European Organizations to Create Portable and Wearable Spatial-Exploration Systems February 2nd, 2017

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Research partnerships

Nano 'sandwich' offers unique properties: Rice University researchers simulate two-dimensional hybrids for optoelectronics February 27th, 2017

Sandia use confined nanoparticles to improve hydrogen storage materials performance: Big changes from a small package for hydrogen storage February 25th, 2017

Molecular phenomenon discovered by advanced NMR facility: Cutting edge technology has shown a molecule self-assembling into different forms when passing between solution state to solid state, and back again - a curious phenomenon in science - says research by the University of Wa February 22nd, 2017

Graphene foam gets big and tough: Rice University's nanotube-reinforced material can be shaped, is highly conductive February 13th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project