Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH’s Photomask Industry Survey Validates Top Industry Challenges and Identifies Long-term Opportunities

Abstract:
SEMATECH, a global consortium of semiconductor manufacturers, has released the results from its annual mask survey, which provides a comprehensive look into both the business and technical aspects of the mask industry. The survey, which was recently presented at the 2013 SPIE Photomask Technology Conference in Monterey, CA, identified defect mitigation and write time as the current top challenges, with critical tool readiness and capability as the top concern for the development of next-generation masks.

SEMATECH’s Photomask Industry Survey Validates Top Industry Challenges and Identifies Long-term Opportunities

Albany, NY | Posted on September 24th, 2013

SEMATECH's 12th Annual Mask Industry Survey is a part of SEMATECH's collaborative effort to address critical infrastructure gaps, particularly related to the introduction of EUV lithography such as mask blanks, resists, and aerial image inspection.

"The annual survey results give mask makers a way to assess their own progress relative to their peers, and provides the semiconductor industry and supply chain with critical insight into the capabilities and needs of the mask industry," said Matt Malloy, SEMATECH manager leading the industry survey. "The feedback we received from this year's survey demonstrates that mask shops are working harder than ever to deliver top quality products to their customers even as mask complexity and fabrication time are increasing."

Highlights from the survey include:

Yields

· All-time high yields for 6-inch binary, attenuated phase shift, and alternating phase shift masks were reported at 97.7 percent, 93.3 percent, and 92.7 percent respectively.

· All participating mask shops reported shipping masks targeting the 22 nm node or smaller, and on average, yields were greater than 90 percent at all nodes down to 22 nm.

Mask Sets

· The number of masks per mask set has seen a 14 percent long-term growth rate with the average number more than doubling from 23 at the 250 nm node to 54 at the 22 nm node.

· At the 250 nm node the minimum and maximum number of masks per mask set reported were 18 and 28, while at the 22 nm node the minimum and maximum reported were 40 and 83; the increased range likely due a combination of product type, patterning strategy, and other factors.

Data and Write Time

· Write time continues to increase rapidly with a maximum reported write time of 60 hours (2.5 days), confirming the need for faster mask writers such as the multi-beam mask writers currently in development.

· Data size, which has seen a long-term annual growth rate of approximately 40 percent, has stabilized over the past five years and was ranked low on the list of top concerns.

Delivery Time

· A 22 nm mask has an average turnaround time of 8.3 days, which is three times as long as the turnaround time for a 250 nm node mask.

Maintenance and Returns

· Survey results showed that 99 percent of masks sent for routine maintenance were sent back to the customer after work was completed, while only 47 percent of true mask returns were eventually sent back to the customer. The remaining 53 percent were discarded.

Challenges

· Hard defects remain the leading cause of yield loss for both binary and phase shift masks, validating defect mitigation as the top concern among the mask survey participants.

· Chamber cleaning was identified as the leading source of defects, with lithography materials and mask blanks following closely behind.



Survey methodology

The survey was conducted with input from nine merchant and captive mask shops, including Advanced Mask Technology Center (AMTC), Dai Nippon Printing (DNP), Hoya, IBM, Intel Mask Operation, Samsung, Semiconductor International Manufacturing Co. (SMIC), Toppan Printing, and Taiwan Semiconductor Manufacturing Co, Ltd. (TSMC). Traditional topics such as breakdowns of mask shipments by ground rule, application, glass size, process type, etc. were included in the survey to continue monitoring trends, and several new topics were added in 2013 based on industry input and feedback.

Note: Members of the media who would like a copy of the survey results should contact Erica McGill at

####

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Two-dimensional melting of hard spheres experimentally unravelled after 60 years: First definitive experimental evidence of two-dimensional melting of hard spheres April 21st, 2017

National Conference on Nanomaterials, (NCN-2017) April 21st, 2017

NanoMONITOR shares its latest developments concerning the NanoMONITOR Software and the Monitoring stations April 21st, 2017

Nanomechanics, Inc. Unveils New Product at ICMCTF Show April 25th: Nanoindentation experts will launch the new Gemini that measures the interaction of two objects that are sliding across each other – not merely making contact April 21st, 2017

Chip Technology

'Neuron-reading' nanowires could accelerate development of drugs for neurological diseases April 12th, 2017

Nanometrics to Announce First Quarter Financial Results on May 2, 2017 April 11th, 2017

AIM Photonics Presents Cutting-Edge Integrated Photonics Technology Developments to Packed House at OFC 2017, the Optical Networking and Communication Conference & Exhibition April 11th, 2017

Photonics breakthough paving the way for improved wireless communication systems: The work could bolster the wireless revolution underway with efficiencies several orders of magnitude April 5th, 2017

Announcements

Two-dimensional melting of hard spheres experimentally unravelled after 60 years: First definitive experimental evidence of two-dimensional melting of hard spheres April 21st, 2017

National Conference on Nanomaterials, (NCN-2017) April 21st, 2017

NanoMONITOR shares its latest developments concerning the NanoMONITOR Software and the Monitoring stations April 21st, 2017

Nanomechanics, Inc. Unveils New Product at ICMCTF Show April 25th: Nanoindentation experts will launch the new Gemini that measures the interaction of two objects that are sliding across each other – not merely making contact April 21st, 2017

Alliances/Trade associations/Partnerships/Distributorships

BASF and Landa partner to create revolutionary pigments for automotive coatings: The alliance combines BASF innovations with Landa nano-pigment technology April 5th, 2017

Leti Announces EU/South Korean Project for World’s First 5G-system Prototype: Coinciding with the 2018 Winter Games in PyeongChang, Korea, Prototype Will Be First Time State-of-the-art Terrestrial Wireless Communication Is Seamlessly Combined with Disruptive Satellite Communicati April 4th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project