- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
IMS Nanofabrication AG (IMS) (www.ims.co.at) announced today that a partnership was formed with JEOL Ltd. (www.jeol.co.jp/en/) for the realization of Alpha and Beta electron multi-beam mask writer (MBMW) tools for the 10nm half-pitch mask technology node. For this purpose IMS Nanofabrication has developed and demonstrated a multi-beam write engine providing 262-thousand programmable beams of 50keV energy. JEOL provides a novel platform with an air-bearing vacuum stage for writing most advanced patterns on 6-inch mask blanks. The MBMW Alpha tool will be realized in 2014, and will form the basis for two consecutive MBMW Beta tools which will be built for the MBMW Collaboration formed by IMS with DNP, Intel, Photronics and TSMC.
"We are very pleased with this partnership, as it will ensure timely completion of the Alpha and Beta tools, paving the way towards the production of HVM tools", said Elmar Platzgummer, CEO of IMS Nanofabrication.
"This partnership reinforces JEOL's position in the leading-edge mask writer market with a highly competitive technology. JEOL is proud to contribute a newly developed multi-generational platform with an air-bearing stage as a vital part of the tool", said Yasutoshi Nakagawa, Corporate Officer, General Manager of SE Business Unit, JEOL Ltd.
About IMS Nanofabrication AG
IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with strategic investors and partners involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit: www.ims.co.at
JEOL Ltd. is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscope s (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs. For more information on JEOL Ltd., visit: www.jeol.co.jp/en/
For more information, please click here
IMS Nanofabrication AG
Dr. Hans Loeschner
VP Technical Marketing
phone: +43 1 2144894 24
mobile: +43 699 123 67 223
Semiconductor Equipment Sales Dept.
Copyright © Business WireIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015
The quantum middle man July 2nd, 2015
Emergence of a 'devil's staircase' in a spin-valve system July 1st, 2015
Dyesol Joins Solliance as an Industrial Partner June 17th, 2015
Producing spin-entangled electrons July 2nd, 2015
Leti Announces Launch of First European Nanomedicine Characterisation Laboratory: Project Combines Expertise of 9 Partners in 8 Countries to Foster Nanomedicine Innovation and Facilitate Regulatory Approval July 1st, 2015
New conductive ink for electronic apparel June 25th, 2015
Leti to Present Solutions to New Applications Using 3D Technologies at SEMICON West LetiDay Event, July 14: Leti Experts also Will Speak at TechXPOT Session on MEMS and STS Session on Lithography Cost-and-Productivity Issues Below 14nm June 22nd, 2015