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Home > Press > IMS Nanofabrication Announces Partnership with JEOL for the Realization of Alpha and Beta Electron Multi-Beam Mask Writer (MBMW) Tools

Abstract:
IMS Nanofabrication AG (IMS) (www.ims.co.at) announced today that a partnership was formed with JEOL Ltd. (www.jeol.co.jp/en/) for the realization of Alpha and Beta electron multi-beam mask writer (MBMW) tools for the 10nm half-pitch mask technology node. For this purpose IMS Nanofabrication has developed and demonstrated a multi-beam write engine providing 262-thousand programmable beams of 50keV energy. JEOL provides a novel platform with an air-bearing vacuum stage for writing most advanced patterns on 6-inch mask blanks. The MBMW Alpha tool will be realized in 2014, and will form the basis for two consecutive MBMW Beta tools which will be built for the MBMW Collaboration formed by IMS with DNP, Intel, Photronics and TSMC.

IMS Nanofabrication Announces Partnership with JEOL for the Realization of Alpha and Beta Electron Multi-Beam Mask Writer (MBMW) Tools

Vienna, Austria | Posted on September 6th, 2013

"We are very pleased with this partnership, as it will ensure timely completion of the Alpha and Beta tools, paving the way towards the production of HVM tools", said Elmar Platzgummer, CEO of IMS Nanofabrication.

"This partnership reinforces JEOL's position in the leading-edge mask writer market with a highly competitive technology. JEOL is proud to contribute a newly developed multi-generational platform with an air-bearing stage as a vital part of the tool", said Yasutoshi Nakagawa, Corporate Officer, General Manager of SE Business Unit, JEOL Ltd.

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About IMS Nanofabrication AG
IMS Nanofabrication AG (ďIMSĒ) is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with strategic investors and partners involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit: www.ims.co.at

About JEOL

JEOL Ltd. is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscope s (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs. For more information on JEOL Ltd., visit: www.jeol.co.jp/en/

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Contacts:
IMS Nanofabrication AG
Dr. Hans Loeschner
VP Technical Marketing
phone: +43 1 2144894 24
mobile: +43 699 123 67 223


JEOL Ltd.
Hirokazu Yamada
Semiconductor Equipment Sales Dept.
phone: +81-42-528-3491
fax: +81-42-528-3488

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