Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Applied Seals North America Partners with SEMATECH to Improve Semiconductor Manufacturing Sealing Solutions for Vacuum Processing Tools

Abstract:
SEMATECH announced today that Applied Seals North America (ASNA) has joined SEMATECH's Manufacturing Technology Center, which is designed to improve semiconductor equipment manufacturing productivity, yield and cost.

Applied Seals North America Partners with SEMATECH to Improve Semiconductor Manufacturing Sealing Solutions for Vacuum Processing Tools

Albany, NY | Posted on June 12th, 2013

The Manufacturing Technology Center is working on particle management solutions to reduce the number of particle excursions that are found in vacuum process tools. As a part of this project, fab participants identified chemical vapor deposition (CVD) systems as the largest contributor to the failure rate and shallow trench isolation (STI) gap fill as the most problematic process application within the CVD tool group.

As a member of SEMATECH's Manufacturing Technology Center, ASNA will collaborate with SEMATECH engineers to reduce the number of particle excursions by identifying seal designs and materials for STI gap fill process tools that are used in both 200 mm and 300 mm semiconductor manufacturing facilities. Additionally, ASNA and SEMATECH will work together to develop and introduce new material solutions that will help to significantly extend the life of the seals and reduce the number of particles that are shed from them.

"We are excited to collaborate with SEMATECH on innovative technology development to help address current and future technology challenges for sealing of vacuum systems," said Dalia Vernikovsky, CEO of ASNA. "This project will help spearhead initiatives and collaborative efforts to drastically improve sealing performance while significantly decreasing defects that are attributed to seals. As the complexity of the technology increases, innovations in materials, seal design and particle control is essential for successful manufacturing."

"Particle excursions are a major cost-of-ownership issue for vacuum tools and there is a technology gap that ASNA can help address to enable fabs to squeeze additional productivity from their very expensive vacuum tools," said Julian Richards, Manufacturing Technology project manager. "We look forward to working closely with ASNA in a collaborative effort to engineer sealing solutions that reduce the number of down events caused by particle excursions."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About Applied Seals North America (ASNA)

Applied Seals North America pushes the limit with elastomeric technology, innovation and expertise. Their expansive selection of materials offer resistance to a multitude of chemistries, temperature and offers the sealing performance demanded in the most arduous applications. Years of quality seal manufacturing have represented Applied Seals’ products that bring expertise with state of the art compounding, in-house tool creation, design, molding and manufacturing superiority. Their engineering skill, design proficiency and application ‘know-how’ leads to the highest level of sealing performance and integrity that will meet current and future sealing challenges.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
Phone: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Information storage with a nanoscale twist: Discovery of a novel rotational force inside magnetic vortices makes it easier to design ultrahigh capacity disk drives March 28th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

Laser activated gold pyramids could deliver drugs, DNA into cells without harm: Microstructures create temporary pores in cells March 27th, 2017

Chip Technology

A big leap toward tinier lines: Self-assembly technique could lead to long-awaited, simple method for making smaller microchip patterns March 27th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Argon is not the 'dope' for metallic hydrogen March 24th, 2017

Scientists discover new 'boat' form of promising semiconductor: GeSe Uncommon form attenuates semiconductor's band gap size March 23rd, 2017

Announcements

Information storage with a nanoscale twist: Discovery of a novel rotational force inside magnetic vortices makes it easier to design ultrahigh capacity disk drives March 28th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

Laser activated gold pyramids could deliver drugs, DNA into cells without harm: Microstructures create temporary pores in cells March 27th, 2017

Tools

“Cysteine Rose” Wins 2016 Thermo Fisher Scientific Electron Microscopy Image Contest: Thermo Fisher honors Andrea Jacassi of the Italian Institute of Technology for image of cysteine crystals using focused ion beam techniques March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

Researchers make flexible glass for tiny medical devices: Glass can bend over and over again on a nanoscale March 27th, 2017

Cryo-electron microscopy achieves unprecedented resolution using new computational methods March 25th, 2017

Alliances/Trade associations/Partnerships/Distributorships

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Leti and HORIBA Scientific to Host Webinar on Ultrafast Characterization Tool: Plasma Profiling Time-of-Flight Mass Spectrometer Tool Cuts Optimization Time In Layer Deposition and Fabrication of Wide Range of Applications March 27th, 2017

AIM Photonics Welcomes Coventor as Newest Member: US-Backed Initiative Taps Process Modeling Specialist to Enable Manufacturing of High-Yield, High-Performance Integrated Photonic Designs March 16th, 2017

Applied Graphene Materials plc - Significant commercial progress in AGM’s three core sectors March 3rd, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project