Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Applied Seals North America Partners with SEMATECH to Improve Semiconductor Manufacturing Sealing Solutions for Vacuum Processing Tools

Abstract:
SEMATECH announced today that Applied Seals North America (ASNA) has joined SEMATECH's Manufacturing Technology Center, which is designed to improve semiconductor equipment manufacturing productivity, yield and cost.

Applied Seals North America Partners with SEMATECH to Improve Semiconductor Manufacturing Sealing Solutions for Vacuum Processing Tools

Albany, NY | Posted on June 12th, 2013

The Manufacturing Technology Center is working on particle management solutions to reduce the number of particle excursions that are found in vacuum process tools. As a part of this project, fab participants identified chemical vapor deposition (CVD) systems as the largest contributor to the failure rate and shallow trench isolation (STI) gap fill as the most problematic process application within the CVD tool group.

As a member of SEMATECH's Manufacturing Technology Center, ASNA will collaborate with SEMATECH engineers to reduce the number of particle excursions by identifying seal designs and materials for STI gap fill process tools that are used in both 200 mm and 300 mm semiconductor manufacturing facilities. Additionally, ASNA and SEMATECH will work together to develop and introduce new material solutions that will help to significantly extend the life of the seals and reduce the number of particles that are shed from them.

"We are excited to collaborate with SEMATECH on innovative technology development to help address current and future technology challenges for sealing of vacuum systems," said Dalia Vernikovsky, CEO of ASNA. "This project will help spearhead initiatives and collaborative efforts to drastically improve sealing performance while significantly decreasing defects that are attributed to seals. As the complexity of the technology increases, innovations in materials, seal design and particle control is essential for successful manufacturing."

"Particle excursions are a major cost-of-ownership issue for vacuum tools and there is a technology gap that ASNA can help address to enable fabs to squeeze additional productivity from their very expensive vacuum tools," said Julian Richards, Manufacturing Technology project manager. "We look forward to working closely with ASNA in a collaborative effort to engineer sealing solutions that reduce the number of down events caused by particle excursions."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About Applied Seals North America (ASNA)

Applied Seals North America pushes the limit with elastomeric technology, innovation and expertise. Their expansive selection of materials offer resistance to a multitude of chemistries, temperature and offers the sealing performance demanded in the most arduous applications. Years of quality seal manufacturing have represented Applied Seals’ products that bring expertise with state of the art compounding, in-house tool creation, design, molding and manufacturing superiority. Their engineering skill, design proficiency and application ‘know-how’ leads to the highest level of sealing performance and integrity that will meet current and future sealing challenges.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
Phone: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanotechnology and math deliver two-in-one punch for cancer therapy resistance June 24th, 2016

Researchers discover new chemical sensing technique: Technique allows sharper detail -- and more information -- with near infrared light June 24th, 2016

GraphExeter illuminates bright new future for flexible lighting devices June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

Chip Technology

GraphExeter illuminates bright new future for flexible lighting devices June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

Particle zoo in a quantum computer: First experimental quantum simulation of particle physics phenomena June 23rd, 2016

Nanometrics to Participate in the 8th Annual CEO Investor Summit: Investor Event Held Concurrently with SEMICON West 2016 in San Francisco June 22nd, 2016

Announcements

Nanotechnology and math deliver two-in-one punch for cancer therapy resistance June 24th, 2016

Researchers discover new chemical sensing technique: Technique allows sharper detail -- and more information -- with near infrared light June 24th, 2016

GraphExeter illuminates bright new future for flexible lighting devices June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

Tools

Researchers discover new chemical sensing technique: Technique allows sharper detail -- and more information -- with near infrared light June 24th, 2016

Coexistence of superconductivity and charge density waves observed June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

FEI and University of Liverpool Announce QEMSCAN Research Initiative: University of Liverpool will utilize FEI’s QEMSCAN technology to gain a better insight into oil and gas reserves & potentially change the approach to evaluating them June 22nd, 2016

Alliances/Trade associations/Partnerships/Distributorships

FEI and University of Liverpool Announce QEMSCAN Research Initiative: University of Liverpool will utilize FEI’s QEMSCAN technology to gain a better insight into oil and gas reserves & potentially change the approach to evaluating them June 22nd, 2016

French Research Team Helps Extend MRI Detection of Diseases & Lower Health-Care Costs: CEA, INSERM and G2ELab Brings Grenoble Region’s Expertise In Advanced Medicine & Magnetism Applications to H2020 IDentIFY Project June 21st, 2016

Research showing why hierarchy exists will aid the development of artificial intelligence June 13th, 2016

UK NANOSAFETY GROUP publishes 2nd Edition of guidance to support safe working with nanomaterials May 30th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic