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Home > Press > FEI Adds Patented UniColore Technology to Versa 3D DualBeam: Versa 3D DualBeam now offers both an analytical mode, with beam currents up to100nA, and an imaging mode, with resolution of 1.4nm at 1kV―all in one instrument.

Abstract:
FEI Company (NASDAQ: FEIC), a leading instrumentation company providing imaging and analysis systems for research and industry, today announced that it has added patented UniColore (UC) monochromated electron source to its versatile Versa 3D™ DualBeam™ system. UC technology improves the DualBeam's ability to image fine surface detail at low accelerating voltages without compromising its analytical performance at high voltages and beam currents.

FEI Adds Patented UniColore Technology to Versa 3D DualBeam: Versa 3D DualBeam now offers both an analytical mode, with beam currents up to100nA, and an imaging mode, with resolution of 1.4nm at 1kV―all in one instrument.

Hillsboro, OR | Posted on September 25th, 2012

"Versa 3D is now the only DualBeam to combine the low-voltage imaging performance of a monochromated FEG source with the versatility and ease-of-use of a non-immersion objective lens," stated Andre Mijiritskii, director product marketing for SEM and DualBeams, FEI Materials Science Business Unit. "As a result, it can provide high-resolution images of fine surface detail on the widest range of specimens, including non-conductive, magnetic and light-element materials, and large or odd shaped samples. The same instrument can provide the high currents and voltages needed for fast, precise analysis. The non-immersion lens performs well at longer working distances that are particularly valuable for analysis and automated procedures, such as serial slice and 3D reconstruction and TEM sample preparation."

The UC source dramatically improves imaging resolution at low accelerating voltages by decreasing the energy spread among beam electrons, which reduces chromatic aberration and permits the beam to be focused into a smaller spot on the sample surface. Given a sufficiently small spot, image resolution and sensitivity to surface detail are further enhanced at low beam voltages by the reduction of beam penetration and scattering. Low-voltage imaging can also eliminate charging effects that interfere with imaging on non-conductive materials.

The Versa 3D DualBeam is designed with a highly-configurable platform to allow customers to adapt the system's capabilities to their specific requirements. High vacuum, low vacuum and environmental scanning electron microscopy (ESEM) options provide coverage of the widest range of sample types and applications.

The Versa 3D DualBeam with patented UC monochromated electron source is available now for ordering. The UC monochromator performance is also available on FEI's Titan™ Transmission Electron Microscope, Magellan™ Extreme High Resolution Scanning Electron Microscope, and the Helios NanoLab™ DualBeam™. For more information, please visit www.fei.com/versa3d

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About FEI Company
FEI (Nasdaq: FEIC) is a leading diversified scientific instruments company. It is a premier provider of electron- and ion-beam microscopes and solutions for nanoscale applications across many industries: industrial and academic materials research, life sciences, semiconductors, data storage, natural resources and more. With more than 60 years of technological innovation and leadership, FEI has set the performance standard in transmission electron microscopes (TEM), scanning electron microscopes (SEM) and DualBeams™, which combine a SEM with a focused ion beam (FIB). Headquartered in Hillsboro, Ore., USA, FEI has over 2,300 employees and sales and service operations in more than 50 countries around the world. More information can be found at: www.fei.com.

FEI Safe Harbor Statement

This news release contains forward-looking statements that include statements regarding the performance capabilities and benefits of the Versa 3D DualBeam and UniColore monochromated electron source . Factors that could affect these forward-looking statements include but are not limited to failure of the product or technology to perform as expected and achieve anticipated results, unexpected technology problems and challenges, changes to the technology, the inability of FEI, its suppliers or project partners to make the technological advances required for the technology to achieve anticipated results, the inability of customers to develop and deploy the expected new applications and our ability to manufacture, ship and deliver the tools or software as expected. Please also refer to our Form 10-K, Forms 10-Q, Forms 8-K and other filings with the U.S. Securities and Exchange Commission for additional information on these factors and other factors that could cause actual results to differ materially from the forward-looking statements. FEI assumes no duty to update forward-looking statements.

For more information, please click here

Contacts:
For more information contact:
Sandy Fewkes (media contact)
MindWrite Communications, Inc
+1 408 224 4024


FEI Company
Fletcher Chamberlin
(investors and analysts)
Investor Relations
+1 503 726 7710

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