Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SK hynix Joins SEMATECH’s EUVL Mask Infrastructure (EMI) Partnership at UAlbany NanoCollege: Collaborative effort to pursue critical metrology gaps to enable defect-free extreme ultraviolet lithography masks for high-volume manufacturing

Abstract:
SEMATECH announced today that SK hynix, a world-leading memory supplier offering dynamic random access memory chips (DRAMs) and flash memory chips, has joined SEMATECH's EMI Partnership to develop critical metrology tools for reviewing defects in advanced masks needed for extreme ultraviolet lithography (EUVL).

SK hynix Joins SEMATECH’s EUVL Mask Infrastructure (EMI) Partnership at UAlbany NanoCollege: Collaborative effort to pursue critical metrology gaps to enable defect-free extreme ultraviolet lithography masks for high-volume manufacturing

Albany, NY | Posted on September 19th, 2012

SEMATECH launched EMI in 2010 to address key infrastructure gaps for EUV in the area of mask metrology, by funding development of critical metrology tools. The EMI Partnership facilitates consensus building among the EMI partners, providing crucial data, insightful analysis, and a discussion forum for reaching conclusive agreements.

"Cooperation across the industry in order to meet the stringent requirements of the embedded industry is critical for semiconductor manufacturers," said Sungjoo Hong, Senior Vice President and Head of the R&D Division of SK hynix. "By joining SEMATECH's EMI Partnership and collaborating with industry-leading partners, we expect to play a key role in accelerating the commercialization of EUV technology by supporting the development of critical metrology tools to enable defect free masks."

"EUV mask defectivity is one of the single greatest challenges to EUV readiness, but finding the defects requires metrology tools that do not yet exist," said Stefan Wurm, director of lithography, SEMATECH. "We are excited by this opportunity to partner with a leading memory maker like SK hynix. With such partnerships, SEMATECH is continuing our commitment to develop and deliver the infrastructure required for this critical next-generation technology."

SEMATECH and Carl Zeiss are developing and plan to manufacture the industry's first-ever actinic aerial image metrology (AIMS™) EUV system, targeted for EUVL volume production. The AIMS™ EUV platform represents a critical tool for the development and manufacturing of defect-free EUVL masks. The tool by design supports the 16 nm half-pitch (HP) technology node requirements and will extend to future semiconductor manufacturing nodes. A first production-worthy version of the platform is scheduled for mid-2014.

EMI is administered by SEMATECH's Lithography Program, based at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. EMI is open to mask and chip-makers, mask blank suppliers, other consortia, and regional governments.

####

About SEMATECH
SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, this year celebrates 25 years of excellence in accelerating the commercialization of technology innovations into manufacturing solutions. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org or follow us on Twitter @sematechnews.

About EMI Partnership

Established in February 2010, the EUVL Mask Infrastructure (EMI) Partnership was launched to develop critical metrology tools, considered too costly for individual companies to develop independently. EMI addresses the metrology gap by funding the development of metrology tools for detecting and assessing defects in advanced masks needed for extreme ultraviolet lithography (EUVL).

About SK hynix Inc.

SK hynix Inc., Korea, is the world’s top tier semiconductor supplier offering Dynamic Random Access Memory chips (“DRAM”), Flash memory chips ("NAND Flash") and CMOS Image Sensors ("CIS") for a wide range of distinguished customers globally. The Company’s shares are traded on the Korea Exchange, and the Global Depository shares are listed on the Luxemburg Stock Exchange. Further information about SK hynix is available at www.skhynix.com.

For more information, please click here

Contacts:
Anne Englander
518-649-1193

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Host-guest nanowires for efficient water splitting and solar energy storage February 7th, 2016

UTHealth research looks at nanotechnology to help prevent preterm birth February 7th, 2016

Graphene is strong, but is it tough? Berkeley Lab scientists find that polycrystalline graphene is not very resistant to fracture February 7th, 2016

Lithium battery catalyst found to harm key soil microorganism February 7th, 2016

Chip Technology

Organic crystals allow creating flexible electronic devices: The researchers from the Faculty of Physics of the Moscow State University have grown organic crystals that allow creating flexible electronic devices February 5th, 2016

Scientists guide gold nanoparticles to form 'diamond' superlattices: DNA scaffolds cage and coax nanoparticles into position to form crystalline arrangements that mimic the atomic structure of diamond February 4th, 2016

Polar vortices observed in ferroelectric: New state of matter holds promise for ultracompact data storage and processing February 4th, 2016

Electrons and liquid helium advance understanding of zero-resistance: Study of electrons on liquid helium systems sheds light on zero-resistance phenomenon in semiconductors February 2nd, 2016

Memory Technology

A step towards keeping up with Moore's Law: POSTECH researchers develop a novel and efficient fabrication technology for cross-shaped memristor January 30th, 2016

Scientists build a neural network using plastic memristors: A group of Russian and Italian scientists have created a neural network based on polymeric memristors -- devices that can potentially be used to build fundamentally new computers January 28th, 2016

LC.300 Series Nanopositioning Controller from nPoint January 28th, 2016

First all-antiferromagnetic memory device could get digital data storage in a spin January 16th, 2016

Announcements

Host-guest nanowires for efficient water splitting and solar energy storage February 7th, 2016

UTHealth research looks at nanotechnology to help prevent preterm birth February 7th, 2016

Graphene is strong, but is it tough? Berkeley Lab scientists find that polycrystalline graphene is not very resistant to fracture February 7th, 2016

Lithium battery catalyst found to harm key soil microorganism February 7th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Vesper Collaborates with GLOBALFOUNDRIES to Deliver First Piezoelectric MEMS Microphones: Acoustic sensing company works with top foundry to support mass-market consumer products January 21st, 2016

Imec and Cloudtag Collaborate on High Quality Frictionless Wearables for Lifestyle Coaching: Next-generation health and fitness tracker Cloudtag TrackTM launched at CES 2016 January 7th, 2016

Technical partnership at the top – Oxford Instruments and Zurich Instruments announce a technical collaboration for low temperature physics January 7th, 2016

Production of Graphene Oxide Nanosheets to Economize Fuel Cells January 1st, 2016

Printing/Lithography/Inkjet/Inks

Teijin to Participate in Nano Tech 2016 January 21st, 2016

New bimetallic alloy nanoparticles for printed electronic circuits: Production of oxidation-resistant copper alloy nanoparticles by electrical explosion of wire for printed electronics January 5th, 2016

Photonic “sintering” may create new solar, electronics manufacturing technologies December 1st, 2015

Screen Printable Functionalised Graphene Ink November 3rd, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic