Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Nanometrics’ IMPULSE Integrated Metrology System Selected by Leading Foundry for Advanced 2x nm Etch Control

Abstract:
Nanometrics Incorporated (NASDAQ: NANO), a leading provider of advanced process control metrology and inspection systems, today announced its IMPULSE® integrated metrology (IM) system, along with its industry-leading NanoDiffract® software for optical critical dimension (OCD) metrology, have been selected by a leading foundry for deployment into advanced 2x nm volume production for front-end-of-line etch process control.

Nanometrics’ IMPULSE Integrated Metrology System Selected by Leading Foundry for Advanced 2x nm Etch Control

Milpitas, CA | Posted on May 7th, 2012

"Nanometrics has worked closely with this leading foundry and a prominent etch OEM platform provider to demonstrate superior process control for key layers and structures with our integrated IMPULSE OCD system and NanoDiffract software. We are pleased to have our comprehensive solution for Process Control Metrology selected for proliferation into volume production for our customer's second generation 2x nm products," commented Steve Bradley, Director of Integrated Metrology at Nanometrics. "Next-generation device manufacturing requires reduced critical dimension (CD) variances within-wafer, wafer-to-wafer, and lot-to-lot, and the IMPULSE system provides unprecedented control of the CDs most closely associated with end device performance and yield."



This selection includes a multi-system follow-on order that represents the first phase of purchases for the deployment of Nanometrics IM solutions into this customer's most advanced 2x nm volume production line.



The IMPULSE system for OCD has been qualified and integrated on multiple platforms from the leading etch companies for transistor, contact and interconnect applications. Beyond etch integrations, Nanometrics' IM solutions are available in configurations to support control of other key fab processes, including CMP, lithography and CVD, and for both thin film and OCD applications. When integrated onto the Lynx platform, in combination with other Nanometrics metrology and inspection systems, device manufacturers can address the most challenging process control applications with the lowest cost of ownership. Nanometrics' customers have the option of deploying integrated metrology in conjunction with automated standalone systems, the Lynx™ Cluster Metrology Platform and the NanoCD™ Suite for a complete fab-wide metrology process control solution.

####

About Nanometrics Incorporated
Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated systems address numerous process control applications, including critical dimension and film thickness measurement, device topography, defect inspection, overlay registration, and analysis of various other film properties such as optical, electrical and material characteristics. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO.

For more information, please click here

Contacts:
Company Contact:
Kevin Heidrich
VP, Marketing & Business Development
408-545-6000 x13211


Investor Relations Contact:

Claire McAdams
Headgate Partners LLC
530.265.9899

Copyright © Nanometrics Incorporated

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

A new, tunable device for spintronics: An international team of scientists including physicist Jairo Sinova from the University of Mainz realises a tunable spin-charge converter made of GaAs August 29th, 2014

Nanoscale assembly line August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Chip Technology

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Fonon Announces 3D Metal Sintering Technology: Emerging Additive Nano Powder Manufacturing Technology August 28th, 2014

RMIT delivers $30m boost to micro and nano-tech August 26th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

Announcements

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

Nanoscale assembly line August 29th, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Tools

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Ultra-Low Frequency Vibration Isolation Stabilizes Scanning Tunneling Microscopy at UCLA’s Nano-Research Group August 28th, 2014

Measure Both Elastic and Viscous Properties with AFM Using Asylum Research’s Exclusive AM-FM Viscoelastic Mapping Mode August 28th, 2014

New-Contracts/Sales/Customers

East China University of Science and Technology Purchases Nanonex Advanced Nanoimprint Tool NX-B200 July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

STFC takes delivery of the 100th Hitachi Tabletop SEM in the UK July 3rd, 2014

University of Maastricht Adds Complete Correlative Workflow from FEI to its Institute of Nanoscopy June 23rd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE