Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > CEA-Leti promotes LETI-3S (Silicon Specialty Solutions) concept: The latest addition to CEA-Letis extensive range of collaboration offers on 200mm and 300mm Platforms

Abstract:
CEA-Leti today announced a focus on a new collaboration mode for a wide range of industry oriented customers from start-ups to manufacturers.

CEA-Leti promotes LETI-3S (Silicon Specialty Solutions) concept: The latest addition to CEA-Letis extensive range of collaboration offers on 200mm and 300mm Platforms

Grenoble, France | Posted on May 2nd, 2012

The research oriented unique CEA-Leti's world-class process and metrology tool set should also offer:

Advanced single step processes to high end process modules to realize some or the entire product or simply make a proof-of-concept demonstration;

Flexible customer owned processes to meet small manufacturing requirements, through prototyping or small pre-series before transfer to commercial foundries;

Equipment access through the expertise of CEA-Leti engineers.



LETI-3S for Silicon Specialty Solutions is targeting start-ups, component integrators, fabless or fablite companies, equipment or consumable suppliers. Other entities should be concerned such as foundries or research centers with a limited processes offer, micro and nanotechnologies companies who don't want low-volume activities, and high-value silicon wafers dealers.

3S addresses following main domains:

Deposition

Front Side/Back Side cleanings, wet etch and stripping

Lithography with dual side alignment capability. LETI-3S can provide generic masks but usually works on customer designs adapted to CEA-Leti lithography tools.

Etching

Implantation, epitaxy, diffusion

CMP, bonding, grinding, dicing

Advanced in-line metrology



LETI-3S is operated on the Minatec Campus in Grenoble on 24/7 200mm and 300mm technological platforms. Lower wafer sizes should be available thanks to an innovative holder technology. LETI-3S can provide substrates or work on customers wafers, pre-processed or not, through stringent contamination protocols.

The ISO9001 certification reinforces CEA-Leti's leadership position as an industry oriented research center. LETI-3S ensures a full traceability from process flow conception to products delivery. SPC, FMEA, audits or conformance certificates to specifications are available according to the type of inquiry.

"LETI-3S is totally in accordance with the CEA-Leti missions to create and to transfer innovations to the industry", said Laurent Malier, CEO of CEA-Leti. "This is a great opportunity for us to give a simple access to our resources and thus enlarge significantly the panel of our industrial partners on different markets in our application domains".

####

About CEA-Leti
CEA is a French research and technology organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,400 employees, CEA-Leti trains more than 190 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,700 patent families.

Visit www.leti.fr.

For more information, please click here

Contacts:


Media Contact:

CEA-Leti Weber Shandwick
Thierry Bosc
Eric Chauvelot / Robert Ba
+33 4 38 78 31 95
+33 1 47 59 56 57 / 38 75


Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Announcements

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Tools

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

National Synchrotron Light Source II Achieves 'First Light' October 23rd, 2014

Advancing thin film research with nanostructured AZO: Innovnanos unique and cost-effective AZO sputtering targets for the production of transparent conducting oxides October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Alliances/Partnerships/Distributorships

European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

VDMA photonics steering committee with new members stronger than ever October 14th, 2014

Research partnerships

NYU Researchers Break Nano Barrier to Engineer the First Protein Microfiber October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

RF Heating of Magnetic Nanoparticles Improves the Thawing of Cryopreserved Biomaterials October 23rd, 2014

Brookhaven Lab Launches Computational Science Initiative:Leveraging computational science expertise and investments across the Laboratory to tackle "big data" challenges October 22nd, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE