Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Inpria Joins SEMATECH’s Resist Center at UAlbany NanoCollege for Advanced EUV Resist Development

Abstract:
SEMATECH, a global consortium of chipmakers, announced today that Inpria, a developer of chemical materials for the deposition of high-performance oxide thin films, has joined SEMATECH's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

Inpria Joins SEMATECH’s Resist Center at UAlbany NanoCollege for Advanced EUV Resist Development

Albany, NY and Corvallis, OR | Posted on April 24th, 2012

As a resist member of SEMATECH's lithography program, Inpria will collaborate with SEMATECH engineers on critical issues for resist in extreme ultraviolet (EUV) lithography. Inpria's inorganic resists have resolved 11 nm line/space features and exhibit extremely high etch resistance. In this collaboration, Inpria and SEMATECH will extend such high-resolution resists to qualify the 0.5 NA EUV imaging optics at the heart of the major upgrades underway to support resist research for 11 nm half-pitch and below in the RMDC facilities. Inpria will also work to increase the photosensitivity of its resist materials to meet productivity requirements for future manufacturing applications.

"Our partnership with SEMATECH provides Inpria the opportunity to rapidly increase the rate of development for our EUV lithography materials," said Andrew Grenville, CEO of Inpria. "We are excited to combine SEMATECH's proven track record operating leading-edge patterning facilities with our experience creating novel chemistries for high-resolution inorganic resist. This collaboration further demonstrates our commitment to tackle the grand challenges in lithography faced by the semiconductor industry."

"We're looking forward to working with Inpria in our mutual effort to develop leading‑edge resists and materials, and accelerate process availability for EUV pilot line manufacturing," said Stefan Wurm, director of Lithography, SEMATECH. "This partnership will help strengthen the RMDC's ability to address critical resist issues in advanced materials and accelerate the search for new solutions to our common technology challenges."

"Further supporting Governor Andrew Cuomo's declaration that New York is open for business, we are delighted to welcome Inpria as the newest global technology partner at CNSE's Albany NanoTech Complex," said Richard Brilla, CNSE vice president for strategy, alliances and consortia. "The critical effort to enable advanced lithographic technologies for manufacturing will be enhanced by the addition of Inpria, which strengthens the CNSE-SEMATECH partnership and New York's recognition as the worldwide hub for nanotechnology innovation and commercialization."

The partnership will be based on SEMATECH's extensive network of hardware and research expertise, semiconductor experience, and highly respected market leadership and on Inpria's transformational semiconductor patterning materials and processes. SEMATECH's RMDC will provide access to two micro-exposure tools (METs) as well as several metrology tools located at the College of Nanoscale Science and Engineering of the University at Albany and the University of California, Berkeley.

At the RMDC, leading resist and materials suppliers participate in focused, cooperative R&D with SEMATECH member companies. Together, the RMDC provides the hardware and research expertise required by materials suppliers and member companies to develop EUV resist processes that meet the stringent resolution, linewidth roughness, and sensitivity specifications needed for EUV insertion at member companies.

####

About SEMATECH
SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, this year celebrates 25 years of excellence in accelerating the commercialization of technology innovations into manufacturing solutions. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org.

Twitter: www.twitter.com/sematechnews

About Inpria

Inpria designs and synthesizes solution precursors for the deposition of high-performance inorganic thin films, addressing critical needs in device fabrication and patterning across multiple industries. Our core materials technology provides the unique ability to deposit from solution extremely smooth dense metal oxide films that are directly photopatternable. Working together with our global network of partners, we are committed to developing a new class of electronic materials for the semiconductor industry. Information about Inpria Corporation can be found at www.inpria.com.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience and nanoeconomics. With more than $14 billion in high-tech investments, CNSE represents the world’s most advanced university-driven research enterprise, offering students a one-of-kind academic experience and providing over 300 corporate partners with access to an unmatched ecosystem for leading-edge R&D and commercialization of nanoelectronics and nanotechnology innovations. CNSE’s footprint spans upstate New York, including its Albany NanoTech Complex, an 800,000-square-foot megaplex with the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 85,000 square feet of Class 1 capable cleanrooms. More than 2,700 scientists, researchers, engineers, students and faculty work here, from companies including IBM, Intel, GlobalFoundries, SEMATECH, Samsung, TSMC, Toshiba, Applied Materials, Tokyo Electron, ASML and Novellus Systems. An expansion now underway, part of which will house the world’s first Global 450mm Consortium, will add nearly 500,000 square feet of next-generation infrastructure, an additional 50,000 square feet of Class 1 capable cleanrooms, and more than 1,000 scientists, researchers and engineers from CNSE and global corporations. In addition, CNSE’s Solar Energy Development Center in Halfmoon provides a prototyping and demonstration line for next-generation CIGS thin-film solar cells. CNSE’s Smart Systems Technology and Commercialization Center of Excellence (STC) in Rochester offers state-of-the-art capabilities for MEMS fabrication and packaging. CNSE also co-founded and manages operations at the Computer Chip Commercialization Center at SUNYIT in Utica and is a co-founder of the Nanotechnology Innovation and Commercialization Excelerator in Syracuse. For information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Dais Analytic Corporation Appoints Eliza Wang to Board of Directors: Company's Newest Director Brings Expertise in Commercial and Legal Matters Both in the United States and China; Joins on the Heels of Successful Business Development Trade Mission to China April 18th, 2015

Beyond the lithium ion -- a significant step toward a better performing battery April 18th, 2015

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Thin films

Cobalt film a clean-fuel find: Rice University discovery is efficient, robust at drawing hydrogen and oxygen from water April 15th, 2015

The microscopic topography of ink on paper: Researchers have analyzed the varying thickness of printed toner in unprecedented 3-D detail, yielding insights that could lead to higher quality, less expensive and more environmentally-friendly glossy and non-glossy papers April 14th, 2015

New understanding of electromagnetism could enable 'antennas on a chip' April 9th, 2015

LAMDAMAP 2015 hosted by the University March 26th, 2015

Chip Technology

Nanotubes with two walls have singular qualities: Rice University lab calculates unique electronic qualities of double-walled carbon nanotubes April 16th, 2015

Graphenea embarks on a new era April 16th, 2015

Quantization of 'surface Dirac states' could lead to exotic applications April 15th, 2015

Study shows novel pattern of electrical charge movement through DNA April 14th, 2015

Announcements

Dais Analytic Corporation Appoints Eliza Wang to Board of Directors: Company's Newest Director Brings Expertise in Commercial and Legal Matters Both in the United States and China; Joins on the Heels of Successful Business Development Trade Mission to China April 18th, 2015

Beyond the lithium ion -- a significant step toward a better performing battery April 18th, 2015

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Alliances/Partnerships/Distributorships

How can you see an atom? (video) April 10th, 2015

FibeRio and VF Corporation Form Strategic Partnership to Lead the Apparel and Footwear Markets in Nanofiber Technology April 8th, 2015

UK National Graphene Institute Selects Bruker as Official Partner: World-Leading Graphene Research Facility Purchases Multiple Bruker AFMs April 7th, 2015

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Research partnerships

Beyond the lithium ion -- a significant step toward a better performing battery April 18th, 2015

Light in a spin: Researchers demonstrate angular accelerating light April 15th, 2015

Graphene pushes the speed limit of light-to-electricity conversion: Researchers from ICFO, MIT and UC Riverside have been able to develop a graphene-based photodetector capable of converting absorbed light into an electrical voltage at ultrafast timescales April 14th, 2015

Scientists create invisible objects without metamaterial cloaking April 14th, 2015

Printing/Lithography/Inkjet/Inks

The microscopic topography of ink on paper: Researchers have analyzed the varying thickness of printed toner in unprecedented 3-D detail, yielding insights that could lead to higher quality, less expensive and more environmentally-friendly glossy and non-glossy papers April 14th, 2015

Inkjet-printed liquid metal could bring wearable tech, soft robotics April 8th, 2015

Perpetuus Advanced Materials secures landmark commercial agreement with global technology group Heraeus: Perpetuus will supply innovative alternatives to existing silver and copper-based inks and pastes April 2nd, 2015

Haydale Announce Dedicated Graphene Inks Manufacturing Capability March 25th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE