Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Picosun introduces several industrially scalable ALD processes Source: Picosun Oy

Abstract:
Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, has successfully scaled up several new, important ALD processes. Of compound materials, various new sulfides, e.g. Gd2O2S (based on the process originally developed by Prof. Mikko Ritala's group at University of Helsinki, Finland), indium sulfide and zinc sulfide, and oxides, e.g. antimony oxide and Al2O3/Ta2O5 nanolaminates and mixed oxides (also at lower temperatures), are now available for industrial scale processes. Of metals, gold, copper, silver and ruthenium, and of metallic compound materials, TiAlCN and TiN, have also been successfully deposited by novel ALD processes on industrial scale wafer sizes.

Picosun introduces several industrially scalable ALD processes Source: Picosun Oy

Espoo, Finland | Posted on November 30th, 2011

The new sulfides and oxides have various applications in e.g. optics, electronics and display industries and as multifunctional protective layers. ALD deposited metal/metallic layers, on the other hand, find their customers especially in MEMS/NEMS (Micro/Nanoelectromechanical systems) and other electronics and integrated circuits industries, where e.g. through-silicon-vias (TSV) and other high aspect ratio (HAR) structures are a common approach in modern 3D-stacked chip architectures. When the via or HAR trench dimensions narrow down to nanometer scale, ALD is the only possible thin film coating method with which e.g. contact metallization, seed, barrier or adhesion layers can be deposited with satisfactory conformality, uniformity and pinhole-free quality.

"In order to keep our spearheading position in serving world-class industrial customers, it is of utmost importance to stay in the lead also in ALD process development. Picosun's close connections to top level ALD research groups worldwide and the unrivaled ALD expertise of our own personnel make Picosun always your number one partner, not only as ALD equipment provider, but also in ALD process development. With Picosun's efficient and innovative production-scale high throughput ALD tool design, the process scale-up is fast and easy and never compromises Picosun's trademark, unparalleledly excellent film and process quality," summarizes Picosun's Managing Director Juhana Kostamo.

####

About Picosun Oy
Picosun Oy is a Finland-based global manufacturer of state-of-the-art ALD systems, representing continuity to almost four decades of dedicated, exclusive ALD reactor design and manufacturing. Picosun’s global headquarters are located in Espoo, Finland, its production facilities in Masala, Kirkkonummi, and its US headquarters in Detroit, Michigan. Picosun’s SUNALE™ ALD tools are chosen for production by various industries across four continents. Picosun Oy is a part of Stephen Industries Inc. Oy.

For more information, please click here

Contacts:
Mr. Juhana Kostamo
Phone: +358 50 321 1955
Fax: +358 20 722 7012

Copyright © Picosun Oy

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanoparticles Increase Durability of Concrete Decorations in Cold Areas January 26th, 2015

Iranian Researchers Boost Solar Cells Efficiency Using Anti-Aggregates January 26th, 2015

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Chip Technology

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

New method to generate arbitrary optical pulses January 21st, 2015

New signal amplification process set to transform communications, imaging, computing: UC San Diego researchers discover a mechanism to amplify signals in optoelectronic systems that is far more efficient than standard processes January 21st, 2015

Announcements

Nanoparticles Increase Durability of Concrete Decorations in Cold Areas January 26th, 2015

Iranian Researchers Boost Solar Cells Efficiency Using Anti-Aggregates January 26th, 2015

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Tools

Visualizing interacting electrons in a molecule: Scientists at Aalto University and the University of Zurich have succeeded in directly imaging how electrons interact within a single molecule January 26th, 2015

Graphene brings quantum effects to electronic circuits January 22nd, 2015

EnvisioNano: An image contest hosted by the National Nanotechnology Initiative (NNI) January 22nd, 2015

New Molecular Beam Epitaxy deposition equipment at the ICN2 January 22nd, 2015

Industrial

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Iranian Scientists Produce Graphene-Based Oxygen Sensor January 23rd, 2015

Teijin to Participate in Nano Tech 2015 January 22nd, 2015

Materials - Next-generation insulation ... January 13th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE