Nanotechnology Now - Press Release: "JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes"

Home > Press > JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes

Abstract:
JSR Micro and CEA-Leti today announced that JSR will partner with CEA-Leti to develop sub-20nm next- generation lithography materials and processes.

JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes

Leuven, Belgium | Posted on October 19th, 2011

The program will focus on pitch division to further extend 193nm optical lithography for logic applications below the 20nm node and on direct-write lithography, a maskless lithography (ML2) technology.

The specific ML2 development will be part of the IMAGINE program, a three-year project led by CEA-Leti that also includes semiconductor manufacturers TSMC and STMicroelectronics. It is developing a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput.

One of JSR's key focus areas is to enable sub-20nm technology development with a strong focus on next-generation lithography.

"JSR has a good understanding on what our customers need in terms of materials innovation, product performance, continuous quality and cost requirements and manufacturing," said Bruno Roland, President of JSR Micro. "The collaboration with CEA-Leti is therefore a great opportunity to join a large and ambitious program, and participate in challenging new lithography developments with realistic market targets. In addition to extending optical lithography, this collaboration gives us an unique opportunity to contribute to the development of ML2."

"The development of materials and processes is one of the main challenges facing lithography at the sub-20nm range," said Serge Tedesco, CEA-Leti program manager. "Pushing standard optical lithography in combination with new techniques, as maskless lithography, seems a real alternative and we are very excited to be supported by JSR in exploring these new areas."

####

About CEA-Leti
Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-m² of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,400 scientists and engineers and hosts more than 190 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 1,700 patent families.

About JSR

JSR Micro N.V., based in Leuven, Belgium, is a subsidiary of JSR Corporation, a multinational company employing over 5000 people worldwide and a leading materials supplier in a variety of technology driven markets. JSR’s global network is headquartered in Tokyo (Japan) and has factories and offices in Europe, US, China, Taiwan, Korea and Singapore. JSR is a research-oriented organization that pursues close collaborations with leading innovators in a number of industries that are key to the present and future welfare of human society: life-sciences, energy storage, electronic materials, display and optical materials. ‘Innovation one-on-one’ summarizes our value proposition to our customers. Through a very early and close collaboration JSR offers its customers a competitive advantage based on leading-edge technologies, consistent high quality and balanced cost of ownership.

For more information, please click here

Contacts:
JSR:
Bruno Roland
Phone: +32 16 832 832
Email:

CEA-Leti:
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency:
Amélie Ravier
Phone: +33 1 58 18 59 30
Email: