Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes

Abstract:
JSR Micro and CEA-Leti today announced that JSR will partner with CEA-Leti to develop sub-20nm next- generation lithography materials and processes.

JSR Micro Joins CEA-Leti in Project to Develop Sub-20nm Next-Generation Lithography Materials and Processes

Leuven, Belgium | Posted on October 19th, 2011

The program will focus on pitch division to further extend 193nm optical lithography for logic applications below the 20nm node and on direct-write lithography, a maskless lithography (ML2) technology.

The specific ML2 development will be part of the IMAGINE program, a three-year project led by CEA-Leti that also includes semiconductor manufacturers TSMC and STMicroelectronics. It is developing a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput.

One of JSR's key focus areas is to enable sub-20nm technology development with a strong focus on next-generation lithography.

"JSR has a good understanding on what our customers need in terms of materials innovation, product performance, continuous quality and cost requirements and manufacturing," said Bruno Roland, President of JSR Micro. "The collaboration with CEA-Leti is therefore a great opportunity to join a large and ambitious program, and participate in challenging new lithography developments with realistic market targets. In addition to extending optical lithography, this collaboration gives us an unique opportunity to contribute to the development of ML2."

"The development of materials and processes is one of the main challenges facing lithography at the sub-20nm range," said Serge Tedesco, CEA-Leti program manager. "Pushing standard optical lithography in combination with new techniques, as maskless lithography, seems a real alternative and we are very excited to be supported by JSR in exploring these new areas."

####

About CEA-Leti
Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-m˛ of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,400 scientists and engineers and hosts more than 190 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 1,700 patent families.

About JSR

JSR Micro N.V., based in Leuven, Belgium, is a subsidiary of JSR Corporation, a multinational company employing over 5000 people worldwide and a leading materials supplier in a variety of technology driven markets. JSR’s global network is headquartered in Tokyo (Japan) and has factories and offices in Europe, US, China, Taiwan, Korea and Singapore. JSR is a research-oriented organization that pursues close collaborations with leading innovators in a number of industries that are key to the present and future welfare of human society: life-sciences, energy storage, electronic materials, display and optical materials. ‘Innovation one-on-one’ summarizes our value proposition to our customers. Through a very early and close collaboration JSR offers its customers a competitive advantage based on leading-edge technologies, consistent high quality and balanced cost of ownership.

For more information, please click here

Contacts:
JSR:
Bruno Roland
Phone: +32 16 832 832
Email:

CEA-Leti:
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency:
Amélie Ravier
Phone: +33 1 58 18 59 30
Email:

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Electric-car battery materials could harm key soil bacteria February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Chip Technology

Research reveals carbon films can give microchips energy storage capability: International team from Drexel University and Paul Sabatier University reveals versatility of carbon films February 11th, 2016

New thin film transistor may lead to flexible devices: Researchers engineer an electronics first, opening door to flexible electronics February 10th, 2016

SUNY Poly and GLOBALFOUNDRIES Announce New $500M R&D Program in Albany To Accelerate Next Generation Chip Technology: Arrival of Second Cutting Edge EUV Lithography Tool Launches New Patterning Center That Will Generate Over 100 New High Tech Jobs at SUNY Poly February 9th, 2016

Electron's 1-D metallic surface state observed: A step for the prediction of electronic properties of extremely-fine metal nanowires in next-generation semiconductors February 9th, 2016

Announcements

Research reveals carbon films can give microchips energy storage capability: International team from Drexel University and Paul Sabatier University reveals versatility of carbon films February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Alliances/Trade associations/Partnerships/Distributorships

NSS Pays Tribute to Late NSS Governor Dr. Marvin Minsky, A Pioneer in Artificial Intelligence February 11th, 2016

SUNY Poly and GLOBALFOUNDRIES Announce New $500M R&D Program in Albany To Accelerate Next Generation Chip Technology: Arrival of Second Cutting Edge EUV Lithography Tool Launches New Patterning Center That Will Generate Over 100 New High Tech Jobs at SUNY Poly February 9th, 2016

Vesper Collaborates with GLOBALFOUNDRIES to Deliver First Piezoelectric MEMS Microphones: Acoustic sensing company works with top foundry to support mass-market consumer products January 21st, 2016

Imec and Cloudtag Collaborate on High Quality Frictionless Wearables for Lifestyle Coaching: Next-generation health and fitness tracker Cloudtag TrackTM launched at CES 2016 January 7th, 2016

Printing/Lithography/Inkjet/Inks

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

Teijin to Participate in Nano Tech 2016 January 21st, 2016

New bimetallic alloy nanoparticles for printed electronic circuits: Production of oxidation-resistant copper alloy nanoparticles by electrical explosion of wire for printed electronics January 5th, 2016

Photonic “sintering” may create new solar, electronics manufacturing technologies December 1st, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic