Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > New Etch Process Developed at the CNST uses Argon Pulsing to Improve Silicon Etch Rate and Selectivity

Abstract:
Engineers in the CNST NanoFab have developed a new plasma etching technique for silicon which improves the etch rate, the mask selectivity, and the sidewall profile by optimizing the addition of argon to the process flow.

New Etch Process Developed at the CNST uses Argon Pulsing to Improve Silicon Etch Rate and Selectivity

Gaithersburg, MD | Posted on September 30th, 2011

Small and high aspect ratio silicon structures can now be easily and more rapidly fabricated in the NanoFab using fluorinated plasma chemistry that is inherently isotropic. Directly adding argon to a typical SF6/C4F8 plasma primarily causes dilution and reduces the etch rate. By alternating the etch step with an argon-only step, both high selectivity and high etch rates were obtained while maintaining anisotropic etching. In a deep silicon etch, C4F8 is used to protect the Si sidewalls and SF6 is used to etch. Mixing argon with the etchant gases provides very limited or no improvement to the etch rate due to dilution. However, alternating argon surface bombardment steps with the chemical etch steps results in a four-fold increase in the silicon etch rate while maintaining vertical sidewalls. The silicon etch rate increases with the argon step time, independent of the SF6 step time, and the argon bombardment step is rate-determining. It influences the etch rate, as well as the selectivity and etching profile. The engineers postulate that argon surface bombardment renders the top atomic layers of the silicon amorphous, and then gas phase fluorine can react with and remove the silicon. With the long etch times associated with deep silicon trench etching, this faster process is likely to become widely used.

Effect of alternating Ar and SF6/C4F8 gas flow in Si nano-structure plasma etching, L. Chen, V. Luciani, and H. Miao, Microelectronic Engineering 88, 2470-2473 (2011).

####

For more information, please click here

Contacts:
Lei Chen
301-975-2908

Copyright © NIST

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Halas wins American Chemical Society Award in Colloid Chemistry: Rice University nanophotonics pioneer honored for colloid research September 18th, 2018

Leti & EFI Aim to Dramatically Improve Reliability & Speed of Low-Cost Electronic Devices for Autos: Project Will Extend Model Predictive Control Technique to Microcontrollers, Digital Signal Processors and Other Devices that Lack Powerful Computation Capabilities September 18th, 2018

Researchers managed to prevent the disappearing of quantum information September 14th, 2018

Tiny camera lens may help link quantum computers to network September 14th, 2018

Laboratories

Cannibalistic materials feed on themselves to grow new nanostructures September 1st, 2018

A Novel Graphene Quantum Dot Structure Takes the Cake August 24th, 2018

Virginia Tech researchers develop novel process to 3D print one of the strongest materials on Earth August 23rd, 2018

Connecting the (Nano) Dots: NIST Says Big-Picture Thinking Can Advance Nanoparticle Manufacturing August 22nd, 2018

Govt.-Legislation/Regulation/Funding/Policy

Researchers managed to prevent the disappearing of quantum information September 14th, 2018

New photonic chip promises more robust quantum computers September 14th, 2018

Could a demon help to create a quantum computer? Physicists implement a version of Maxwell's famous thought experiment for reducing entropy September 5th, 2018

Ultracold atoms used to verify 1963 prediction about 1D electrons: Rice University, University of Geneva study focuses on theory that's increasingly relevant to chipmakers September 5th, 2018

Chip Technology

Researchers managed to prevent the disappearing of quantum information September 14th, 2018

New devices based on rust could reduce excess heat in computers: Physicists explore long-distance information transmission in antiferromagnetic iron oxide September 14th, 2018

New photonic chip promises more robust quantum computers September 14th, 2018

How a tetrahedral substance can be more symmetrical than a spherical atom: A new type of symmetry September 14th, 2018

Discoveries

Researchers managed to prevent the disappearing of quantum information September 14th, 2018

Tiny camera lens may help link quantum computers to network September 14th, 2018

New devices based on rust could reduce excess heat in computers: Physicists explore long-distance information transmission in antiferromagnetic iron oxide September 14th, 2018

New photonic chip promises more robust quantum computers September 14th, 2018

Announcements

Halas wins American Chemical Society Award in Colloid Chemistry: Rice University nanophotonics pioneer honored for colloid research September 18th, 2018

Leti & EFI Aim to Dramatically Improve Reliability & Speed of Low-Cost Electronic Devices for Autos: Project Will Extend Model Predictive Control Technique to Microcontrollers, Digital Signal Processors and Other Devices that Lack Powerful Computation Capabilities September 18th, 2018

New devices based on rust could reduce excess heat in computers: Physicists explore long-distance information transmission in antiferromagnetic iron oxide September 14th, 2018

New photonic chip promises more robust quantum computers September 14th, 2018

Printing/Lithography/Inkjet/Inks/Bio-printing

Laser sintering optimized for printed electronics: New study sheds (laser) light on the best means of laying down thin-film circuitry September 13th, 2018

Virginia Tech researchers develop novel process to 3D print one of the strongest materials on Earth August 23rd, 2018

Color effects from transparent 3D printed nanostructures: New design tool automatically creates nanostructure 3D print templates for user-given colors Scientists present work at prestigious SIGGRAPH conference August 18th, 2018

CTI Materials drives nano commercialization with it's patented surfactant free nanoparticle dispersions August 15th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project