Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > New Etch Process Developed at the CNST uses Argon Pulsing to Improve Silicon Etch Rate and Selectivity

Abstract:
Engineers in the CNST NanoFab have developed a new plasma etching technique for silicon which improves the etch rate, the mask selectivity, and the sidewall profile by optimizing the addition of argon to the process flow.

New Etch Process Developed at the CNST uses Argon Pulsing to Improve Silicon Etch Rate and Selectivity

Gaithersburg, MD | Posted on September 30th, 2011

Small and high aspect ratio silicon structures can now be easily and more rapidly fabricated in the NanoFab using fluorinated plasma chemistry that is inherently isotropic. Directly adding argon to a typical SF6/C4F8 plasma primarily causes dilution and reduces the etch rate. By alternating the etch step with an argon-only step, both high selectivity and high etch rates were obtained while maintaining anisotropic etching. In a deep silicon etch, C4F8 is used to protect the Si sidewalls and SF6 is used to etch. Mixing argon with the etchant gases provides very limited or no improvement to the etch rate due to dilution. However, alternating argon surface bombardment steps with the chemical etch steps results in a four-fold increase in the silicon etch rate while maintaining vertical sidewalls. The silicon etch rate increases with the argon step time, independent of the SF6 step time, and the argon bombardment step is rate-determining. It influences the etch rate, as well as the selectivity and etching profile. The engineers postulate that argon surface bombardment renders the top atomic layers of the silicon amorphous, and then gas phase fluorine can react with and remove the silicon. With the long etch times associated with deep silicon trench etching, this faster process is likely to become widely used.

Effect of alternating Ar and SF6/C4F8 gas flow in Si nano-structure plasma etching, L. Chen, V. Luciani, and H. Miao, Microelectronic Engineering 88, 2470-2473 (2011).

####

For more information, please click here

Contacts:
Lei Chen
301-975-2908

Copyright © NIST

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

QD Vision Expands Product Line with Two-Millimeter Color LCD Display Optic: Color IQ™ Optic Enables Full-Color Gamut for Ultra-Thin Displays and All-in-One Computers April 16th, 2015

The National Science Foundation names engineering researcher Andrea Alú its Alan T. Waterman awardee for 2015: Alú is a pioneer in the field of metamaterials who has developed "cloaking" technology to make objects invisible to sensors April 16th, 2015

Laboratories

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Govt.-Legislation/Regulation/Funding/Policy

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

The National Science Foundation names engineering researcher Andrea Alú its Alan T. Waterman awardee for 2015: Alú is a pioneer in the field of metamaterials who has developed "cloaking" technology to make objects invisible to sensors April 16th, 2015

Long Island Capital Alliance Announces Participants for Brookhaven National Laboratory Technology Transfer Capital Forum on May 8: Keynote Speaker Dr. Doon Gibbs, Director of Brookhaven National Laboratory April 16th, 2015

Major advance in artificial photosynthesis poses win/win for the environment: Berkeley Lab researchers perform solar-powered green chemistry with captured CO2 April 16th, 2015

Chip Technology

Nanotubes with two walls have singular qualities: Rice University lab calculates unique electronic qualities of double-walled carbon nanotubes April 16th, 2015

Graphenea embarks on a new era April 16th, 2015

Quantization of 'surface Dirac states' could lead to exotic applications April 15th, 2015

Study shows novel pattern of electrical charge movement through DNA April 14th, 2015

Discoveries

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Major advance in artificial photosynthesis poses win/win for the environment: Berkeley Lab researchers perform solar-powered green chemistry with captured CO2 April 16th, 2015

Newly-Developed Nanocatalysts Increase Performance of Fuel Cells April 16th, 2015

Lanthanide-Organic Framework Nanothermometers Prepared by Spray-Drying April 16th, 2015

Announcements

Protein Building Blocks for Nanosystems: Scientists develop method for producing bio-based materials with new properties April 17th, 2015

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Newly-Developed Nanocatalysts Increase Performance of Fuel Cells April 16th, 2015

Lanthanide-Organic Framework Nanothermometers Prepared by Spray-Drying April 16th, 2015

Printing/Lithography/Inkjet/Inks

The microscopic topography of ink on paper: Researchers have analyzed the varying thickness of printed toner in unprecedented 3-D detail, yielding insights that could lead to higher quality, less expensive and more environmentally-friendly glossy and non-glossy papers April 14th, 2015

Inkjet-printed liquid metal could bring wearable tech, soft robotics April 8th, 2015

Perpetuus Advanced Materials secures landmark commercial agreement with global technology group Heraeus: Perpetuus will supply innovative alternatives to existing silver and copper-based inks and pastes April 2nd, 2015

Haydale Announce Dedicated Graphene Inks Manufacturing Capability March 25th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE