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Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced metrology systems, today announced that its IMPULSE® integrated metrology optical critical dimension (OCD) and film analysis system has been selected by a major Korean memory manufacturer for chemical mechanical planarization (CMP) process control. The decision makes the Nanometrics IMPULSE system "tool-of-record" for CMP control of NAND Flash memory in high-volume manufacturing at the 2x nm node. The IMPULSE was selected over competitive offerings following an extended technical evaluation.
"Today's demands on CMP process control absolutely require integrated solutions," said Steve Bradley, Director of Nanometrics' Integrated Metrology Business Unit. "The selection of the IMPULSE for this leading-edge application is evidence of our product's high throughput, excellent reliability, extendibility, and seamless integration onto the CMP platform, as well as the customer's confidence in Nanometrics' global service and applications support teams."
"The selection of our integrated metrology product combined with an earlier decision in favor of our fully-automated Atlas OCD platform firmly establishes Nanometrics as the principle supplier of OCD products to this customer for advanced technology process control metrology," said Dr. Timothy J. Stultz, president and chief executive officer. "By working closely with our customers on product roadmaps and aligning our product development with their requirements, we benefit from long term partnerships while we contribute to their advanced technology development and production ramps."
About Nanometrics Incorporated
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Select Global Market under the symbol NANO.
Forward Looking Statements
This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of the company’s metrology products, market leadership and growth of OCD metrology. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, expectations regarding product capabilities, market share and growth are subject to a number of risks, including changes in customer spending plans and technology roadmaps, worldwide economic conditions and the continued technological leadership of our products. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended January 1, 2011 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.
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