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Researchers at Iranian Aluminum Research Center managed to introduce a new method for nanostructured titanium nitride layer deposition in order to improve erosive resistance of metals.
"Active screen plasma nitriding is one of the novel surface hardening methods which is usually used for formation of iron nitride coating. We attempted to apply this method, by making modifications, for deposition of nano-sized titanium nitride", Arash Yazdani, one of the researchers, said.
Elaborating on the research objectives, he said, "Today, methods such as CVD, PACVD, and PVD are used for deposition of nano-sized titanium nitride. They all have some limitations. Thus, our research sought to study the feasibility of active screen plasma nitriding as an alternative to the aforementioned methods so that it doesn't confront any of their limitations and its commercialization".
The researcher noted that the next step in his research is the optimization of nanocoating properties on sublayers of different materials via changing deposition conditions so that it would be possible to introduce this method as a new and economical method which has advantages over the previous methods to the industry.
Eng. Yazdani stated that commercialization of this method is one of their main objectives, and said, "So far we had successes in signing contracts with a number of casting workshops and plants."
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