Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > XEI Scientific launches Evactron® CombiClean™ at M&M 2011

XEI Scientific's new Evactron® CombiClean™ system
XEI Scientific's new Evactron® CombiClean™ system

Abstract:
XEI Scientific Inc, manufacturers of more than 1,100 EVACTRON® De-Contaminator Plasma Cleaning Systems for electron microscopes and other vacuum chambers, announces the release of their new Evactron® CombiClean™ system which simplifies the control and operation of plasma radical sources for both column and desktop cleaning of specimens for electron columns used in SEMs, TEMs and FIBs.

XEI Scientific launches Evactron® CombiClean™ at M&M 2011

Redwood City, CA | Posted on July 20th, 2011

With over 1,100 Evactron De-Contamination systems in use primarily on electron columns (SEMs, TEMs and FIBs), XEI Scientific is expanding applications of their effective downstream plasma cleaning technology. Earlier this year XEI introduced the Evactron® SoftClean™ Chamber which allows users to mount Evactron Plasma Radical Sources (PRS's) onto a desktop vacuum chamber to provide the same effective removal of problematic hydrocarbon contamination from samples, holders and other parts before they are placed in the electron column.

Using RF and a patented hollow cathode electrode, Evactron systems produce a plasma that is contained in the PRS module. Reactive gas radicals are generated and drawn into the sample chamber where they chemically break down unwanted hydrocarbon molecules into smaller constituents which are then easily removed by the instrument's vacuum system.

At the Microscopy and Microanalysis meeting in Nashville, TN on August 7-11 (http://www.microscopy.org/MandM/2011/index.cfm), XEI Scientific will introduce the Evactron CombiClean™ System to simplify the control and operation of multiple PRS modules on columns and desktops. With a new integrated controller and vacuum chamber, operators can easily select which PRS is active via the system front panel and seamlessly switch between column cleaning and desktop de-contamination of parts destined for use in the microscopes.

Other benefits include multiple insertion ports for cleaning TEM sample holders. The cleaning chamber may function as a secure, long-term storage container for decontaminated samples. It has a large circular lid for convenient access to insert samples, while dry nitrogen purging prevents back streaming after plasma cleaning and during sample storage to allow the use of rotary vane pumps. Attractively priced and with a small footprint, this new cleaning solution continues the nearly 20 year tradition established by XEI of providing cost effective and innovative solutions to improve the performance of electron and ion imaging tools.

For more information on how to improve the image quality in electron or ion microscopes, please visit the company's website at www.Evactron.com or send a request to Visit XEI at M&M, booth #724.

####

About XEI Scientific, Inc.
XEI Scientific Inc. invented the Evactron De-Contaminator in 1999 as the first plasma cleaner to use a downstream cleaning process to remove carbon from electron microscopes. A proprietary plasma source uses air to produce oxygen radicals for oxidation of carbon compounds for removal by the pumps. Carbon-free-vacuum produces the highest quality images and analytical results from SEMs and other vacuum analytical instruments. XEI innovations include a unique RF plasma generator, a patented RF electrode, and easy start programmed plasma cleaning. All XEI products come with a 5 year warranty and are compliant with CE, NRTL, and Semi-S2 safety standards. XEI offers a variety of Evactron systems to meet user needs and has over 1000 installations around the world.

For more information, please click here

Contacts:
Jezz Leckenby
NetDyaLog Limited
T: +44 (0) 1799 521881
M: +44 (0) 7843 012997

or
Tom Levesque
XEI Scientific
T: +1 (972) 318 0196

Copyright © XEI Scientific, Inc.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Announcements

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Tools

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Controlled electron pulses November 30th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

News from Quorum: The Agricultural Research Service of the USDA uses a Quorum Cryo-SEM preparation system for the study of mites, ticks and other soft bodied organisms November 22nd, 2016

Events/Classes

IEDM: Leti CEO Marie Semeria to Give Opening-day Keynote on Impact of ‘Hyperconnectivity’ and IoT: Speech to Portray Key Role Nonprofit Research and Technology Organizations Play in Making Technology More Efficient and Ensuring Safety and Security November 29th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Cutting-edge nanotechnologies are breaking into industries November 18th, 2016

IEDM: CEO Marie Semeria to Deliver Opening Day Keynote at IEDM 2016; Institute to Present 13 Papers November 17th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project