Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > XEI Scientific launches Evactron® CombiClean™ at M&M 2011

XEI Scientific's new Evactron® CombiClean™ system
XEI Scientific's new Evactron® CombiClean™ system

Abstract:
XEI Scientific Inc, manufacturers of more than 1,100 EVACTRON® De-Contaminator Plasma Cleaning Systems for electron microscopes and other vacuum chambers, announces the release of their new Evactron® CombiClean™ system which simplifies the control and operation of plasma radical sources for both column and desktop cleaning of specimens for electron columns used in SEMs, TEMs and FIBs.

XEI Scientific launches Evactron® CombiClean™ at M&M 2011

Redwood City, CA | Posted on July 20th, 2011

With over 1,100 Evactron De-Contamination systems in use primarily on electron columns (SEMs, TEMs and FIBs), XEI Scientific is expanding applications of their effective downstream plasma cleaning technology. Earlier this year XEI introduced the Evactron® SoftClean™ Chamber which allows users to mount Evactron Plasma Radical Sources (PRS's) onto a desktop vacuum chamber to provide the same effective removal of problematic hydrocarbon contamination from samples, holders and other parts before they are placed in the electron column.

Using RF and a patented hollow cathode electrode, Evactron systems produce a plasma that is contained in the PRS module. Reactive gas radicals are generated and drawn into the sample chamber where they chemically break down unwanted hydrocarbon molecules into smaller constituents which are then easily removed by the instrument's vacuum system.

At the Microscopy and Microanalysis meeting in Nashville, TN on August 7-11 (http://www.microscopy.org/MandM/2011/index.cfm), XEI Scientific will introduce the Evactron CombiClean™ System to simplify the control and operation of multiple PRS modules on columns and desktops. With a new integrated controller and vacuum chamber, operators can easily select which PRS is active via the system front panel and seamlessly switch between column cleaning and desktop de-contamination of parts destined for use in the microscopes.

Other benefits include multiple insertion ports for cleaning TEM sample holders. The cleaning chamber may function as a secure, long-term storage container for decontaminated samples. It has a large circular lid for convenient access to insert samples, while dry nitrogen purging prevents back streaming after plasma cleaning and during sample storage to allow the use of rotary vane pumps. Attractively priced and with a small footprint, this new cleaning solution continues the nearly 20 year tradition established by XEI of providing cost effective and innovative solutions to improve the performance of electron and ion imaging tools.

For more information on how to improve the image quality in electron or ion microscopes, please visit the company's website at www.Evactron.com or send a request to Visit XEI at M&M, booth #724.

####

About XEI Scientific, Inc.
XEI Scientific Inc. invented the Evactron De-Contaminator in 1999 as the first plasma cleaner to use a downstream cleaning process to remove carbon from electron microscopes. A proprietary plasma source uses air to produce oxygen radicals for oxidation of carbon compounds for removal by the pumps. Carbon-free-vacuum produces the highest quality images and analytical results from SEMs and other vacuum analytical instruments. XEI innovations include a unique RF plasma generator, a patented RF electrode, and easy start programmed plasma cleaning. All XEI products come with a 5 year warranty and are compliant with CE, NRTL, and Semi-S2 safety standards. XEI offers a variety of Evactron systems to meet user needs and has over 1000 installations around the world.

For more information, please click here

Contacts:
Jezz Leckenby
NetDyaLog Limited
T: +44 (0) 1799 521881
M: +44 (0) 7843 012997

or
Tom Levesque
XEI Scientific
T: +1 (972) 318 0196

Copyright © XEI Scientific, Inc.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Using ultrathin sheets to discover new class of wrapped shapes: UMass Amherst materials researchers describe a new regime of wrapped shapes August 31st, 2015

New material science research may advance tech tools August 31st, 2015

Efficiency of Nanodrug Containing Antibiotics in Treatment of Infectious Diseases Evaluated August 31st, 2015

Researchers use DNA 'clews' to shuttle CRISPR-Cas9 gene-editing tool into cells August 30th, 2015

Announcements

Using ultrathin sheets to discover new class of wrapped shapes: UMass Amherst materials researchers describe a new regime of wrapped shapes August 31st, 2015

An engineered surface unsticks sticky water droplets August 31st, 2015

New material science research may advance tech tools August 31st, 2015

Efficiency of Nanodrug Containing Antibiotics in Treatment of Infectious Diseases Evaluated August 31st, 2015

Tools

Nanolab Technologies LEAPS Forward with High-Performance Analysis Services to the World: Nanolab Orders Advanced Local Electrode Atom Probe (LEAP®) Microscope from CAMECA Unit of AMETEK Materials Analysis Division August 27th, 2015

Nanometrics to Participate in the Citi 2015 Global Technology Conference August 26th, 2015

50 Years of Scanning Electron Microscopy from ZEISS: ZEISS celebrates the birth of the first commercial scanning electron microscope in 1965 August 26th, 2015

Announcing Oxford Instruments and School of Physics signing a Memorandum of Understanding August 26th, 2015

Events/Classes

Nanometrics to Participate in the Citi 2015 Global Technology Conference August 26th, 2015

Developing Component Scale Composites Using Nanocarbons August 26th, 2015

Nanotechnology that will impact the Security & Defense sectors to be discussed at NanoSD2015 conference August 25th, 2015

Abstract Submission Deadline for “2nd International Conference on Infectious Diseases & Nanomedicine (December 15-18, 2015, Kathmandu, NEPAL)” has been extended to Sept 15. August 20th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic