Nanotechnology Now





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Imec broadens EUV mask integrity research program with SUSS MicroTec

Particle Removal Efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. (1x clean)
Particle Removal Efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. (1x clean)

Abstract:
Imec today announced that it has broadened its research program with SUSS MicroTec to develop an in-fab approach to EUV (Extreme Ultra-Violet) mask integrity. The extended collaboration builds on the success of the mask cleaning processes of record (POR) collaboration between HamaTech APE GmbH & Co. KG, a wholly-owned subsidiary of SUSS MicroTec, and imec, which started in 2009. This broadened scope of research will focus on mask cleanliness during in-fab transportation and storage. Development of a holistic mask management system will provide partners using EUV lithography, a sophisticated approach to preserve mask integrity prior-to-exposure.

Imec broadens EUV mask integrity research program with SUSS MicroTec

Leuven, Belgium | Posted on July 11th, 2011

Unlike photomasks used in optical lithography today, EUV masks will not have the protection of a pellicle, making it sensitive to particle and organic contamination. A higher cleaning frequency will be required to mitigate the risk of wafer loss and yield loss from contamination of the patterned side of the mask. However, of increasing concern is contamination on the backside of the mask which, if introduced into the scanner, could transfer to the reticle clamp causing serious overlay issues. To clean the reticle clamp the scanner would require extensive downtime at a considerable cost to the semiconductor manufacturer.

Over the last year, imec's mask cleaning program reached significant milestones in the development of processes of record (PORs) for EUV mask cleaning, using the SUSS MaskTrack Pro photomask cleaning system, which was installed in imec's 300mm clean room in 2009. The developed PORs are effective in removing the contamination of interest, yet are gentle enough to be applied repeatedly without reducing mask lifetime. Investigation and optimization of EUV reticle backside cleaning processes, which do not influence the front-side, were developed and demonstrated to keep the overlay performance of the EUV scanner in spec. Imec achieved a Particle Removal Efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. To reach a PRE of 100% we need to avoid artifacts caused by handling, transportation and storage. Therefore, a controlled mask management environment is necessary from the time the mask enters the fab throughout the entire lifetime of the mask. Exactly this assurance is the main trigger for our broadened research scope towards totally automated handling for the recently installed NXE-3100 using the SUSS MaskTrack Pro InSync (InSync) in-fab mask management system.

InSync is designed to meet the strictest EUV mask integrity requirements prior-to-exposure. The exclusive InSync provides a highly controlled environment to automatically transfer EUV masks into [and out of] the dual pod, eliminating the risk of contamination from manual handling and transfer. The critical inner pod can be stored inside of the InSync environment. Functioning as a loadport, InSync can accept a reticle dual pod directly from the scanner for transfer to the MaskTrack Pro cleaning tool. InSync will provide the foundation for further development of the mask integrity infrastructure at imec.

Kurt Ronse, program director advanced lithography at imec said, "Our goal to provide an EUV infrastructure that delivers a defect-free mask at point-of-exposure, has not changed. Building on our important progress on mask cleaning, we are excited to expand the scope of our research to deliver a holistic mask management system. The installation of the MaskTrack Pro InSync and our on-going collaborative research efforts with SUSS Microtech provides a world-class team and resources focused on mask integrity for the advancement of EUV technology."

"We are very pleased to continue our collaboration with imec on an EUV mask integrity infrastructure for next generation lithography," said Frank P. Averdung, President and CEO of SUSS MicroTec AG . "The MaskTrack Pro InSync, is the only mask management system available that can automatically interface with the unique EUV dual pod in a fully-controlled environment. Designed to cluster EUV mask cleaning, transfer and storage in a pristine environment, InSync provides a holistic approach to mask management throughout the life of the mask."

####

About IMEC
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of about 1,900 people includes over 550 industrial residents and guest researchers. In 2010, imec's revenue (P&L) was 285 million euro. Further information on imec can be found at www.imec.be.

Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government),imec Taiwan (IMEC Taiwan Co.)and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).

For more information, please click here

Contacts:
Katrien Marent
External Communications Director
T: +32 16 28 18 80
Mobile: +32 474 30 28 66


Barbara Kalkis
Maestro Marketing & PR
T : +1 408 996 9975
M : +1 408 529 4210

Copyright © IMEC

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015

Pioneering Southampton scientist awarded prestigious physics medal July 3rd, 2015

Groundbreaking research to help control liquids at micro and nano scales July 3rd, 2015

Discovery of nanotubes offers new clues about cell-to-cell communication July 2nd, 2015

Chip Technology

Nanometrics to Announce Second Quarter Financial Results on July 23, 2015 July 2nd, 2015

The quantum middle man July 2nd, 2015

New technology using silver may hold key to electronics advances July 2nd, 2015

Emergence of a 'devil's staircase' in a spin-valve system July 1st, 2015

Announcements

Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015

Pioneering Southampton scientist awarded prestigious physics medal July 3rd, 2015

Groundbreaking research to help control liquids at micro and nano scales July 3rd, 2015

NIST Group Maps Distribution of Carbon Nanotubes in Composite Materials July 2nd, 2015

Tools

Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015

Nanometrics to Announce Second Quarter Financial Results on July 23, 2015 July 2nd, 2015

NIST ‘How-To’ Website Documents Procedures for Nano-EHS Research and Testing July 1st, 2015

Ultra-stable JILA microscopy technique tracks tiny objects for hours July 1st, 2015

Alliances/Trade associations/Partnerships/Distributorships

Harris & Harris Group Portfolio Company, AgBiome, Announces Partnership to Accelerate the Discovery of Next Generation Insect-Resistant Crops July 1st, 2015

Graphene breakthrough as Bosch creates magnetic sensor 100 times more sensitive than silicon equivalent June 28th, 2015

Dyesol Joins Solliance as an Industrial Partner June 17th, 2015

The European project SVARNISH, a step forward in the food packaging sector June 11th, 2015

Printing/Lithography/Inkjet/Inks

New technology using silver may hold key to electronics advances July 2nd, 2015

New conductive ink for electronic apparel June 25th, 2015

Leti to Present Solutions to New Applications Using 3D Technologies at SEMICON West LetiDay Event, July 14: Leti Experts also Will Speak at TechXPOT Session on MEMS and STS Session on Lithography Cost-and-Productivity Issues Below 14nm June 22nd, 2015

$8.5M Grant For Developing Nano Printing Technology: 4-D printing to advance chemistry, materials sciences and defense capabilities June 18th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project