- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
|Particle Removal Efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. (1x clean)|
Imec today announced that it has broadened its research program with SUSS MicroTec to develop an in-fab approach to EUV (Extreme Ultra-Violet) mask integrity. The extended collaboration builds on the success of the mask cleaning processes of record (POR) collaboration between HamaTech APE GmbH & Co. KG, a wholly-owned subsidiary of SUSS MicroTec, and imec, which started in 2009. This broadened scope of research will focus on mask cleanliness during in-fab transportation and storage. Development of a holistic mask management system will provide partners using EUV lithography, a sophisticated approach to preserve mask integrity prior-to-exposure.
Unlike photomasks used in optical lithography today, EUV masks will not have the protection of a pellicle, making it sensitive to particle and organic contamination. A higher cleaning frequency will be required to mitigate the risk of wafer loss and yield loss from contamination of the patterned side of the mask. However, of increasing concern is contamination on the backside of the mask which, if introduced into the scanner, could transfer to the reticle clamp causing serious overlay issues. To clean the reticle clamp the scanner would require extensive downtime at a considerable cost to the semiconductor manufacturer.
Over the last year, imec's mask cleaning program reached significant milestones in the development of processes of record (PORs) for EUV mask cleaning, using the SUSS MaskTrack Pro photomask cleaning system, which was installed in imec's 300mm clean room in 2009. The developed PORs are effective in removing the contamination of interest, yet are gentle enough to be applied repeatedly without reducing mask lifetime. Investigation and optimization of EUV reticle backside cleaning processes, which do not influence the front-side, were developed and demonstrated to keep the overlay performance of the EUV scanner in spec. Imec achieved a Particle Removal Efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. To reach a PRE of 100% we need to avoid artifacts caused by handling, transportation and storage. Therefore, a controlled mask management environment is necessary from the time the mask enters the fab throughout the entire lifetime of the mask. Exactly this assurance is the main trigger for our broadened research scope towards totally automated handling for the recently installed NXE-3100 using the SUSS MaskTrack Pro InSync (InSync) in-fab mask management system.
InSync is designed to meet the strictest EUV mask integrity requirements prior-to-exposure. The exclusive InSync provides a highly controlled environment to automatically transfer EUV masks into [and out of] the dual pod, eliminating the risk of contamination from manual handling and transfer. The critical inner pod can be stored inside of the InSync environment. Functioning as a loadport, InSync can accept a reticle dual pod directly from the scanner for transfer to the MaskTrack Pro cleaning tool. InSync will provide the foundation for further development of the mask integrity infrastructure at imec.
Kurt Ronse, program director advanced lithography at imec said, "Our goal to provide an EUV infrastructure that delivers a defect-free mask at point-of-exposure, has not changed. Building on our important progress on mask cleaning, we are excited to expand the scope of our research to deliver a holistic mask management system. The installation of the MaskTrack Pro InSync and our on-going collaborative research efforts with SUSS Microtech provides a world-class team and resources focused on mask integrity for the advancement of EUV technology."
"We are very pleased to continue our collaboration with imec on an EUV mask integrity infrastructure for next generation lithography," said Frank P. Averdung, President and CEO of SUSS MicroTec AG . "The MaskTrack Pro InSync, is the only mask management system available that can automatically interface with the unique EUV dual pod in a fully-controlled environment. Designed to cluster EUV mask cleaning, transfer and storage in a pristine environment, InSync provides a holistic approach to mask management throughout the life of the mask."
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of about 1,900 people includes over 550 industrial residents and guest researchers. In 2010, imec's revenue (P&L) was 285 million euro. Further information on imec can be found at www.imec.be.
Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government),imec Taiwan (IMEC Taiwan Co.)and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).
For more information, please click here
External Communications Director
T: +32 16 28 18 80
Mobile: +32 474 30 28 66
Maestro Marketing & PR
T : +1 408 996 9975
M : +1 408 529 4210
Copyright © IMECIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
New theory could lead to new generation of energy friendly optoelectronics: Researchers at Queen's University Belfast and ETH Zurich, Switzerland, have created a new theoretical framework which could help physicists and device engineers design better optoelectronics August 23rd, 2016
Down to the wire: ONR researchers and new bacteria August 18th, 2016
University of Puerto Rico and NASA back in the news – XEI reports August 23rd, 2016
Spider silk: Mother Nature's bio-superlens August 22nd, 2016
Tracing barnacle's footprint August 19th, 2016
XEI Scientific celebrates its Silver Anniversary August 16th, 2016
Thomas Swan and NGI announce unique partnership July 28th, 2016
Tailored probes for atomic force microscopes: 3-D laser lithography enhances microscope for studying nanostructures in biology and engineering/ publication in Applied Physics Letters August 11th, 2016
Smarter self-assembly opens new pathways for nanotechnology: Brookhaven Lab scientists discover a way to create billionth-of-a-meter structures that snap together in complex patterns with unprecedented efficiency August 9th, 2016