Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > KLA-Tencor™ and SEMATECH Partner to Advance EUV Lithography Technology at UAlbany NanoCollege: Collaboration will drive the development of critical processes for advanced defect detection to support EUVL introduction

Abstract:
SEMATECH (www.sematech.org), a global consortium of chipmakers, and KLA-Tencor Corporation™ (NASDAQ: KLAC), the world's leading supplier of process control and yield management solutions for the semiconductor and related industries, today announced KLA-Tencor has joined SEMATECH's Lithography Defect Reduction program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

KLA-Tencor™ and SEMATECH Partner to Advance EUV Lithography Technology at UAlbany NanoCollege: Collaboration will drive the development of critical processes for advanced defect detection to support EUVL introduction

Albany, NY and Milpitas, CA | Posted on June 21st, 2011

As a member of the Defect Reduction program, KLA-Tencor will collaborate with SEMATECH engineers at the industry-leading defect reduction center for extreme ultraviolet (EUV) tool and materials technology. Specific areas for collaboration include defect source identification and elimination using leading-edge metrology, printability, and characterization methods to advance mask metrology infrastructure and metrology source development, as well as overall EUV manufacturability and extendibility.

EUV lithography (EUVL) is a method using a source wavelength 15 times shorter than current lithography systems, enabling semiconductor scaling to resolutions of 10 nanometers (nm) and smaller. A lower defect density is essential for advanced lithography processes and for inserting EUVL technology into high-volume manufacturing, which is projected to be introduced for the 22nm half-pitch node in 2012-2013 at leading integrated circuit (IC) manufacturers. In order to prepare EUVL for manufacturing, a concerted effort is required that focuses on defect reduction and mask metrology infrastructure, source development, and overall manufacturability and extendibility.

"The unique combination of KLA-Tencor's state-of-the-art lithography inspection tools and measurement expertise with SEMATECH's broad industry engagement and long track record in the research and development of EUV will enable collaboration on solutions that support the critical needs of our customers and the industry," said Rick Wallace, KLA-Tencor's president and CEO. "We are excited to partner with SEMATECH to develop new metrology capabilities that address the fundamental defect detection and reduction processes that are critical for EUV infrastructure."

"There are too many challenges in moving EUVL to cost-effective manufacturing to solve alone. Increased collaboration with equipment suppliers in the early stages of technological innovation is increasingly required to obtain the breakthrough results that are needed," said Dan Armbrust, president and CEO, SEMATECH. "Our strategic partnership with KLA-Tencor will strengthen our ability to resolve these industry-wide EUVL challenges."

"We are delighted to welcome this new partnership between KLA-Tencor and SEMATECH, which will further build the intellectual know-how and unparalleled technological capabilities at the UAlbany NanoCollege," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "This collaboration underscores the pivotal role that research at CNSE's Albany NanoTech Complex is playing in advancing next-generation technologies to support the critical needs of industry."

Through global leadership and collaboration, SEMATECH's Lithography Program is leading the industry in providing critical information and solutions for current and emerging lithography systems. The program aims to drive consensus-based solutions and infrastructure development to ensure that capable, cost-effective lithography is available when needed to member companies and the semiconductor industry. To do this, SEMATECH is leading the development of critical EUV mask metrology infrastructure and EUV resists.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.
Twitter: www.twitter.com/sematechnews

About KLA-Tencor:

KLA-Tencor Corporation (NASDAQ: KLAC), a leading provider of process control and yield management solutions, partners with customers around the world to develop state-of-the-art inspection and metrology technologies. These technologies serve the semiconductor, data storage, LED, photovoltaic, and other related nanoelectronics industries. With a portfolio of industry-standard products and a team of world-class engineers and scientists, the company has created superior solutions for its customers for more than 30 years. Headquartered in Milpitas, Calif., KLA-Tencor has dedicated customer operations and service centers around the world. Additional information may be found at www.kla-tencor.com.

About CNSE:

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $7 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, GlobalFoundries, SEMATECH, Toshiba, Samsung, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. An expansion now underway is projected to increase the size of CNSE’s Albany NanoTech Complex to over 1,250,000 square feet of next-generation infrastructure housing over 135,000 square feet of Class 1 capable cleanrooms and more than 3,750 scientists, researchers and engineers from CNSE and global corporations. For more information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
o: 518-649-1041
m: 518-487-8256


Meggan Powers
KLA-Tencor
o: 408-875-8733

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Exotic insulator may hold clue to key mystery of modern physics: Johns Hopkins-led research shows material living between classical and quantum worlds December 8th, 2016

Arrowhead Pharmaceuticals to Webcast Fiscal 2016 Year End Results December 7th, 2016

Journal Nanotechnology Progress International (JONPI), newest edition out December 7th, 2016

Academic/Education

Oxford Nanoimaging report on how the Nanoimager, a desktop microscope delivering single molecule, super-resolution performance, is being applied at the MRC Centre for Molecular Bacteriology & Infection November 22nd, 2016

The University of Applied Sciences in Upper Austria uses Deben tensile stages as an integral part of their computed tomography research and testing facility October 18th, 2016

Enterprise In Space Partners with Sketchfab and 3D Hubs for NewSpace Education October 13th, 2016

New Agricultural Research Center Debuts at UCF October 12th, 2016

Chip Technology

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Construction of practical quantum computers radically simplified: Scientists invent ground-breaking new method that puts quantum computers within reach December 5th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

Enterprise In Space Partners with Sketchfab and 3D Hubs for NewSpace Education October 13th, 2016

Printing/Lithography/Inkjet/Inks/Bio-printing

Bumpy surfaces, graphene beat the heat in devices: Rice University theory shows way to enhance heat sinks in future microelectronics November 29th, 2016

Engineers develop new magnetic ink to print self-healing devices that heal in record time November 7th, 2016

Iran to hold intl. school on application of nanomaterials in medicine September 20th, 2016

Tailored probes for atomic force microscopes: 3-D laser lithography enhances microscope for studying nanostructures in biology and engineering/ publication in Applied Physics Letters August 11th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project