Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > NIL Technology Announces Low-Cost and Compact Nanoimprint Tool for Universities

Abstract:
To lower the entry barriers to nanoimprint lithography for universities and R&D departments, NIL Technology (NILT) today announces the introduction of its new Compact Nanoimprint Tool (CNI Tool). The CNI Tool is a compact thermal nanoimprint lithography tool that does not require any fixed lab installation. It is easy to use and the CNI Tool has a performance that is comparable to other commercially available nanoimprint tools, thereby providing access to fast replication of nanostructures with only a small investment.

NIL Technology Announces Low-Cost and Compact Nanoimprint Tool for Universities

Kongens Lyngby, Denmark | Posted on June 2nd, 2011

Today, getting started with nanoimprint lithography still require a significant investment exceeding hundreds of thousand of euros, and on top of this the running cost of cleanroom equipment is significant. With its compact size, low cost and outstanding performance, the CNI Tool represents a viable and alternative way to exploit the benefits associated to nanoimprint lithography.

The unique CNI Tool is delivered as a plug-and-play system and can be operated by students as well as trained engineers. The system operates at low pressures (below 10 bar), it has a unique temperature control, and it is versatile with respect to stamp formats and materials. CNI is a "first print" tool, i.e. there are no alignment options besides flat alignment. The CNI Tool can be used with any regular stamp that users might have, but also with dedicated stamps provided by NILT to ensure very accurate control of the entire imprint process.

"We see the introduction of the CNI Tool as a very important event for the nanoimprint community. By significantly reducing the entry barriers to start working with nanoimprint lithography, the CNI Tool represent a perfect starting point for commencing activities and to develop nanoimprint related competences. With the introduction of the CNI Tool, we aim to facilitate easy access to nanoimprint lithography", comments NILT‚s CEO Theodor Nielsen.

####

About NIL Technology ApS (NILT)
NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern. NILT is located in Kongens Lyngby, Denmark.

For more information, please click here

Contacts:
Theodor Nielsen, CEO
Direct: +45 3171 9036
E-mail:

Copyright © NIL Technology ApS (NILT)

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Imec Reports Four Percent Growth for 2013 Fiscal Year End —Continues to Accelerate Innovation Through Global Collaborations and Technological Breakthroughs in Nanoelectronics— April 24th, 2014

Multicapacity Microreactor for Catalyst Characterisation April 24th, 2014

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

Academic/Education

Global leader in solar cell manufacturing eyes New York for major expansion outside of Japan: CNSE and Solar Frontier Explore $700 Million Investment, Job Creation in New York State April 22nd, 2014

University of Waterloo Visits China to Strengthen Bonds With Research Partners April 21st, 2014

Director Wally Pfister joins UC Berkeley neuroengineers to discuss the science behind ‘Transcendence’ April 7th, 2014

First annual science week highlights STEM pipeline and partnerships: UB, SUNY Buffalo State and ECC team up with the City of Buffalo and its schools for April 7-11 events April 3rd, 2014

Chip Technology

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

Announcements

Imec Reports Four Percent Growth for 2013 Fiscal Year End —Continues to Accelerate Innovation Through Global Collaborations and Technological Breakthroughs in Nanoelectronics— April 24th, 2014

Multicapacity Microreactor for Catalyst Characterisation April 24th, 2014

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

Tools

Multicapacity Microreactor for Catalyst Characterisation April 24th, 2014

Characterizing inkjet inks: Malvern Instruments presents new rheological research April 23rd, 2014

MRI, on a molecular scale: Researchers develop system that could one day peer into the atomic structure of individual molecules April 20th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

Printing/Lithography/Inkjet

Characterizing inkjet inks: Malvern Instruments presents new rheological research April 23rd, 2014

Conductive Inks: booming to $2.8 billion by 2024 April 17th, 2014

Transparent Conductive Films and Sensors Are Hot Segments in Printed Electronics: Start-ups in these fields show above-average momentum, while companies working on emissive displays such as OLED are fading, Lux Research says April 17th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE