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Home > Press > Registration Open for the 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication: Conference Celebrates 1,000 Years of Optics with Engaging Speaker Lineup and “Entrepreneur’s Challenge”
-Registration is still open for the 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) which brings together engineers and scientists from industries all over the world to discuss recent progress and future trends. The EIPBN 2011 will feature an engaging speaker lineup and information on the latest advances and techniques in nanopatterning, lithography, and beams (electron, ion and photon). Celebrating 1,000 years of optics, this premier event will take place at the JW Marriott Resort and Spa on May 31-June 3, in Las Vegas.
Keynote speakers include:
- Professor Ahmed Zewail (Linus Pauling Chair professor of chemistry, and professor of physics at the California Institute of Technology)
- Dr. Nicholas P. Economou (president, PointSpectrum Inc.)
- Dr. Sam Sivakumar (Intel fellow and director of lithography, Intel's Portland Technology Development Group)
New to the "3-Beams" agenda this year, the "Entrepreneurs Challenge" is a program that offers a talented pool of students, post-doctorates and research associates the chance of exposure to leading venture capitalists, industry experts and angel investors. Within a supportive learning environment, competition participants can pursue their entrepreneurial dreams and present their business plans to an influential judging panel.
Scoring guidelines span numerous categories from addressable market opportunity and concept, to the business model, value proposition and associated financial risk. The winner will be announced at the EIPBN banquet on June 2, and receive a prize package including: an iPad 2, courtesy of KLA-Tencor; and $500 USMSRP, provided by EIPBN, to cover conference expenses. In addition, six runner-ups will receive $200 USMSRP. This program will be in addition to talks and posters around leading-edge work on the lithographic science and process technologies, with special emphasis on applications for micro- and nanofabrication.
"This year's symposium is packed with presentations and poster sessions that will offer extensive insight into the trends and issues facing nanoscale manufacturing," said Dr. Alan D. Brodie, Ph.D, 2011 EIPBN conference chairman and principal engineer at KLA-Tencor. "The addition of this year's entrepreneurial competition rounds out the spirit of innovation that has pushed this industry to where it is today. It never ceases to impress me the ideas and discussions that emerge when you get the leading minds of the industry together in one place."
This year's conference sponsors include: ACS, ASML, AVS, Cambridge Nanotech, IEEE, FEI, JEOL, KLA-Tencor, Nikon, NSF, OSA, Raith, Research Corporation, Sematech, Tescan and Vistec.
For more information on sessions and program topics, or to register, please visit the 2011 EIPBN conference web page at: eipbn.org/.
EIPBN, the "3-Beams", Conference is the premier conference on the science and technology of nanopatterning. Originally fabricated by either electron, ion, or photon beams (“the 3 beams”), the technology of nanoscale manufacturing now also includes nanoimprint technology, and engineering molecular structures that grow and replicate themselves. This conference is the place to hear the newest techniques and the latest advances.
For more information, please click here
Name: Alan D. Brodie
Title: Conference Chair
Phone Number: 408-875-1680
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