Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International

Wikipedia Affiliate Button

Home > Press > FUJIFILM Joins SEMATECH’s Resist Center for Advanced EUV Resist Development at UAlbany NanoCollege

Abstract:
SEMATECH, a global consortium of chipmakers, announced today that FUJIFILM Electronic Materials, a leading global supplier of photoresists, developers, cleaners and removers, polyimides and thin film chemicals and equipment for the semiconductor industry, has joined SEMATECH's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

FUJIFILM Joins SEMATECH’s Resist Center for Advanced EUV Resist Development at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on May 19th, 2011

As a resist member of SEMATECH's lithography program, FUJIFILM will collaborate with SEMATECH engineers on critical resist issues in extreme ultraviolet (EUV) lithography. Specific areas include reduction or elimination of line edge roughness (LER) in images below 22nm; ultimate resolution of new resists; and testing imaging materials for EUV sensitivity.

"Our partnership with SEMATECH provides FUJIFILM the opportunity for a new level of collaboration to further support the semiconductor manufacturing and electronic materials markets," said Takahiro Goto, General Manager of Electronic Materials Research Laboratories, FUJIFILM Corporation. "FUJIFILM is committed to ensure that they have the enabling materials and processes they need to foster greater innovation."

"We're looking forward to working with FUJIFILM in our mutual effort to develop leading‑edge resists and materials, and accelerate process availability for EUV pilot line manufacturing," said John Warlaumont, vice president of Advanced Technologies, SEMATECH. "This partnership will help strengthen the RMDC's ability to address critical resist issues in advanced materials and accelerate the search for new solutions to our common technology challenges."

"The leading-edge research and development at the UAlbany NanoCollege that is critical for the commercialization of EUVL technologies will be enhanced by the addition of FUJIFILM," said Richard Brilla, CNSE vice president for strategy, alliances and consortia. "This further builds on the world-class capabilities enabled by the SEMATECH-CNSE partnership to support the advanced technology needs of our global corporate partners and the industry."

The partnership will be based on SEMATECH's extensive network of hardware and research expertise, semiconductor experience, and highly respected market leadership and on FUJIFILM's proven, industry-leading semiconductor materials and processes. SEMATECH's RMDC will provide access to two micro-exposure tools (METs) as well as several metrology tools located at the University at Albany's College of Nanoscale Science and Engineering and the University of California, Berkeley.

At the RMDC, leading resist and materials suppliers participate in focused, cooperative R&D with SEMATECH member companies. Together, the RMDC provides the hardware and research expertise required by materials suppliers and member companies to develop EUV resist processes that meet the stringent resolution, linewidth roughness, and sensitivity specifications needed for EUV insertion at member companies.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $7 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, GlobalFoundries, SEMATECH, Toshiba, Samsung, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. An expansion now underway is projected to increase the size of CNSE’s Albany NanoTech Complex to over 1,250,000 square feet of next-generation infrastructure housing over 135,000 square feet of Class 1 capable cleanrooms and more than 3,750 scientists, researchers and engineers from CNSE and global corporations. For more information, visit www.cnse.albany.edu.

FUJIFILM Corporation is one of the major operating companies of FUJIFILM Holdings. Since its founding in 1934, the company has built up a wealth of advanced technologies in the field of photo imaging, and in line with its efforts to become a comprehensive healthcare company, FUJIFILM is now applying these technologies to the prevention, diagnosis and treatment of diseases in the Medical and Life Science fields. FUJIFILM is also expanding growth in the highly functional materials business, including electronic materials, flat panel display materials, and in the graphic systems and optical devices businesses.

FUJIFILM's corporate philosophy is: We will use leading-edge, proprietary technologies to provide top-quality products and services that contribute to the advancement of culture, science, technology and industry, as well as improved health and environmental protection in society. Our overarching aim is to help enhance the quality of life of people worldwide. Through its corporate philosophy, FUJIFILM demonstrates its commitment to making a significant contribution to society.

For more information, please visit fujifilm.jp.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road | Suite 2200
Albany, NY | 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanobiotix Plans to Conduct Registered Public Offering in the United States January 17th, 2019

Power stations driven by light: More efficient solar cells imitate photosynthesis January 16th, 2019

Drilling speed increased by 20% – yet another upgrade in the oil & gas sector made possible by graphene nanotubes January 15th, 2019

Chirality in 'real-time' January 14th, 2019

Chip Technology

Spintronics 'miracle material' put to the test: Physicists build devices using mineral perovskite January 11th, 2019

Nanometrics to Participate in the 21st Annual Needham Growth Conference January 7th, 2019

Holey graphene as Holy Grail alternative to silicon chips December 28th, 2018

Study on low noise, high-performance transistors may bring innovations in electronics December 28th, 2018

Announcements

Nanobiotix Plans to Conduct Registered Public Offering in the United States January 17th, 2019

Power stations driven by light: More efficient solar cells imitate photosynthesis January 16th, 2019

Drilling speed increased by 20% – yet another upgrade in the oil & gas sector made possible by graphene nanotubes January 15th, 2019

Chirality in 'real-time' January 14th, 2019

Alliances/Trade associations/Partnerships/Distributorships

Oxford Instruments participates in the launch of the European Quantum Technology Flagship Programme ‘QMiCS’ December 13th, 2018

Elliot Scientific now representing Raman Imaging specialists WITec in the UK and Eire - Unique correlative analysis in one instrument: Raman/AFM, Raman/SNOM December 10th, 2018

CEA-Leti and Silvaco to Develop GAA SPICE Compact Models for Circuit Design and Technology Co-optimization: Project Combines CEA-Leti’s Compact Modeling Expertise And Silvaco’s Extensive Experience in SPICE Compact Model Integration and Extraction December 3rd, 2018

An important step towards completely secure quantum communication networks November 30th, 2018

Research partnerships

Chirality in 'real-time' January 14th, 2019

Ultra-sensitive sensor with gold nanoparticle array January 9th, 2019

DNA design that anyone can do: Computer program can translate a free-form 2-D drawing into a DNA structure January 4th, 2019

Revealing hidden spin: Unlocking new paths toward high-temperature superconductors: Berkeley Lab researchers uncover insights into superconductivity, leading potentially to more efficient power transmission January 4th, 2019

Printing/Lithography/Inkjet/Inks/Bio-printing

New composite advances lignin as a renewable 3D printing material December 28th, 2018

Nanoscribe Presents Successor Model Photonic Professional GT2 for High-Resolution 3D Microfabrication: The first ever production of structures in millimeter size with micrometer precision December 4th, 2018

CEA-Leti Extends 300mm Line and Adds Avenues for Developing Disruptive Technologies: Execution Relies on CEA-Leti’s Fully Implemented Technology With Module-Level Innovations & Devices and Their Architectures December 3rd, 2018

Iran Unveils Its First Homegrown 3D Nano Printer October 17th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project