- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Supporting mass metrology as the preferred technique for in-line monitoring of product wafers, semiconductor metrology equipment company, Metryx, Limited, announced it will be sponsoring several key industry conferences as well as hosting a supplier seminar during the month of May. The conferences include IEEE's International Interconnect Technology Conference (IITC), SEMI and IEEE's Advanced Semiconductor Manufacturing Conference (ASMC), and NIST's Frontiers of Characterization and Metrology for Nanoelectronics (FCNM).
"As a supplier of semiconductor metrology equipment, IITC, ASMC, and FCMN are three key technology conferences that are must-attend events," stated Dr. Adrian Kiermasz, President and CEO of Metryx. "The fact that we are involved as a key sponsor is a testament to how far mass metrology has come in the semiconductor manufacturing space, going from ground-breaking technology to being in volume production in four years. At IITC, we have also been invited to host a supplier seminar where three of our major European customers will share their experiences using mass metrology."
The IITC conference will take place at the International Congress Center in Dresden, from May 9 to 12, 2011. As a conference sponsor, Metryx will exhibit and host a supplier seminar at the Congress Hotel on May 10th. All conference attendees are welcome and can look forward to hearing about mass metrology directly from Metryx' customers. All attendees will also have the chance to win an Amazon Kindle e-book reader.
The ASMC conference, organized and hosted by SEMI, takes place at the Saratoga Hilton in Saratoga Springs, NY from May 16 to 18, 2011. As a premier provider of process monitoring and control equipment for product wafers, Metryx will be sponsoring Session 5 "Advanced Process Development and Control."
The FCMN conference has left the U.S. for the first time, and will take place at the MINATEC campus in Grenoble, France from May 23 to 26, 2011. As a Gold sponsor, Metryx will have high visibility at this conference, including a booth in the exhibitor area where attendees can learn about mass metrology.
"The next few weeks will provide a great platform for Metryx to continue to engage our key markets regarding the benefits associated with our technology, while providing an opportunity for semiconductor industry professionals to learn how mass metrology can benefit them," concluded Dr. Kiermasz
About Metryx, Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx's non-destructive 200 mm and 300 mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control.
IITC provides a forum for professionals and researchers in semiconductor processing, advanced materials, equipment development, and interconnect systems to present and discuss exciting new science and technology. For more information about IITC please visit www.his.com/~iitc
The IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2011) is the annual go-to forum showcasing the microelectronics industry's best known methods for creating and managing efficient, cost effective collaborations between device makers, suppliers and academia, and for implementing factory enhancements and cycle-time improvements. For more information about AMSC please visit www.semi.org/EventsTradeshows/CTR_040396
This conference, the eighth in the series, focuses on the frontiers and innovation in characterization and metrology of nanoelectronics. For more information about FCMN please visit www.nist.gov/pml/semiconductor/conference/
Mentor Mass Metrology
The Mentor offers an innovative mass measurement technology that is able to measure any mass change resulting from a process change with atomic level accuracy. The tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap or preventing yield loss.
For more information, please click here
Copyright © MarketwireIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Newly discovered 'design rule' brings nature-inspired nanostructures one step closer: Computer sims and microscopy research at Berkeley Lab yield first atomic-resolution structure of a peptoid nanosheet October 8th, 2015
Arrowhead to Present at Upcoming Conferences October 8th, 2015
Purdue launching new quantum center during workshop October 8th, 2015
Iran Organizes Nanotechnology Educational Workshop in China October 7th, 2015
8th Int'l Iran Nano 2015 Festival Kicks Off Work October 7th, 2015