Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH to Focus on Solutions for Advanced Wafer and Mask Cleaning and Surface Preparation Technologies at SPCC: Annual conference to showcase technical insights on technologies for the 16 nm node and beyond

Abstract:
SEMATECH announced today that its Surface Preparation and Cleaning Conference (SPCC), the premier technical forum for discussion of the latest innovations in wafer and mask-cleaning technologies, will focus on material and process solutions to key challenges faced by the industry in emerging areas such as III-V materials, 3D TSV technology, MEMS, photovoltaics, Environment, Safety and Health and 450 mm. The conference will be held on March 21 - 23, 2011 at the Sheraton Hotel in Austin, Texas.

SEMATECH to Focus on Solutions for Advanced Wafer and Mask Cleaning and Surface Preparation Technologies at SPCC: Annual conference to showcase technical insights on technologies for the 16 nm node and beyond

Austin, TX | Posted on March 14th, 2011

"This year's conference is dedicated solely to seminal developments in advanced wafer and mask cleaning and surface preparation technologies for the 16 nm node and beyond," said Joel Barnett, SEMATECH's conference chair. "It is more important than ever to bring together experts from the industry and researchers from the university community to share the latest innovations in wafer and mask-cleaning technologies."

The SPCC features two full days of leading‑edge presentations from the semiconductor industry's major manufacturers and researchers from around the world.

A few highlights include:

· A keynote on "Wet cleaning technology innovation," presented by Soichi Nadahara, DNS Electronics

· 3D TSV & the Next Semiconductor Revolution - Roger Quon, IBM/SEMATECH

· Back End of Line Cleaning of Post Etch Residues using Deep Eutectic Solvents (DES) - Dinesh P R Thanu, University of Arizona

· Atomic Layer Etching of CVD Graphene - Prof. Geun Young Yoem, SungKyunKwan University

· Surface Cleaning and Passivation for Direct Wafer Bonded III-V Materials - Mark S. Goorsky, University of California Los Angeles

· PV Challenges - Steven Verhaverbeke, Applied Materials

· 450mm wafer wet cleaning for particle and metals removal - Tom Abel, Intel/SEMATECH

· In Situ and Real-Time Monitoring during Cleaning, Rinsing, and Drying of Micro- and Nano-Structures - Jun Yan, University of Arizona

· An interactive panel session on advanced cleaning technology, including back-end-of-line and epitaxial pre-clean challenges

For a complete agenda or to register, visit: www.sematech.org/meetings/spcc/index.htm.
The SPCC is a key offering in the SEMATECH Knowledge Series, a set of public, single-focused industry meetings designed to increase global knowledge in key areas of semiconductor R&D. To see a complete listing of all the meetings in this series, go to www.sematech.org/meetings/sks.htm.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

So, near and yet so far: Stable HGNs for Raman April 1st, 2015

Two-dimensional dirac materials: Structure, properties, and rarity April 1st, 2015

3-D neural structure guided with biocompatible nanofiber scaffolds and hydrogels April 1st, 2015

Light-powered gyroscope is world's smallest: Promises a powerful spin on navigation April 1st, 2015

Chip Technology

Rutgers, NIST physicists report technology with potential for sub-micron optical switches March 31st, 2015

Next important step toward quantum computer: Scientists at the University of Bonn have succeeded in linking 2 different quantum systems March 30th, 2015

State-of-the-art online system unveiled to pinpoint metrology software accuracy March 27th, 2015

SUNY POLY CNSE to Host First Ever Northeast Semi Supply Conference (NESCO) Conference Will Connect New and Emerging Innovators in the Northeastern US and Canada with Industry Leaders and Strategic Investors to Discuss Future Growth Opportunities in NYS March 25th, 2015

Announcements

So, near and yet so far: Stable HGNs for Raman April 1st, 2015

Two-dimensional dirac materials: Structure, properties, and rarity April 1st, 2015

3-D neural structure guided with biocompatible nanofiber scaffolds and hydrogels April 1st, 2015

Light-powered gyroscope is world's smallest: Promises a powerful spin on navigation April 1st, 2015

Events/Classes

Nanomedicine pioneer Mauro Ferrari at ETH Zurich March 31st, 2015

State-of-the-art online system unveiled to pinpoint metrology software accuracy March 27th, 2015

LAMDAMAP 2015 hosted by the University March 26th, 2015

SUNY POLY CNSE to Host First Ever Northeast Semi Supply Conference (NESCO) Conference Will Connect New and Emerging Innovators in the Northeastern US and Canada with Industry Leaders and Strategic Investors to Discuss Future Growth Opportunities in NYS March 25th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE