Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH to Focus on Solutions for Advanced Wafer and Mask Cleaning and Surface Preparation Technologies at SPCC: Annual conference to showcase technical insights on technologies for the 16 nm node and beyond

Abstract:
SEMATECH announced today that its Surface Preparation and Cleaning Conference (SPCC), the premier technical forum for discussion of the latest innovations in wafer and mask-cleaning technologies, will focus on material and process solutions to key challenges faced by the industry in emerging areas such as III-V materials, 3D TSV technology, MEMS, photovoltaics, Environment, Safety and Health and 450 mm. The conference will be held on March 21 - 23, 2011 at the Sheraton Hotel in Austin, Texas.

SEMATECH to Focus on Solutions for Advanced Wafer and Mask Cleaning and Surface Preparation Technologies at SPCC: Annual conference to showcase technical insights on technologies for the 16 nm node and beyond

Austin, TX | Posted on March 14th, 2011

"This year's conference is dedicated solely to seminal developments in advanced wafer and mask cleaning and surface preparation technologies for the 16 nm node and beyond," said Joel Barnett, SEMATECH's conference chair. "It is more important than ever to bring together experts from the industry and researchers from the university community to share the latest innovations in wafer and mask-cleaning technologies."

The SPCC features two full days of leading‑edge presentations from the semiconductor industry's major manufacturers and researchers from around the world.

A few highlights include:

A keynote on "Wet cleaning technology innovation," presented by Soichi Nadahara, DNS Electronics

3D TSV & the Next Semiconductor Revolution - Roger Quon, IBM/SEMATECH

Back End of Line Cleaning of Post Etch Residues using Deep Eutectic Solvents (DES) - Dinesh P R Thanu, University of Arizona

Atomic Layer Etching of CVD Graphene - Prof. Geun Young Yoem, SungKyunKwan University

Surface Cleaning and Passivation for Direct Wafer Bonded III-V Materials - Mark S. Goorsky, University of California Los Angeles

PV Challenges - Steven Verhaverbeke, Applied Materials

450mm wafer wet cleaning for particle and metals removal - Tom Abel, Intel/SEMATECH

In Situ and Real-Time Monitoring during Cleaning, Rinsing, and Drying of Micro- and Nano-Structures - Jun Yan, University of Arizona

An interactive panel session on advanced cleaning technology, including back-end-of-line and epitaxial pre-clean challenges

For a complete agenda or to register, visit: www.sematech.org/meetings/spcc/index.htm.
The SPCC is a key offering in the SEMATECH Knowledge Series, a set of public, single-focused industry meetings designed to increase global knowledge in key areas of semiconductor R&D. To see a complete listing of all the meetings in this series, go to www.sematech.org/meetings/sks.htm.

####

About SEMATECH
For over 20 years, SEMATECH (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

Announcements

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

Events/Classes

Hiden Gas Analysers at PITTCON 2015 | Visit us on Booth No. 1127 January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Pittcon News: Renishaw adds to the comprehensive imaging options available with its inVia confocal Raman microscope January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE