Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Nanometrics Wins Integrated Metrology Selection from Leading Japanese Semiconductor Company for New Fab Build-out

Abstract:
Nanometrics Incorporated (Nasdaq: NANO), a leading provider of advanced process control metrology systems, today announced that a leading Japanese semiconductor company has selected its IMPULSE® integrated metrology (IM) solution for process control of advanced chemical mechanical polishing (CMP) applications to be deployed as part of its new fab build-out. The selection expands on the recent order by the same customer for Nanometrics' Lynx™ cluster metrology platform equipped with IMPULSE systems, which was selected for in-line optical critical dimension (OCD) control of etch and lithography applications.

Nanometrics Wins Integrated Metrology Selection from Leading Japanese Semiconductor Company for New Fab Build-out

Milpitas, CA and Japan | Posted on March 9th, 2011

"The IMPULSE system was selected for its superior measurement performance, reliability and speed. This selection is further evidence of the competitive gains we are making by working closely with industry-leading device manufacturers to align our product roadmaps to future technology requirements," commented Steve Bradley, Director of Nanometrics' Integrated Metrology Business Unit. "The IMPULSE system is now qualified on the latest CMP platforms from the two leading suppliers of CMP systems, for both dielectric and metal polishing applications. Our integrated metrology solutions are utilized in leading logic, Flash, DRAM and foundry fabs, providing in-line metrology for lithography, etch, CMP and thin film deposition for device geometries from 65nm down to the 1x node."

####

About Nanometrics Incorporated
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO.

Forward Looking Statements

This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of the company’s metrology products and technological leadership. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, expectations regarding product capabilities and future collaboration are subject to a number of risks, including changes in customer spending plans, worldwide economic conditions and the continued technological leadership of our products. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended January 2, 2010 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.

For more information, please click here

Contacts:
Company Contact:
Kevin Heidrich
408-545-6000 tel


Investor Relations Contact:
Claire McAdams
Headgate Partners LLC
530.265.9899

Copyright © Nanometrics Incorporated

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

In IEDM 2016 Keynote, Leti CEO Says ‘Hyperconnectivity’, Human-focused Research and the IOT Promise Profound, Positive Changes December 7th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Chip Technology

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Construction of practical quantum computers radically simplified: Scientists invent ground-breaking new method that puts quantum computers within reach December 5th, 2016

Announcements

In IEDM 2016 Keynote, Leti CEO Says ‘Hyperconnectivity’, Human-focused Research and the IOT Promise Profound, Positive Changes December 7th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Tokyo Institute of Technology research: 3D solutions to energy savings in silicon power transistors December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Tools

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Controlled electron pulses November 30th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

News from Quorum: The Agricultural Research Service of the USDA uses a Quorum Cryo-SEM preparation system for the study of mites, ticks and other soft bodied organisms November 22nd, 2016

New-Contracts/Sales/Customers

Cetim Facility Receives Bruker Contour CMM Dimensional Analysis System: New Optical Coordinate Measurement Technology Enables High-Precision 3D Scanning November 16th, 2016

Industrial Nanotech, Inc. Announces Plans to Spin Off New Product Line to Major Paint Compan November 9th, 2016

Leti Provides New Low-noise Image Technology to French SME PYXALIS; Will Be Demonstrated at Vision 2016 in Stuttgart November 3rd, 2016

DryWired's Liquid Nanotint to be the first nano-insulation in a Federal building: 250,000 federal buildings, most with uninsulated glass October 12th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project