Nanotechnology Now - Press Release: "Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project"

Home > Press > Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Abstract:
CEA-Leti today announced that Mentor Graphics is the fifth industrial partner to join the IMAGINE program designed to develop maskless lithography for IC manufacturing.

Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Grenoble, France | Posted on March 1st, 2011

Mentor will develop multiple e-beam lithography data processing flows in the program.

Launched by Leti and MAPPER Lithography, the three-year, multiple e-beam-lithography partnership is evaluating a maskless lithography (ML2) infrastructure and studying the use of MAPPER tools for high throughput. It covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"Multi-beam systems for maskless lithography are contenders for next-generation patterning. The IMAGINE program is offering a unique infrastructure to enable this technology and we want to be an early partner in this research," said Joseph Sawicki, vice president and general manager of Mentor's Design to Silicon Division. "Our broad technology base and experience as the leader in optical proximity correction (OPC) and mask process correction (MPC) will provide technical components needed to make sure the data-path technology is ready for production deployment."

"Data handling and proximity effect correction are key elements to the success of maskless technology," said Serge Tedesco, CEA-Leti program manager. "Having Mentor Graphics, the worldwide leader in mask data processing, will accelerate the IMAGINE program's progress toward the introduction of maskless lithography in manufacturing."

Other partners in the program include TSMC, STMicroelectronics, SOKUDO and TOK. MAPPER, which makes maskless-lithography machines for the semiconductor industry, is supporting the project with its massively parallel electron-beam platforms.

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About CEA-Leti
CEA is a French research and technology organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About Mentor Graphics Corporation
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $850 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: www.mentor.com.

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Contacts:
CEA-LETI
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amélie Ravier
Phone: +33 1 58 18 59 30
Email: