Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Mentor Graphics to Join CEA-Letiís IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Abstract:
CEA-Leti today announced that Mentor Graphics is the fifth industrial partner to join the IMAGINE program designed to develop maskless lithography for IC manufacturing.

Mentor Graphics to Join CEA-Letiís IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Grenoble, France | Posted on March 1st, 2011

Mentor will develop multiple e-beam lithography data processing flows in the program.

Launched by Leti and MAPPER Lithography, the three-year, multiple e-beam-lithography partnership is evaluating a maskless lithography (ML2) infrastructure and studying the use of MAPPER tools for high throughput. It covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"Multi-beam systems for maskless lithography are contenders for next-generation patterning. The IMAGINE program is offering a unique infrastructure to enable this technology and we want to be an early partner in this research," said Joseph Sawicki, vice president and general manager of Mentor's Design to Silicon Division. "Our broad technology base and experience as the leader in optical proximity correction (OPC) and mask process correction (MPC) will provide technical components needed to make sure the data-path technology is ready for production deployment."

"Data handling and proximity effect correction are key elements to the success of maskless technology," said Serge Tedesco, CEA-Leti program manager. "Having Mentor Graphics, the worldwide leader in mask data processing, will accelerate the IMAGINE program's progress toward the introduction of maskless lithography in manufacturing."

Other partners in the program include TSMC, STMicroelectronics, SOKUDO and TOK. MAPPER, which makes maskless-lithography machines for the semiconductor industry, is supporting the project with its massively parallel electron-beam platforms.

####

About CEA-Leti
CEA is a French research and technology organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m≤ state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About Mentor Graphics Corporation
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the worldís most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $850 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: www.mentor.com.

For more information, please click here

Contacts:
CEA-LETI
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amťlie Ravier
Phone: +33 1 58 18 59 30
Email:

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Color effects from transparent 3D printed nanostructures: New design tool automatically creates nanostructure 3D print templates for user-given colors Scientists present work at prestigious SIGGRAPH conference August 18th, 2018

Novel nanoparticle-based approach detects and treats oral plaque without drugs August 17th, 2018

UVA multidisciplinary engineering team designs technology for smart materials: The invention could lead to devices and manufactured goods, such as fabrics, that can dynamically regulate between thermally insulating and cooling August 17th, 2018

Smallest transistor worldwide switches current with a single atom in solid electrolyte: Milestone of energy efficiency in information technology -- Publication in Advanced Materials August 17th, 2018

Chip Technology

Smallest transistor worldwide switches current with a single atom in solid electrolyte: Milestone of energy efficiency in information technology -- Publication in Advanced Materials August 17th, 2018

Scientists create antilaser for ultracold atoms condensate August 16th, 2018

Flipping the switch on supramolecular electronics August 14th, 2018

Breaking down the Wiedemann-Franz law: In a study exploring the coupling between heat and particle currents in a gas of strongly interacting atoms, physicists at ETH Zurich find puzzling behaviours August 10th, 2018

Announcements

Color effects from transparent 3D printed nanostructures: New design tool automatically creates nanostructure 3D print templates for user-given colors Scientists present work at prestigious SIGGRAPH conference August 18th, 2018

Novel nanoparticle-based approach detects and treats oral plaque without drugs August 17th, 2018

UVA multidisciplinary engineering team designs technology for smart materials: The invention could lead to devices and manufactured goods, such as fabrics, that can dynamically regulate between thermally insulating and cooling August 17th, 2018

Smallest transistor worldwide switches current with a single atom in solid electrolyte: Milestone of energy efficiency in information technology -- Publication in Advanced Materials August 17th, 2018

Tools

Novel nanoparticle-based approach detects and treats oral plaque without drugs August 17th, 2018

Nanometrics Delivers 100th: Atlas III System for Advanced Process Control Metrology Atlas III: Systems are qualified and in production for advanced devices in DRAM, 3D-NAND and Foundry/Logic August 2nd, 2018

Picosunís ALD solutions make quality watches tick July 26th, 2018

Nanometrics Announces Participation in Upcoming Investor Conferences July 25th, 2018

Alliances/Trade associations/Partnerships/Distributorships

Leti & CMP Announce Worldís First Multi-Project-Wafer Service with Integrated Silicon OxRAM: Oxide-Based Resistive Ram Memory Platform Development for Backend Memories To Offer Non-Volatility Associated with Embedded Designs August 2nd, 2018

Leti and Oscaro Partner on Letiís New Low-Power, Low-Cost Transceiver to Track Parcels July 12th, 2018

Leti and Soitec Launch a New Substrate Innovation Center to Develop Engineered Substrate Solutions: Industry-inclusive hub promotes early collaboration and learning from substrate to system level July 11th, 2018

Leti & Partners Launch Pilot Program to Assess New Perception Sensors for Autonomous Vehicles July 5th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project