Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Abstract:
CEA-Leti today announced that Mentor Graphics is the fifth industrial partner to join the IMAGINE program designed to develop maskless lithography for IC manufacturing.

Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Grenoble, France | Posted on March 1st, 2011

Mentor will develop multiple e-beam lithography data processing flows in the program.

Launched by Leti and MAPPER Lithography, the three-year, multiple e-beam-lithography partnership is evaluating a maskless lithography (ML2) infrastructure and studying the use of MAPPER tools for high throughput. It covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"Multi-beam systems for maskless lithography are contenders for next-generation patterning. The IMAGINE program is offering a unique infrastructure to enable this technology and we want to be an early partner in this research," said Joseph Sawicki, vice president and general manager of Mentor's Design to Silicon Division. "Our broad technology base and experience as the leader in optical proximity correction (OPC) and mask process correction (MPC) will provide technical components needed to make sure the data-path technology is ready for production deployment."

"Data handling and proximity effect correction are key elements to the success of maskless technology," said Serge Tedesco, CEA-Leti program manager. "Having Mentor Graphics, the worldwide leader in mask data processing, will accelerate the IMAGINE program's progress toward the introduction of maskless lithography in manufacturing."

Other partners in the program include TSMC, STMicroelectronics, SOKUDO and TOK. MAPPER, which makes maskless-lithography machines for the semiconductor industry, is supporting the project with its massively parallel electron-beam platforms.

####

About CEA-Leti
CEA is a French research and technology organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About Mentor Graphics Corporation
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $850 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: www.mentor.com.

For more information, please click here

Contacts:
CEA-LETI
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amélie Ravier
Phone: +33 1 58 18 59 30
Email:

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Berkeley Lab Researchers Demonstrate First Size-based Chromatography Technique for the Study of Living Cells April 22nd, 2014

PETA science consortium to present hazard testing strategy at nanotoxicology meeting: High tech field ripe for use of sophisticated non-animal testing strategies April 22nd, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

National Space Society Congratulates SpaceX on the Success of CRS-3 and the First Flight of the Falcon 9R April 22nd, 2014

Chip Technology

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

'Exotic' material is like a switch when super thin April 18th, 2014

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Announcements

Berkeley Lab Researchers Demonstrate First Size-based Chromatography Technique for the Study of Living Cells April 22nd, 2014

PETA science consortium to present hazard testing strategy at nanotoxicology meeting: High tech field ripe for use of sophisticated non-animal testing strategies April 22nd, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

National Space Society Congratulates SpaceX on the Success of CRS-3 and the First Flight of the Falcon 9R April 22nd, 2014

Tools

MRI, on a molecular scale: Researchers develop system that could one day peer into the atomic structure of individual molecules April 20th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

More effective kidney stone treatment, from the macroscopic to the nanoscale April 17th, 2014

Aerotech X-Y ball-screw stage for economical high performance Planar positioning April 16th, 2014

Alliances/Partnerships/Distributorships

Global leader in solar cell manufacturing eyes New York for major expansion outside of Japan: CNSE and Solar Frontier Explore $700 Million Investment, Job Creation in New York State April 22nd, 2014

ASM International Repositions Brand and Introduces New Logo; Looks to Future of Materials Science Innovation: New logo celebrates organization’s history and provides fresh elements for future growth April 21st, 2014

Virus structure inspires novel understanding of onion-like carbon nanoparticles April 10th, 2014

Peer Reviewed and Approved for Science by the the Washington Academy of Sciences April 3rd, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE