Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Abstract:
CEA-Leti today announced that Mentor Graphics is the fifth industrial partner to join the IMAGINE program designed to develop maskless lithography for IC manufacturing.

Mentor Graphics to Join CEA-Leti’s IMAGINE Program on Maskless Lithography: Mentor Will Develop Multi E-Beam Lithography Data Processing for 3-Year Project

Grenoble, France | Posted on March 1st, 2011

Mentor will develop multiple e-beam lithography data processing flows in the program.

Launched by Leti and MAPPER Lithography, the three-year, multiple e-beam-lithography partnership is evaluating a maskless lithography (ML2) infrastructure and studying the use of MAPPER tools for high throughput. It covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"Multi-beam systems for maskless lithography are contenders for next-generation patterning. The IMAGINE program is offering a unique infrastructure to enable this technology and we want to be an early partner in this research," said Joseph Sawicki, vice president and general manager of Mentor's Design to Silicon Division. "Our broad technology base and experience as the leader in optical proximity correction (OPC) and mask process correction (MPC) will provide technical components needed to make sure the data-path technology is ready for production deployment."

"Data handling and proximity effect correction are key elements to the success of maskless technology," said Serge Tedesco, CEA-Leti program manager. "Having Mentor Graphics, the worldwide leader in mask data processing, will accelerate the IMAGINE program's progress toward the introduction of maskless lithography in manufacturing."

Other partners in the program include TSMC, STMicroelectronics, SOKUDO and TOK. MAPPER, which makes maskless-lithography machines for the semiconductor industry, is supporting the project with its massively parallel electron-beam platforms.

####

About CEA-Leti
CEA is a French research and technology organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About Mentor Graphics Corporation
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $850 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: www.mentor.com.

For more information, please click here

Contacts:
CEA-LETI
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amélie Ravier
Phone: +33 1 58 18 59 30
Email:

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanoparticles present sustainable way to grow food crops May 1st, 2016

Searching for a nanotech self-organizing principle May 1st, 2016

Clay nanotube-biopolymer composite scaffolds for tissue engineering May 1st, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Chip Technology

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016

NREL theory establishes a path to high-performance 2-D semiconductor devices April 27th, 2016

Announcements

Nanoparticles present sustainable way to grow food crops May 1st, 2016

Clay nanotube-biopolymer composite scaffolds for tissue engineering May 1st, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Personal cooling units on the horizon April 29th, 2016

Tools

Exploring phosphorene, a promising new material April 29th, 2016

JPK reports on the use of a NanoWizard AFM system at the University of Kaiserslautern to study the interaction of bacteria with microstructured surfaces April 28th, 2016

Chemists use DNA to build the world's tiniest thermometer April 27th, 2016

Bruker Introduces Dimension FastScan Pro Industrial AFM: Providing Nanometer-Resolution at High Scan Rates for up to 300-mm Samples April 26th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Electrically Conductive Graphene Ink Enables Printing of Biosensors April 23rd, 2016

Leti Extends Collaboration with Qualcomm on CoolCubeTM 3D Integration Technology for High-Density, High-Performance ICs: Collaboration Goals Include Building an Ecosystem To Take the Chip-stacking Technology from Design to Fabrication April 13th, 2016

FEI Partners with Five Pharmaceutical Companies, the Medical Research Council and the University of Cambridge to form Cryo-EM Research Consortium April 5th, 2016

Strem Chemicals and SONA Nanotech Sign Distribution Agreement for the World’s First Gold Nanorods Synthesized without CTAB February 24th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic