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Home > News > Enabling a Cleaner World on Atomic Level

February 24th, 2011

Enabling a Cleaner World on Atomic Level

Abstract:
Atomic Layer Deposition (ALD) is an efficient method for depositing highly uniform and conformal films even down to the smallest nanometer sized 3D-structures.

ALD can be used for a plethora of applications, including but not limited to integrated circuits, flat panel displays, MEMS, sensors, wear resistant coatings, chemical catalysis, nanoglues, biocompatibility, optical and magnetic materials etc. etc.

In the area of cleantech manufacturing, ALD is emerging and finding more and more use in photovoltaics, fuel cells, thin film batteries, hydrogen storage, water treatment equipment, environmentally friendly corrosion protection and recyclable packaging materials, just to name a few applications.

Source:
cleantechfinland.com

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